Buffer layer in flat panel display

Abstract

In devices such as flat panel displays, an aluminum oxide layer is provided between an aluminum layer and an ITO layer when such materials would otherwise be in contact to protect the ITO from optical and electrical defects sustained, for instance, during anodic bonding and other fabrication steps. This aluminum oxide barrier layer is preferably formed either by: (1) partially or completely anodizing an aluminum layer formed over the ITO layer, or (2) an in situ process forming aluminum oxide either over the ITO layer or over an aluminum layer formed on the ITO layer. After either of these processes, an aluminum layer is then formed over the aluminum oxide layer.

1 . A tin oxide/aluminum structure, comprising: 
 a tin oxide layer over a substrate;    an aluminum oxide layer over the tin oxide layer; and    an aluminum layer over the aluminum oxide layer.    
   
   
       2 . The structure of  claim 1 , wherein the tin oxide layer comprises indium tin oxide.  
   
   
       3 . The structure of  claim 1 , further comprising a second aluminum layer between the tin oxide layer and the aluminum oxide layer.  
   
   
       4 . The structure of  claim 3 , wherein the second aluminum layer has a thickness of between about 1000 and 5000 Å.  
   
   
       5 . The structure of  claim 1 , wherein the aluminum oxide layer has a thickness of between about 100 and 10,000 Å.  
   
   
       6 . The structure of  claim 5 , wherein the aluminum oxide layer has a thickness of between about 300 and 5,000 Å.  
   
   
       7 . The structure of  claim 6 , wherein the aluminum oxide layer has a thickness of between about 500 and 1,500 Å.  
   
   
       8 . The structure of  claim 1 , wherein the aluminum layer over the aluminum oxide layer has a thickness of between about 4,500 and 6,000 Å.  
   
   
       9 . The structure of  claim 1 , wherein the aluminum oxide layer comprises AlO x  where x is between about 0.25 and 1.5.  
   
   
       10 . A display device structure, comprising: 
 a substrate;    an electrically conductive and optically transparent layer over the substrate;    an aluminum oxide layer over the electrically conductive and optically transparent layer; and    an aluminum layer over the aluminum oxide layer.    
   
   
       11 . The structure of  claim 10 , wherein the electrically conductive and optically transparent layer comprises indium tin oxide.  
   
   
       12 . The structure of  claim 10 , further comprising a second aluminum layer between the electrically conductive and optically transparent layer and the aluminum oxide layer.  
   
   
       13 . The structure of  claim 10 , wherein the aluminum oxide layer has a thickness of between about 500 and 1,500 Å.  
   
   
       14 . The structure of  claim 10 , wherein the aluminum layer over the aluminum oxide layer has a thickness of between about 4,500 and 6,000 Å.  
   
   
       15 . The structure of  claim 10 , wherein the aluminum oxide layer comprises AlO x  where x is between about 0.25 and 1.5.