Vaporizer and apparatus for vaporizing and supplying

Abstract

The present invention provides a vaporizer having a vaporization chamber for a CVD material, a CVD material feed portion supplying the CVD material for the vaporization chamber, a vaporized gas exhaust port and a heater for heating the vaporization chamber, wherein the CVD material feed portion has passageways for the CVD material and for a carrier gas respectively and the passageway for the CVD material has a pressure loss inducer for the CVD material. At the same time, the present invention provides an apparatus for vaporizing and supplying that feeds a CVD material to a vaporizer via a liquid flow controller, and after vaporizing the CVD material that supplies the vaporized gas for a semiconductor production apparatus having a pressure loss-inducer for the CVD material between the liquid flow controller and the vaporizer. According to the present invention, even in the case of vaporizing and supplying with a decrease in a feed amount of a carrier gas to be supplied accompanying the CVD material employing a solid CVD material, reducing and stabilizing both the pressure fluctuation in the vaporizer and the flow rate fluctuation in the liquid flow controller and efficiently vaporizing a CVD material at a desirable concentration and flow rate without causing deposit or adhesion of the solid material in the vaporization chamber can be achieved.

1 . A vaporizer which comprises a vaporization chamber for a CVD material, a CVD material feed portion supplying said CVD material for said vaporization chamber, a vaporized gas exhaust port and a heating means for heating said vaporization chamber, 
 wherein said CVD material feed portion comprises passageways for said CVD material and for a carrier gas respectively and said passageway for said CVD material comprises a pressure loss-inducing means for said CVD material;    wherein said CVD material feed portion comprises passageways for said CVD material and for a carrier gas and a mixing passageway for joining said foregoing passageways and for connecting to said vaporization chamber; and    wherein said pressure loss-inducing means for said CVD material is a capillary with an inner diameter smaller than a inner diameter of said mixing passageway for said CVD material and said carrier gas.    
   
   
       2 . The vaporizer according to  claim 1 , wherein said CVD material feed portion further comprises a passageway exhausting said carrier gas from an outer peripheral of an outlet of said mixing passageway to said vaporizing chamber.  
   
   
       3 . The vaporizer according to  claim 1 , wherein said pressure loss-inducing means for said CVD material causes a pressure loss in said CVD material of at least 90% of the total pressure in said CVD material feed portion.  
   
   
       4 . The vaporizer according to  claim 1 , wherein said capillary has an inner diameter of 0.2 mm or smaller.  
   
   
       5 . The vaporizer according to  claim 1 , wherein said capillary has a length of 2 cm or longer.  
   
   
       6 . The vaporizer according to  claim 1 , wherein said CVD material is a liquid CVD material made up of a solid CVD material dissolved in an organic solvent.  
   
   
       7 . An apparatus for vaporizing and supplying that feeds a CVD material to a vaporizer via a liquid flow controller, and after vaporizing said CVD material that supplies a vaporized gas for a semiconductor production apparatus, comprising a pressure loss-inducing means for said CVD material between said liquid flow controller and said vaporizer, 
 wherein said pressure loss-inducing means for said CVD material is a capillary.    
   
   
       8 . The apparatus according to  claim 7 , wherein said pressure loss-inducing means for said CVD material causes a pressure loss in said CVD material of at least 90% of the pressure between a CVD material vessel and said vaporizer.  
   
   
       9 . The apparatus according to  claim 7 , wherein said capillary has an inner diameter of 0.2 mm or smaller.  
   
   
       10 . The apparatus according to  claim 7 , wherein said capillary has a length of 2 cm or longer.  
   
   
       11 . The apparatus according to  claim 7 , wherein said CVD material is a liquid CVD material made up of a solid CVD material dissolved in an organic solvent.  
   
   
       12 . An apparatus for vaporizing and supplying that feeds a CVD material to a vaporizer via a liquid flow controller, and after vaporizing said CVD material that supplies a vaporized gas for a semiconductor production apparatus, comprising a pressure loss-inducing means for said CVD material between said liquid flow controller and said vaporizer, 
 wherein said pressure loss-inducing means for said CVD material is a filter.    
   
   
       13 . The apparatus according to  claim 12 , wherein said filter removes particles having diameters corresponding to 0.01 μm with a rejection rate of 99.99% or more.  
   
   
       14 . The apparatus according to  claim 12 , wherein said CVD material is a liquid CVD material made up of a solid CVD material dissolved in an organic solvent.  
   
   
       15 . A vaporizer which comprises a vaporization chamber for a CVD material, a CVD material feed portion supplying said CVD material for said vaporization chamber, and a vaporized gas exhaust port and a heating means for heating said vaporization chamber, 
 wherein said CVD material feed portion comprises passageways for said CVD material and for a carrier gas respectively and said passageway for said CVD material comprises a pressure loss-inducing means for said CVD material;    wherein said pressure loss-inducing means for said CVD material is a capillary with an inner diameter smaller than an inner diameter of said mixing passageway for said CVD material and said carrier gas;    wherein said capillary has an inner diameter of 0.2 mm or smaller; and    wherein said capillary has a length of 2 cm or longer.    
   
   
       16 . An apparatus for vaporizing and supplying that feeds a CVD material to a vaporizer via a liquid flow controller, and after vaporizing said CVD material that supplies vaporized gas for a semiconductor production apparatus, comprising a pressure loss-inducing means for said CVD material between said liquid flow controller and said vaporizer, 
 wherein said pressure loss-inducing means for said CVD material is a capillary;    wherein said capillary has an inner diameter of 0.2 mm or smaller; and    wherein said capillary has a length of 2 cm or longer.    
   
   
       17 . An apparatus for vaporizing and supplying that feeds a CVD material to a vaporizer via a liquid flow controller, and after vaporizing said CVD material that supplies vaporized gas for a semiconductor production apparatus, comprising a pressure loss-inducing means for said CVD material between said liquid flow controller and said vaporizer, 
 wherein said pressure loss-inducing means for said CVD material is a filter; and    wherein said filter removes particles having diameters corresponding to 0.01 μm with a rejection rate of 99.99% or more.