Liquid immersion type exposure apparatus

Abstract

Disclosed is an exposure apparatus which includes a projection optical system for projecting a pattern of a reticle onto a substrate, wherein the substrate is exposed through a liquid medium kept at least in a portion between the substrate and an optical element of the projection optical system which optical element is nearest to the substrate, a supplying system for supplying a liquid medium, a collecting system for collecting a liquid medium, and an exhausting system for removing a bubble in the liquid medium through a bubble removing material having such property that it passes a gas but it does not pass a liquid.

1 . An exposure apparatus, comprising: 
 a projection optical system for projecting a pattern of a reticle onto a substrate, wherein the substrate is exposed through a liquid medium kept at least in a portion between the substrate and an optical element of said projection optical system which optical element is nearest to the substrate;    a supplying system for supplying a liquid medium;    a collecting system for collecting a liquid medium; and    an exhausting system for removing a bubble in the liquid medium between the substrate and said optical element through a porous material.    
   
   
       2 . An apparatus according to  claim 1 , wherein said supplying system and said exhausting system have a nozzle, and wherein the nozzle of said exhausting system is disposed at a side of the nozzle of said supplying system which side faces said optical element.  
   
   
       3 . An apparatus according to  claim 1 , wherein said supplying system and said collecting system have a nozzle, and wherein the nozzle of said collecting system is disposed at a side of the nozzle of said supplying system which side faces said optical element.  
   
   
       4 . An apparatus according to  claim 1 , wherein said supplying system supplies the liquid through a porous material.  
   
   
       5 . An apparatus according to  claim 1 , wherein said collecting system collects the liquid medium through a porous material.  
   
   
       6 . An apparatus according to  claim 4 , wherein the porous material of said supplying system has a property different from that of the porous material of said exhausting system.  
   
   
       7 . An apparatus according to  claim 5 , wherein the porous material of said collecting system has a property different from that of the porous material of said exhausting system.  
   
   
       8 . An exposure apparatus, comprising: 
 a projection optical system for projecting a pattern of a reticle onto a substrate, wherein the substrate is exposed through a liquid medium kept at least in a portion between the substrate and an optical element of said projection optical system which optical element is nearest to the substrate;    a supplying system for supplying a liquid medium through a first porous material; and    a collecting system for collecting a liquid medium through a second porous material,    wherein a surface of said first porous material disposed opposed to the substrate and a surface of said second porous material disposed opposed to the substrate are maintained at the same level with respect to the substrate.    
   
   
       9 . An apparatus according to  claim 8 , wherein the surfaces of said first and second porous materials are parallel to a surface of said optical element opposed to the substrate.  
   
   
       10 . An apparatus according to  claim 8 , wherein the surfaces of said first and second porous materials and the surface of said optical element opposed to the substrate are maintained at the same level with respect to the substrate.  
   
   
       11 . An exposure apparatus, comprising: 
 a projection optical system for projecting a pattern of a reticle onto a substrate, wherein the substrate is exposed through a liquid medium kept at least in a portion between the substrate and an optical element of said projection optical system which optical element is nearest to the substrate; and    a collecting system for collecting a fluid through a porous material, said collecting system including a holding member for holding the porous material;    wherein a surface of the porous material disposed opposed to the substrate and a surface of said holding member are maintained at the same level with respect to the substrate.    
   
   
       12 . An apparatus according to  claim 11 , wherein said collecting system collects a bubble in the liquid medium between the substrate and the optical element through the porous material.  
   
   
       13 . A device manufacturing method, comprising the steps of: 
 exposing a substrate by use of an exposure apparatus as recited in  claim 1;  and    developing the exposed substrate.    
   
   
       14 . A device manufacturing method, comprising the steps of: 
 exposing a substrate by use of an exposure apparatus as recited in  claim 8;  and    developing the exposed substrate.    
   
   
       15 . A device manufacturing method, comprising the steps of: 
 exposing a substrate by use of an exposure apparatus as recited in  claim 11;  and    developing the exposed substrate.