Method and apparatus for thermal development having a textured support

Abstract

The invention is a method and apparatus for forming a relief structure by thermally developing a photosensitive element containing a composition layer capable of being partially liquefied. During thermal development, the photosensitive element is supported on a base member having an exterior surface that is textured. The textures for the exterior surface include a particular surface roughness and/or patterns.

1 . A method for forming a relief structure from a photosensitive element having an exterior surface and an interior surface and containing a composition layer capable of being partially liquefied comprising: 
 supplying a development medium to the exterior surface with a first member;    supporting the photosensitive element on a base member having an exterior surface, wherein the interior surface of the element is adjacent the exterior surface of the base member; and    wherein the exterior surface of the base member has a texture selected from the group consisting of a) a surface having a roughness, Rq, of at least 1 micron when measured over a 250 to 1000 micron length scale;    b) a surface having a pattern of grooves, channels, peaks, connected cells, or a combination of grooves, channels, peaks, connected cells; and    c) a surface having a combination of the roughness and the pattern of grooves, channels, peaks, and connected cells.    
   
   
       2 . The method of  claim 1  wherein the texture of the surface is the pattern of grooves, channels, peaks, connected cells, or combinations thereof and the pattern can be regular or irregular.  
   
   
       3 . The method of  claim 1  wherein the channels, grooves, peaks, connected cells, and combinations of grooves, channels, peaks, and connected cells, each form a plurality of macroelements in the exterior surface wherein a recess depth of at least 20 micron to 200 microns is created from one macroelement to an adjacent macroelement.  
   
   
       4 . The method of  claim 1  further comprising forming the pattern by embossing, etching, engraving, molding, or combinations thereof.  
   
   
       5 . The method of  claim 1  further comprising applying a layer of a modification material to the base member wherein the layer of material forms the exterior surface having texture.  
   
   
       6 . The method of  claim 5  wherein the layer is resilient or tacky.  
   
   
       7 . The method of  claim 5  wherein the modification material is selected from the group consisting of natural rubbers, synthetic rubbers, and elastomers.  
   
   
       8 . The method of  claim 5  further comprising treating the layer with a treatment selected from the group consisting of embossing, etching, engraving, molding, and photoimaging, wherein the treated layer of material forms the exterior surface having texture.  
   
   
       9 . The method of  claim 5  wherein the applying of the layer is with a texturing spray gun.  
   
   
       10 . The method of  claim 5  wherein the layer further comprises a roughening component.  
   
   
       11 . The method of  claim 5  further comprising forming the layer from a photosensitive elastomeric element.  
   
   
       12 . The method of  claim 1  wherein the base member is a selected from the group consisting of a drum, a roller, a platform member, a flexible support member, and a planar support.  
   
   
       13 . The method of  claim 1  further comprising placing a flexible support member between the base member and the element, wherein the flexible support member has a surface which is the exterior surface having texture.  
   
   
       14 . The method of  claim 13  further comprising applying a layer of a modification material to the flexible support member wherein the layer of material forms the exterior surface having texture.  
   
   
       15 . The method of  claim 13  further comprising adding at least one layer to the flexible support member selected from the group consisting of a resilient layer, a tacky layer, a protective layer, a resilient and tacky layer, and combinations thereof.  
   
   
       16 . The method of  claim 13  wherein the flexible support member comprises an aluminum sheet having a layer of silicone rubber on one side and a tacky layer on the silicone rubber layer, and wherein at least the tacky layer has texture.  
   
   
       17 . The method of  claim 13  further comprising forming the flexible support member from a photosensitive elastomeric element.  
   
   
       18 . The method of  claim 17  further comprising imagewise exposing the photosensitive elastomeric element to form the pattern of grooves, channels, peaks, connected cells.  
   
   
       19 . The method of  claim 17  wherein the photosensitive elastomeric element includes a layer of a photosensitive composition, the layer having a surface that is the exterior surface.  
   
   
       20 . The method of  claim 17  wherein the photosensitive elastomeric element includes a layer of a photosensitive composition, the layer having a surface that is the exterior surface, wherein the exterior surface has a tack less than 600 grams.  
   
   
       21 . The method of  claim 1  wherein the surface roughness, Rq, is at least 1 micron when measured over-a 250 to 750 micron length scale.  
   
