Real-time component monitoring and replenishment system for multicomponent fluids

Abstract

A multicomponent fluid composition monitoring and compositional control system, in which a component analysis is effected by titration or other analytical procedure, for one or more components of interest, and a computational means then is employed to determine and responsively adjust the relative amount or proportion of the one or more components in the multicomponent fluid composition, to maintain a predetermined compositional character of the multicomponent fluid composition. The system is usefully employed in semiconductor manufacturing photoresist and post-etch residue removal, in which the cleaning medium is a semi-aqueous solvent composition, and water is the monitored and responsively adjusted component.

1 . A multicomponent fluid composition monitoring and compositional control system, said monitoring and compositional control system comprising: 
 (a) a tank containing the multicomponent fluid composition;    (b) a recirculating system, wherein said multicomponent fluid composition is withdrawn from the tank and circulatingly flowed through at least a pump and a filter and returned to the tank;    (c) an analyzer unit comprising a sampling system and a reagent dispensing system, wherein said analyzer unit is constructed and arranged to monitor concentration of at least one component of the multicomponent fluid using a real-time methodology comprising spectroscopic analysis of near-infrared frequency fluctuation;    (d) a by-pass loop positioned downstream of the pump and the filter, wherein the multicomponent fluid is bled from the recirculating system to the analyzer unit for analysis therein; and    (e) a control unit, constructed and arranged to compare the results of the real-time methodology to pre-programmed specifications and responsively control dispensing of said at least one component from a source of said component into the multicomponent fluid using the reagent dispensing system to maintain the concentration of said at least one component in the multicomponent fluid,    wherein the multicomponent fluid is utilized in a fluid-using processing facility.    
   
   
       2 . The system of  claim 1 , wherein said processing facility comprises a semiconductor manufacturing facility.  
   
   
       3 . The system of  claim 2 , wherein the semiconductor manufacturing facility comprises a process selected from the group consisting of etching, chemical mechanical planarization (CMP), photolithography, chemical vapor deposition, spin-on coatings application, supercritical fluids cleaning operations, wafer solvent drying operations, and photoresist and post-etch residue removal.  
   
   
       4 . The system of  claim 1 , wherein the multicomponent fluid comprises a semi-aqueous solvent medium.  
   
   
       5 . The system of  claim 1 , wherein the control unit includes computational means and a display for visual observation of outputted data of the unit.  
   
   
       6 . A multicomponent fluid composition monitoring and compositional control system, said monitoring and compositional control system comprising: 
 (a) an analyzer unit comprising a sampling system and a reagent dispensing system, wherein said analyzer unit is constructed and arranged to monitor concentration of water in the multicomponent fluid using a real-time methodology selected from the group consisting of a Karl Fischer titration, measurement of multicomponent fluid conductivity, and ultrasonic energy response of the multicomponent fluid; and    (b) a control unit, constructed and arranged to compare results of the real-time methodology to pre-programmed specifications and responsively control dispensing of water from a source of water into the multicomponent fluid using the reagent dispensing system to maintain the concentration of water in the multicomponent fluid,    wherein: the multicomponent fluid is utilized in a fluid-using processing facility; and the sampling system is arranged to capture a sample deriving from a flow stream of said multicomponent fluid.    
   
   
       7 . The system of  claim 6 , wherein said processing facility comprises a semiconductor manufacturing facility.  
   
   
       8 . The system of  claim 7 , wherein the semiconductor manufacturing facility is adapted to conduct a process selected from the group consisting of etching, chemical mechanical planarization (CMP), photolithography, chemical vapor deposition, spin-on coatings application, supercritical fluids cleaning operations, wafer solvent drying operations, and photoresist and post-etch residue removal.  
   
   
       9 . The system of  claim 8 , wherein the semiconductor manufacturing facility is adapted to conduct a process for photoresist and post-etch residue removal.  
   
   
       10 . The system of  claim 6 , wherein the multicomponent fluid comprises a semi-aqueous solvent medium.  
   
   
       11 . The system of  claim 6 , wherein the multicomponent fluid comprises water and organic solvent components.  
   
   
       12 . The system of  claim 6 , wherein the semi-aqueous solvent medium comprises water and a photoresist stripping solvent.  
   
   
       13 . The system of  claim 6 , wherein the sampling system is arranged to capture a sample from a by-pass loop of a flow stream of said multicomponent fluid.  
   
   
       14 . The system of  claim 6 , wherein the real-time methodology comprises the measurement of multicomponent fluid conductivity.  
   
   
       15 . The system of  claim 6 , wherein said analyzer unit further comprises a bath of said multicomponent fluid from which sampling is conducted using the analyzer unit, and from which fluid is withdrawn from and flowed to the fluid-using processing facility.  
   
   
       16 . The system of  claim 6 , wherein the analyzer unit is constructed and arranged to conduct a Karl Fischer titration of the fluid withdrawn from the bath.  
   
   
       17 . The system of  claim 6 , wherein the pre-programmed specifications include volume of the bath being monitored, frequency of monitoring and a titration calculation factor for calibration.  
   
   
       18 . The system of  claim 6 , comprising a source of titration reagent(s) for conducting the Karl Fischer titration.  
   
   
       19 . The system of  claim 6 , comprising a dryer adapted for conducting pre-titration drying of at least one reagent for conducting the Karl Fischer titration.  
   
   
       20 . The system of  claim 6 , further comprising a constant-current module adapted for detection of the endpoint of the Karl Fischer titration.