US2006210467A1PendingUtilityA1
Producing a stable catalyst for nanotube growth
Individually held — no corporate assignee on recordPriority: Mar 17, 2005Filed: Mar 17, 2005Published: Sep 21, 2006
Est. expiryMar 17, 2025(expired)· nominal 20-yr term from priority
B82Y 30/00D01F 9/1272D01F 9/127
36
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Claims
Abstract
A process ( 40 ) is provided for preparing a catalyst ( 20 ). A catalyst ( 20 ) is formed over a substrate ( 12 ). A gas ( 24 ) comprising hydrogen and carbon is applied to the catalyst ( 20 ), wherein a carbon seeding layer ( 26 ) is formed on the catalyst ( 20 ). Carbon nanotubes ( 28 ) may then be grown from the catalyst ( 20 ) having the carbon seeding layer thereon ( 26 ).
Claims
exact text as granted — not AI-modified1 . A method for preparing catalyst for carbon nanotube growth, comprising:
submitting the catalyst to a gas comprising hydrogen and carbon, including forming carbon seeding layer on the catalyst.
2 . The method of claim 1 wherein the submitting step comprises applying methane.
3 . The method of claim 1 wherein the submitting step comprises applying gas within a temperature range of 15° C. to 600° C.
4 . The method of claim 1 wherein the submitting step comprises applying gas at a temperature of about 200° C.
5 . The method of claim 1 wherein the forming step comprises forming the carbon seeding layer to a thickness of at least 5 nanometers.
6 . The method of claim 1 wherein the forming step comprises forming the carbon seeding layer to a thickness of about 10 nanometers.
7 . The method of claim 1 wherein the submitting step further includes reducing an oxide layer from the catalyst.
8 . A method for preparing a substrate for growing carbon nanotubes, comprising:
forming a catalyst over the substrate; applying a gas comprising hydrogen and carbon to the catalyst, wherein a carbon seeding layer is formed on the catalyst; growing the carbon nanotubes from the catalyst having the carbon seeding layer thereon.
9 . The method of claim 8 wherein the applying step comprises applying methane.
10 . The method of claim 8 wherein the applying step comprises applying gas within a temperature range of 15° C. to 600° C.
11 . The method of claim 8 wherein the applying step comprises applying gas at a temperature of about 200° C.
12 . The method of claim 8 wherein the forming step comprises forming the carbon seeding layer to a thickness of at least 5 nanometers.
13 . The method of claim 8 wherein the forming step comprises forming the carbon seeding layer to a thickness of about 10 nanometers.
14 . The method of claim 8 wherein the submitting step further includes reducing an oxide layer from the catalyst.
15 . A method for growing carbon nanotubes, comprising:
providing a substrate; depositing a metal layer on the substrate; forming a catalyst on the metal layer; and applying a gas comprising hydrogen and carbon thereby forming a carbon seeding layer on the catalyst.
16 . The method of claim 15 wherein the applying step comprises applying methane.
17 . The method of claim 15 wherein the applying step comprises applying the gas is within a temperature range of 15° C. to 600° C.
18 . The method of claim 15 wherein the applying step comprises applying the gas at a temperature of about 200° C.
19 . The method of claim 15 wherein the forming step comprises forming the carbon seeding layer to a thickness of at least 5 nanometers.
20 . The method of claim 15 wherein the forming a carbon seeding layer comprises forming the carbon seeding layer to a thickness of about 10 nanometers.
21 . The method of claim 15 wherein the applying step further includes removing an oxide seeding layer from the catalyst.Join the waitlist — get patent alerts
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