Method for the deposition of an alloy on a substrate

Abstract

In previously known electrodeposition methods, alloys can be deposited only badly on a substrate from the components thereof. The inventive method allows an alloy layer to be deposited on a substrate by pulsing the current/voltage used for electrode position.

1 - 9 . (canceled)  
   
   
       10 . A method for the electrolytic deposition of an alloy at least two constituents as a layer on a substrate, comprising: 
 arranging the alloy in an electrolyte and the at least two constituents of the alloy are suspended and/or dissolved;    using a plurality of repeated voltage pulses for the electrolytic deposition and combined in a sequence that comprises at least two different blocks;    adapting one block in each case to a constituent of the alloy to achieve optimum deposition of the constituent and a block comprising two or more voltage pulses, and following a first block of a sequence by a second block in the same sequence of the same polarity and the second block has a higher or lower voltage level on account of being adapted to one constituent of the alloy.    
   
   
       11 . The method as claimed in  claim 10 , wherein mechanical vibrations are imparted to the electrolyte.  
   
   
       12 . The method as claimed in  claim 11 , wherein an ultrasound probe is operated in the electrolyte.  
   
   
       13 . The method as claimed in  claim 10 , wherein a current/voltage pulse is used for the electrolytic deposition and is defined by the current/voltage pulse time profile.  
   
   
       14 . The method as claimed in  claim 13 , wherein a current/voltage pulse time profile is a square-wave or a delta-wave form.  
   
   
       15 . The method as claimed in  claim 10 , wherein both a positive and a negative current/voltage pulses are used for the electrolytic deposition.  
   
   
       16 . The method as claimed in  claim 10 , wherein a block is defined by a number of current pulses, pulse duration, interpulse period, current intensity, and time profile.  
   
   
       17 . The method as claimed in  claim 10 , wherein an MCrAlY layer is deposited as an alloy on a substrate, with M being an element selected from the group consisting of iron, cobalt and nickel.  
   
   
       18 . The method as claimed in  claim 10 , wherein a gradient in the composition of the material is produced in an alloy layer.  
   
   
       19 . The method as claimed in  claim 10 , wherein a base current is superimposed on the current pulses and the interpulse periods.  
   
   
       20 . The method as claimed in  claim 10 , wherein a base current is superimposed on the current pulses or the interpulse periods.