Method and apparatus for forming patterned photosensitive material layer

Abstract

A method for forming a patterned photosensitive material layer over a substrate is described. A photosensitive material layer is formed on a substrate and then exposed. The selected parameters of the photosensitive material layer or between the photosensitive material layer and the predetermined layer are measured for determining whether the exposed patterns of the photosensitive material layer are acceptable. A development step is performed when the exposed patterns of the photosensitive material layer are found to be acceptable. An apparatus for forming a patterned photosensitive material layer is also described, which utilizes the aforementioned method and has a mechanism capable of feeding back offsets of the measured parameters in real time for reducing the cycle time and the rework time in the lithography process.

1 . A method for forming a patterned photosensitive material layer, the method comprising: 
 (a) forming a photosensitive material layer over a substrate;    (b) exposing the photosensitive material layer and measuring an parameter of the photosensitive material layer;    (c) determining whether the measured parameter is acceptable or not; and    (d) developing the photosensitive material layer if the measured parameter is acceptable.    
   
   
       2 . The method of  claim 1 , further comprising the following process before the step (d) if the measured parameter is not acceptable: 
 repeating a step (e) of removing the photosensitive material layer and the steps (a), (b) and (c) in sequence for at least one cycle until the measured parameter is determined to be acceptable in step (c), wherein an exposure condition in step (b) of each cycle is calibrated according to the parameter measured in step (b) of the preceding cycle.    
   
   
       3 . The method of  claim 1 , wherein the step of exposing the photosensitive material layer produces a latent image in the photosensitive material layer, and the step of measuring the parameter comprises: 
 providing a laser beam; and    scanning the latent image with the laser beam and analyzing a signal generated from the laser scanning to obtain a line-width of the latent image.    
   
   
       4 . The method of  claim 1 , wherein the step of measuring the parameter comprises: 
 providing a laser beam; and    scanning exposed portions and non-exposed portions of the photosensitive material layer with the laser beam and analyzing a signal generated from the laser scanning to obtain a thickness difference between the exposed portions and the non-exposed portions of the photosensitive material layer.    
   
   
       5 . The method of  claim 1 , wherein the step of measuring the parameter comprises: 
 providing a laser beam; and    scanning the photosensitive material layer with the laser beam and analyzing a signal generated from the laser scanning to obtain a thickness difference of the photosensitive material layer over the substrate.    
   
   
       6 . A method for forming a patterned photosensitive material layer, the method comprising: 
 (a) forming a photosensitive material layer over a substrate;    (b) using an exposure/measurement tool to expose the photosensitive material layer to form a latent image in the photosensitive material layer and using the exposure/measurement tool to measure a parameter of the photosensitive material layer;    (c) comparing the measured parameter with a predetermined value; and    (d) developing the photosensitive material layer if the measured parameter is smaller than the predetermined value.    
   
   
       7 . The method of  claim 6 , further comprising the following process before step (d) if the measured parameter is larger than the predetermined value: 
 repeating a step (e) of removing the photosensitive material layer and the steps (a), (b) and (c) in sequence for at least one cycle until the measured parameter is found to be smaller than the predetermined value in step (c), wherein an exposure condition in step (b) of each cycle is calibrated according to the parameter measured in step (b) of the preceding cycle.    
   
   
       8 . The method of  claim 7 , wherein calibrating the exposure condition according to the measured parameter comprises: 
 feeding back a control signal generated based on the measured parameter to the exposure/measurement tool to order the exposure/measurement tool to calibrate the exposure condition.    
   
   
       9 . The method of  claim 6 , wherein measuring the parameter comprises: 
 scanning the latent image with a laser beam provided by the exposure/measurement tool; and    analyzing a signal generated from the laser scanning to derive a line-width of the latent image.    
   
   
       10 . The method of  claim 6 , wherein the step of measuring the parameter comprises: 
 scanning the photosensitive material layer with a laser beam provided by the exposure/measurement tool; and    analyzing a signal generated from the laser scanning to obtain a thickness difference between the exposed portions and the non-exposed portions of the photosensitive material layer.    
   
   
       11 . The method of  claim 6 , wherein the step of measuring the parameter comprises: 
 scanning the photosensitive material layer with a laser beam provided by the exposure/measurement tool; and    analyzing a signal generated from the laser scanning to obtain a thickness difference of the photosensitive material layer over the substrate.    
   
   
       12 . An apparatus for forming a patterned photosensitive material layer, comprising: 
 a photosensitive material coating tool for coating a photosensitive material layer on a substrate;    an exposure/measurement tool for exposing the photosensitive material layer to form a latent image therein and for measuring a parameter of the photosensitive material layer;    a development tool for developing the photosensitive material layer; and    a substrate carrying tool connected between the photosensitive material coating tool, the exposure/measurement tool and the development tool.    
   
   
       13 . The apparatus of  claim 12 , further comprising a photosensitive material removal tool that is connected with the exposure/measurement tool via the substrate carrying tool.  
   
   
       14 . The apparatus of  claim 13 , wherein the photosensitive material removal tool is connected with the photosensitive material coating tool via the substrate carrying tool.  
   
   
       15 . The apparatus of  claim 13 , wherein the substrate carrying tool carries the substrate to the photosensitive material removal tool or the development tool according to a value of the parameter.  
   
   
       16 . The apparatus of  claim 12 , wherein the exposure/measurement tool comprises: 
 an exposure module for forming a latent image in the photosensitive material layer; and    a measurement module for measuring the parameter of the photosensitive material and for feeding back a control signal generated based on the measured parameter to the exposure module.    
   
   
       17 . The apparatus of  claim 16 , wherein the exposure module comprises: 
 an exposure light source disposed over the substrate; and    a photomask disposed between the exposure light source and the substrate.    
   
   
       18 . The apparatus of  claim 16 , wherein the measurement module comprises: 
 a laser light source for scanning a line-width of the latent image in the photosensitive material layer;    a signal reception device for receiving a test signal generated from the laser scanning that contains information of the line-width; and    a signal feedback device for generating the control signal based on the test signal and for feeding back the control signal to the exposure module.    
   
   
       19 . The apparatus of  claim 16 , wherein the measurement module comprises: 
 a laser light source for scanning the photosensitive material layer;    a signal reception device for receiving a test signal generated from the laser scanning that contains information of a thickness difference of the photosensitive material layer on the substrate; and    a signal feedback device for generating the control signal based on the test signal and for feeding back the control signal to the exposure module.