Simultaneous and selective partitioning of via structures using plating resist
Abstract
Systems and methods for simultaneously partitioning a plurality of via structures into electrically isolated portions by using plating resist within a PCB stackup are disclosed. Such via structures are made by selectively depositing plating resist in one or more locations in a sub-composite structure. A plurality of sub-composite structures with plating resist deposited in varying locations are laminated to form a PCB stackup of a desired PCB design. Through-holes are drilled through the PCB stackup through conductive layers, dielelectric layers and through the plating resist. Thus, the PCB panel has multiple through-holes that can then be plated simultaneously by placing the PCB panel into a seed bath, followed by immersion in an electroless copper bath. Such partitioned vias increase wiring density and limit stub formation in via structures. Such partitioned vias allow a plurality of electrical signals to traverse each electrically isolated portion without interference from each other.
Claims
exact text as granted — not AI-modified1 . A multilayer PCB, said multilayer PCB comprising:
at least one sub-composite structure having a dielectric layer sandwiched between a first conductive layer and a second conductive layer; wherein said first conductive layer includes a clearance filled with plating resist; and a through-hole drilled through said multilayer PCB and passing through said plating resist, wherein an interior surface of said through-hole is plated with conductive material in areas of said interior surface that are devoid of said plating resist to form a partitioned via structure through said multilayer PCB.
2 . A sub-composite structure for use with a multilayer PCB, said sub-composite structure comprising:
a dielectric layer sandwiched between two conductive layers; and wherein one conductive layer of said two conductive layers includes a clearance filled with plating resist.
3 . A multilayer PCB, said multilayer PCB comprising:
at least one sub-composite structure having:
a dielectric layer sandwiched between a first conductive layer and a second conductive layer; and
a first through-hole drilled through said at least one sub-composite structure passing through first conductive layer, said dielectric layer and said second conductive layer, wherein said first through-hole being filled with plating resist;
a second through-hole drilled through said multilayer PCB and passing through said plating resist, wherein an interior surface of said second through-hole is plated with conductive material in areas that are devoid of said plating resist to form a partitioned via structure through said multilayer PCB.
4 . A sub-composite structure for use with a multilayer PCB, said sub-composite structure comprising:
a dielectric layer sandwiched between a first conductive layer and a second conductive layer; and a through-hole drilled through said sub-composite structure passing through said first conductive layer, said dielectric layer and said second conductive layer, wherein said through-hole is filled with plating resist.
5 . A multilayer PCB, said multilayer PCB comprising:
at least one sub-composite structure having:
a dielectric layer sandwiched between a first conductive layer and a second conductive layer; and
a blind-hole drilled through said first conductive layer and said dielectric layer, wherein said blind-hole being filled with plating resist;
a through-hole drilled through said multilayer PCB and passing through said plating resist, wherein an interior surface of said through-hole is plated with conductive material in areas that are devoid of said plating resist to form a partitioned via structure through said multilayer PCB.
6 . A sub-composite structure for use with a multilayer PCB, said sub-composite structure comprising:
a dielectric layer sandwiched between a first conductive layer and a second conductive layer; and a blind-hole drilled through said first conductive layer and said dielectric layer, wherein said blind-hole being filled with plating resist.
7 . A multilayer PCB, said multilayer PCB comprising:
at least one sub-composite structure having:
a dielectric layer sandwiched between a first conductive layer and a second conductive layer, wherein said first conductive layer includes region that exposes a portion of said dielectric layer; and
a selective deposit of plating resist deposited on said exposed dielectric;
a through-hole drilled through said multilayer PCB and passing through said layer of plating resist, wherein an interior surface of said through-hole is plated with conductive material in areas that are devoid of said plating resist to form a partitioned via structure through said multilayer PCB.
8 . A sub-composite structure for use with a multilayer PCB, said sub-composite structure comprising:
a dielectric layer sandwiched between a first conductive layer and a second conductive layer, wherein said first conductive layer includes region that exposes a portion of said dielectric layer; and a selective deposit of plating resist deposited on said exposed dielectric.
9 . A multilayer PCB, said multilayer PCB comprising:
at least one sub-composite structure having:
a dielectric layer sandwiched between a conductive pad and a conductive layer; and
a selective deposit of plating resist deposited on said conductive pad;
a through-hole drilled through said multilayer PCB and passing through said layer of plating resist, wherein an interior surface of said through-hole is plated with conductive material in areas that are devoid of said plating resist to form a partitioned via structure through said multilayer PCB.
10 . A sub-composite structure for use with a multilayer PCB, said sub-composite structure comprising:
a dielectric layer sandwiched between a conductive pad and a conductive layer, and a selective deposit of plating resist deposited on said conductive pad.
11 . A method of partitioning via structures, the method comprising:
forming at least one clearance within one or more of a first conductive layer, a dielectric layer, and a second conductive layer of at least one sub-composite structure; and depositing plating resist in said at least one clearance.
12 . The method of claim 11 , further comprising:
laminating said at least one sub-composite structure to a multilayer PCB stackup; drilling a through-hole through said multilayer PCB stackup passing through each area of said plating resist; and processing said PCB stackup for plating an interior surface of each through-hole with a conductive material in areas that are devoid of said plating resist to form corresponding partitioned via structures through said multilayer PCB.
13 . The method of claim 12 , wherein said plating comprises using an electrolytic plating operation.
14 . The method of claim 12 , wherein said plating comprises using an electroless plating operation.
15 . The method of claim 11 , wherein said plating resist comprises an insulating hydrophobic resinous material that is resistant to a deposition of a catalytic species capable of catalyzing an electroless metal deposition.
16 . The method of claim 15 , wherein said insulating hydrophobic resinous material include one or more of: silicone resins, polyethylene resins, fluorocarbon resins, polyurethane resins, and acrylic resins.
17 . The method of claim 15 , wherein said insulating hydrophobic resinous material is used alone or in a combined composition with other resinous materials in amounts sufficient to maintain hydrophobic properties in said combined composition.
18 . The method of claim 11 , wherein said plating resist is a dry film.
19 . The method of claim 11 , wherein said plating resist comprises a paste or viscous liquid.
20 . The method of claim 12 , where said partitioned via structure is filled with any one of an electrically insulating, ohmically resistive paste and voltage switchable dielectric material to improve reliability or functionality.
21 . The method of claim 12 , where the insulating dielectric material is one or more of: FR4, epoxy glass, polyimide glass, ceramic hydrocarbon, polyimide film, resin impregnated woven glass, Teflon film, resin impregnated matte material, Kevlar, paper, resin dielectrics with dispersed nano-powders.
22 . The method of claim 11 , further comprising using a computer program to determine locations for selectively depositing said plating resist, and for generating information for use by one or more of a PCB design layout program and a computer aided manufacturing system for selectively depositing said plating resist and for routing circuit traces through said partitioned via structures.
23 . The method of claim 11 , further comprising depositing said plating resist at locations for backdrilling in pre-existing PCB designs that include backdrilling of via structures.
24 . The method of claim 11 , further comprising depositing said plating resist at locations separating two or more separate PCB subassemblies during sequential processing.Join the waitlist — get patent alerts
Track US2006199390A1 — get alerts on status changes and closely related new filings.
We store only your email — no account needed. See our privacy policy.