Columnar structured material, electrode having columnar structured material, and production method therefor

Abstract

To obtain a microcolumnar structured material having a desired material. The columnar structured material includes columnar members 15 obtained by introducing a filler into columnar holes formed in a porous material. The porous material has the columnar holes 14 formed by removing columnar substances from a structured material in which the columnar substances 12 containing a first component are dispersed in a matrix member 13 containing a second component capable of forming a eutectic with the first component. The matrix member 13 may be removed. In the columnar structured material, the filler is a conductive material, and an electrode can be structured by electrically connecting the conductive materials in at least a part of a plurality of holes to a conductor.

1 . A columnar structured material obtained by introducing a filler into columnar holes formed in a porous material, 
 wherein the porous material has the columnar holes formed by removing columnar substances from a structured material in which the columnar substances containing a first component are dispersed in a matrix member containing a second component capable of forming a eutectic with the first component.    
   
   
       2 . The columnar structured material according to  claim 1 , wherein the structured material has a thin film form.  
   
   
       3 . The columnar structured material according to  claim 1 , wherein the columnar structured material is obtained by introducing the filler into the columnar holes after subjecting the porous material to chemical treatment.  
   
   
       4 . The columnar structured material according to  claim 3 , wherein the chemical treatment is oxidation treatment.  
   
   
       5 . The columnar structured material according to  claim 1 , wherein the columnar substance is aluminum, the matrix member is of silicon, and the proportion of silicon to the structured material is in a range from 20 atomic % to 70 atomic %.  
   
   
       6 . The columnar structured material according to  claim 1 , wherein the columnar substance is aluminum, the matrix member is of germanium, and the proportion of germanium to the structured material is in a range from 20 atomic % to 70 atomic %.  
   
   
       7 . The columnar structured material according to  claim 1 , wherein a main component of the porous material is silicon.  
   
   
       8 . The columnar structured material according to  claim 1 , wherein a main component of the porous material is germanium.  
   
   
       9 . The columnar structured material according to  claim 1 , wherein the diameter of a filler region of the columnar structured material is in a range from 0.5 nm to 15 nm.  
   
   
       10 . The columnar structured material according to  claim 1 , wherein the interval between filler regions of the columnar structured material is in a range from 5 nm to 20 nm.  
   
   
       11 . The columnar structured material according to  claim 1 , wherein the columnar substance is a crystalline substance, and the matrix member is of an amorphous substance.  
   
   
       12 . The columnar structured material according to  claim 1 , wherein the filler introduced into the holes of the porous material is a metal or a semiconductor.  
   
   
       13 . The columnar structured material according to  claim 1 , wherein the matrix member is removed from the columnar structured material.  
   
   
       14 . An electrode having the columnar structured material according to  claim 13 , wherein the filler is a conductive material, the conductive material in at least a part of a plurality of holes being electrically connected to a conductor.  
   
   
       15 . A method for producing a columnar structured material, comprising: a step of preparing a structured material in which columnar substances containing a first component are dispersed in a matrix member containing a second component capable of forming a eutectic with the first component; a removing step of removing the columnar substances; and an introducing step of introducing a filler into columnar holes that are formed in a porous material in the removing step.  
   
   
       16 . The method for producing a columnar structured material according to  claim 15 , comprising an additional step of subjecting the porous material to chemical treatment after the removing step.,  
   
   
       17 . The method for producing a columnar structured material according to  claim 15 , wherein the removing step is performed by etching.  
   
   
       18 . The method for producing a columnar structured material according to  claim 15 , wherein the introducing step is performed by electrodeposition.  
   
   
       19 . The method for producing a columnar structured material according to  claim 15 , wherein the introducing step is performed by electroless deposition.  
   
   
       20 . The method for producing a columnar structured material according to  claim 15 , wherein the introducing step is performed by catalytic reaction after forming a catalyst in a bottom portion of the hole.