   
       22 . The method of  claim 1  wherein the surface roughness, Rq, is at least 5 micron when measured over a 700 to 750 micron length scale.  
   
   
       23 . The method of  claim 1  further comprising applying a layer of an elastomeric material to the base member that forms the exterior surface of the base member and has the texture.  
   
   
       24 . The method of  claim 1  wherein the exterior surface defines a plane that is characterized by a plurality of surface projections from the plane.  
   
   
       25 . The method of  claim 1  wherein the exterior surface defines a plane containing a plurality of projections and a plurality of pits that have a height relative to the plane, wherein an average height of the projections and pits is positive.  
   
   
       26 . The method of  claim 1  wherein the exterior surface defines a plane containing a plurality of projections and a plurality of pits, each having a height relative to the plane and a deviation from an average surface height, wherein at least 60% of a range of the deviations from the average height are projections above the average surface height.  
   
   
       27 . The method of  claim 1  wherein the exterior surface defines a plane containing a plurality of projections such that at least 60% of the surface is covered with projections.  
   
   
       28 . The method of  claim 1  further comprising heating the exterior surface of the element to a temperature sufficient to cause a portion of the layer to liquefy.  
   
   
       29 . The method of  claim 1  further comprising contacting the exterior surface of the photosensitive element with a development medium to allow at least a portion of the liquefied material of the composition layer to be absorbed by the development medium.  
   
   
       30 . The method of  claim 29  further comprising separating the photosensitive element from the development medium.  
   
   
       31 . The method of  claim 29  wherein the contacting comprises pressing the photosensitive element and the development medium into contact at a pressure sufficient for at least a portion of the liquefied material of the composition layer to be absorbed by the development medium.  
   
   
       32 . The method of  claim 1  wherein the exterior surface has a tack of less than 40 grams.  
   
   
       33 . The method of  claim 1  wherein the exterior surface has a tack of less than 10 grams.  
   
   
       34 . The method of  claim 1  further comprising heating the exterior surface of the element to a temperature sufficient to cause a portion of the layer to liquefy, wherein the heating is selected from the group consisting of a first heating which applies heat to an exterior surface of the composition layer adjacent where a development medium contacts the layer, the first heating adapted to heat the exterior surface of the layer; 
 a second heating to heat the first member to a temperature capable of heating the exterior surface of the composition layer while the development medium is contacting the exterior surface of the layer;    a third heating to heat the base member to a temperature capable of heating the exterior surface of the composition layer;    combination of the first heating and the second heating;    combination of the first heating and the third heating;    combination of the second heating and the third heating; and    combination of the first heating, the second heating, and the third heating,    wherein the first heating, the second heating, and the third heating, individually or in the above combinations, is capable of heating the exterior surface of the composition layer sufficiently to cause a portion of the layer to liquefy.    
   
   
       35 . A method for forming a relief structure from a photosensitive element having an exterior surface and an interior surface and containing a composition layer capable of being partially liquefied comprising: 
 supplying a development medium to the exterior surface with a first member;    supporting the photosensitive element on a base member having an exterior surface, wherein the interior surface of the element is adjacent the exterior surface of the base member; and    wherein the exterior surface of the base member has a texture with a surface roughness, Rq, of at least 3 micron when measured over a 500 to 3000 micron length scale.    
   
   
       36 . The method of  claim 35  wherein the surface roughness, Rq, is at least 5 micron when measured over a 700 to 3000 micron length scale.  
   
   
       37 . The method of  claim 35  wherein the surface roughness, Rq, is 3 to 25 micron when measured over a 700 to 3000 micron length scale.  
   
   
       38 . The method of  claim 35  wherein the surface roughness, Rq, is 5 to 15 micron when measured over a 700 to 3000 micron length scale.  
   
   
       39 . An apparatus for forming a relief structure from a photosensitive element having an exterior surface and an interior surface and containing a composition layer capable of being partially liquefied comprising: 
 means for supplying a development medium to the exterior surface with a first member;    means for supporting the photosensitive element on a base member having an exterior surface, wherein the interior surface of the element is adjacent the exterior surface of the base member; and    wherein the exterior surface of the base member has a texture selected from the group consisting of    a) a surface having a roughness, Rq, of at least 1 micron when measured over a 250 to 1000 micron length scale;    b) a surface having a pattern of grooves, channels, peaks, connected cells, or a combination of grooves, channels, peaks, connected cells; and    c) a surface having a combination of the roughness and the pattern of grooves, channels, peaks, and connected cells.    
   
