US2006207624A1PendingUtilityA1

Method for flawless application of nail polish

47
Individually held — no corporate assignee on recordPriority: Mar 18, 2005Filed: Mar 18, 2005Published: Sep 21, 2006
Est. expiryMar 18, 2025(expired)· nominal 20-yr term from priority
Inventors:Elizabeth Klein
A45D 29/004
47
PatentIndex Score
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Claims

Abstract

This method for flawless application of nail polish is a simple four step processing involving the use of a water soluble facial masque, nail primer (if necessary) and running water.

Claims

exact text as granted — not AI-modified
1 . A method for the flawless application of nail polish comprising the steps of: 
 a) applying a facial masque material on the skin around the nail;    b) applying a nail primer to the surface of the nail to remove excess masque material (if required);    c) applying the nail polish;    d) washing away the facial masque, leaving a flawlessly polished nail.    
   
   
       2 . The method according to  claim 1  wherein the facial masque is water soluble and sets with a dry surface which is unaffected by contact with nail polish.  
   
   
       3 . The method according to  claim 1  wherein the facial masque may contain a moisturizing agent for the added benefit of improved nail and cuticle health.  
   
   
       4 . The method according to  claim 1  wherein the nail primer is a generally available alcohol-based product (typically used prior to the application of artificial nails) for the added benefit of reduced incidence of fungal and bacterial infection.

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