Insulating film, process for producing the same and electronic device using the same

Abstract

An insulating film formed by a method comprising: coating a film-forming composition containing a compound having a cage structure; and drying the coated composition, wherein the coated composition is irradiated with a light having a wavelength of 200 nm or less in at least one of during the drying and after the drying; a process for producing the same; and an electronic device having the same.

1 . An insulating film formed by a method comprising: 
 coating a film-forming composition containing a compound having a cage structure; and    drying the coated composition,    wherein the coated composition is irradiated with a light having a wavelength of 200 nm or less in at least one of during the drying and after the drying.    
     
     
         2 . The insulating film according to  claim 1 , 
 wherein the cage structure is a saturated hydrocarbon structure.    
     
     
         3 . The insulating film according to  claim 1 , 
 wherein a ratio of all carbon atoms of the cage structure to all carbon atoms of a total solid content of the film-forming composition is 30% or more.    
     
     
         4 . The insulating film according to  claim 1 , 
 wherein the cage structure is a diamantane structure.    
     
     
         5 . The insulating film according to  claim 4 , 
 wherein the compound having a cage structure is a polymer of at least one compound represented by formula (I)                          wherein R represents a hydrogen atom, an alkyl group containing from 1 to 10 carbon atoms, an alkenyl group containing from 2 to 10 carbon atoms, an alkynyl group containing from 2 to 10 carbon atoms, an aryl group containing from 6 to 20 carbon atoms or a silyl group containing from 0 to 20 carbon atoms, and when a plurality of R's exist, they may be the same or different from each other;    m represents an integer of from 1 to 14;    X represents a halogen atom, an alkyl group containing from 1 to 10 carbon atoms, an alkenyl group containing from 2 to 10 carbon atoms, an aryl group containing from 6 to 20 carbon atoms or a silyl group containing from 0 to 20 carbon atoms, and when a plurality of X's exist, they may be the same or different from each other; and    n represents an integer of from 0 to 13.    
     
     
         6 . The insulating film according to  claim 1 , 
 wherein the compound having a cage structure is a compound that does not contain a nitrogen atom.    
     
     
         7 . The insulating film according to  claim 1 , 
 wherein the film-forming composition contains an organic solvent.    
     
     
         8 . A process for producing an insulating film according to  claim 1 , the process comprising: 
 a step of coating a film-forming composition containing a compound having a cage structure; and    a step of drying the coated composition,    wherein the coated composition is irradiated with a light having a wavelength of 200 nm or less in at least one of during the drying and after the drying.    
     
     
         9 . An electronic device comprising an insulating film according to  claim 1.