   
       40 . The apparatus of  claim 39  wherein the texture of the surface is the pattern of grooves, channels, peaks, connected cells, or combinations thereof and the pattern can be regular or irregular.  
   
   
       41 . The apparatus of  claim 39  wherein the channels, grooves, peaks, connected cells, and combinations of grooves, channels, peaks, and connected cells, each form a plurality of macroelements in the exterior surface wherein a recess depth of at least 20 micron to 200 microns is created from one macroelement to an adjacent macroelement.  
   
   
       42 . The apparatus of  claim 39  wherein the base member further comprises a layer of a modification material that forms the exterior surface having texture.  
   
   
       43 . The apparatus of  claim 42  wherein the layer is resilient or tacky.  
   
   
       44 . The apparatus of  claim 42  wherein the modification material is selected from the group consisting of natural rubbers, synthetic rubbers, and elastomers.  
   
   
       45 . The apparatus of  claim 42  wherein the layer is treated with a treatment selected from the group consisting of embossing, etching, engraving, molding, and photoimaging, wherein the treated layer of material forms the exterior surface having texture.  
   
   
       46 . The apparatus of  claim 42  wherein the layer is applied with a texturing spray gun.  
   
   
       47 . The apparatus of  claim 42  wherein the base member is a selected from the group consisting of a drum, a roller, a platform member, a flexible support member, and a planar support.  
   
   
       48 . The apparatus of  claim 39  further comprising a flexible support member between the base member and the element, wherein the flexible support member has a surface which is the exterior surface having texture.  
   
   
       49 . The apparatus of  claim 48  further comprising a layer of a modification material on the flexible support member on a side opposite the base member, wherein the layer of material forms the exterior surface having texture.  
   
   
       50 . The apparatus of  claim 49  wherein the layer is selected from the group consisting of a resilient layer, a tacky layer, a protective layer, a resilient and tacky layer, and combinations thereof.  
   
   
       51 . The apparatus of  claim 48  wherein the flexible support member comprises an aluminum sheet having a layer of silicone rubber on one side and a tacky layer on the silicone rubber layer, and wherein at least the tacky layer has texture.  
   
   
       52 . The apparatus of  claim 39  wherein the surface roughness, Rq, is at least 1 micron when measured over a 250 to 750 micron length scale.  
   
   
       53 . The apparatus of  claim 39  wherein the surface roughness, Rq, is at least 5 micron when measured over a 700 to 750 micron length scale.  
   
   
       54 . The apparatus of  claim 39  wherein the exterior surface defines a plane containing a plurality of projections and a plurality of pits that each have a height relative to the plane which determine an average height, wherein the average height of the projections and pits is positive.  
   
   
       55 . The apparatus of  claim 39  wherein the exterior surface defines a plane containing a plurality of projections and a plurality of pits, each having a height relative to the plane and a deviation from an average surface height, wherein at least 60% of a range of the deviations from the average height are projections above the average surface height.  
   
   
       56 . The apparatus of  claim 39  further comprising means for heating the exterior surface of the element to a temperature sufficient to cause a portion of the layer to liquefy.  
   
   
       57 . The apparatus of  claim 39  further comprising means for contacting the exterior surface of the photosensitive element with a development medium to allow at least a portion of the liquefied material of the composition layer to be absorbed by the development medium.  
   
   
       58 . The apparatus of  claim 39  further comprising means for separating the photosensitive element from the development medium.  
   
   
       59 . The apparatus of  claim 39  further comprising means for pressing the photosensitive element and the development medium into contact at a pressure sufficient for at least a portion of the liquefied material of the composition layer to be absorbed by the development medium.  
   
   
       60 . The apparatus of  claim 39  wherein the exterior surface has a tack of less than 40 grams.  
   
   
       61 . The method of  claim 1  wherein the exterior surface defines a plane that is characterized by a plurality of surface projections from the plane wherein the exterior surface has a density of projections of at least 0.1 projections/mm 2  that are at least 10 microns in height above the plane.  
   
   
       62 . The method of  claim 61  wherein the projections have an average area of less than 5 mm 2 .  
   
   
       63 . The method of  claim 61  wherein the projections have an average area of 0.05-1 mm 2 .