Portable system for semiconductor manufacturing

Abstract

An automated system for use in semiconductor manufacturing may include a semiconductor reaction chamber, a solid-state laser mounted above a top surface of the semiconductor reaction chamber, and a gas delivery module connected to the semiconductor reaction chamber. The system may include a gas exhaust pump connected to the semiconductor reaction chamber, a temperature sensor connected to the semiconductor reaction chamber, and a housing surrounding the reaction chamber, the solid-state laser, the gas delivery module, the gas exhaust pump, and the temperature sensor, where the housing is portable.

1 . An automated system for use in semiconductor manufacturing, the system comprising: 
 a semiconductor reaction chamber;    a solid-state laser mounted above a top surface of the semiconductor reaction chamber;    a gas delivery module connected to the semiconductor reaction chamber;    a gas exhaust pump connected to the semiconductor reaction chamber;    a temperature sensor connected to the semiconductor reaction chamber; and    a housing surrounding the reaction chamber, the solid-state laser, the gas delivery module, the gas exhaust pump, and the temperature sensor, wherein the housing is portable.    
   
   
       2 . A semiconductor processing system, comprising: 
 a semiconductor reaction chamber;    a solid-state laser mounted above a top surface of the semiconductor reaction chamber;    a gas delivery module connected to the semiconductor reaction chamber;    a gas exhaust pump connected to the semiconductor reaction chamber; and    a housing surrounding the reaction chamber, the solid-state laser, the gas delivery module, and the gas exhaust pump, wherein the housing has a footprint on the order of 9.6 square feet and wherein the housing, the reaction chamber, the solid-state laser, the gas delivery module, and the gas exhaust pump collectively weigh on the order of 550 pounds.    
   
   
       3 . The semiconductor processing system of  claim 2 , wherein the housing has a width on the order of 42 inches.  
   
   
       4 . A portable system that removes residue from a surface of a substrate by converting the residue into a gaseous state via a gas mixture, the portable system comprising: 
 a substrate reaction chamber; and    a solid-state radiation source mounted above the reaction chamber, wherein the portable system has a footprint on the order of 9.6 square feet.    
   
   
       5 . The portable system of  claim 4 , wherein the solid-state radiation source is a solid-state laser.  
   
   
       6 . The portable system of  claim 4 , wherein the solid-state radiation source is a solid-state 355 nanometer laser.  
   
   
       7 . The portable system of  claim 4 , wherein the portable system weighs on the order of 550 pounds.  
   
   
       8 . The portable system of  claim 4 , further comprising: 
 a gas delivery module to deliver the gas mixture to the reaction chamber.    
   
   
       9 . The portable system of  claim 8 , wherein the gas mixture comprises ozone and oxygen in a concentration in a range of 10% to 15% ozone by volume.  
   
   
       10 . The portable system of  claim 8 , wherein the gas mixture further comprises a gas selected from alcohols, alcohol pre-cursors, methane, or hydrogen peroxide.  
   
   
       11 . The portable system of  claim 4 , further comprising: 
 a scan head to scan the illumination across the residue to clean substantially an entire surface of the substrate.    
   
   
       12 . The portable system of  claim 4 , further comprising: 
 a heated chuck and a temperature sensor to maintain the substrate at a determined temperature in a range of 20 degrees centigrade (° C.) to 120° C.    
   
   
       13 . The portable system of  claim 4 , further comprising: 
 a gas delivery subsystem connected to the reaction chamber;    an exhaust subsystem connected to the reaction chamber;    a heated chuck operating in the reaction chamber;    a temperature sensor connected to the reaction chamber or the heated chuck;    a scan head optically coupled to the solid-state radiation source;    a controller connected to the scan head; and    a housing containing the gas delivery subsystem, the exhaust subsystem, the heated chuck, the temperature sensor, the scan head, and the controller,    wherein the housing, the gas delivery subsystem, the exhaust subsystem, the heated chuck, the temperature sensor, the scan head, and the controller collectively weigh on the order of 550 pounds.    
   
   
       14 . A portable substrate cleaning system comprising: 
 a substrate reaction chamber;    a solid-state laser mounted above the substrate reaction chamber;    a gas delivery module connected to the substrate reaction chamber;    a gas exhaust pump connected to the substrate reaction chamber; and    a temperature sensor connected to the substrate reaction chamber, the substrate reaction chamber, the solid-state laser, the gas delivery module, the gas exhaust pump, and the temperature sensor collectively weighing less than 550 pounds.    
   
   
       15 . The portable substrate cleaning system of  claim 14 , wherein the solid-state laser is a 300 nanometer to 532 nanometer solid-state laser.  
   
   
       16 . The portable substrate cleaning system of  claim 14 , wherein the solid-state laser is a pulsed solid-state laser.  
   
   
       17 . The portable substrate cleaning system of  claim 16 , wherein the solid-state laser provides illumination to residue on a surface of a substrate, and wherein the portable cleaning system further comprises: 
 a scan head to scan the illumination across the residue on the surface.    
   
   
       18 . The portable substrate cleaning system of  claim 17 , further comprising: 
 a controller to cause the scan head to scan substantially an entire surface in a time interval of approximately three minutes, removing residue from substantially the entire surface.    
   
   
       19 . The portable substrate cleaning system of  claim 14 , wherein the gas delivery module provides a gas mixture comprising ozone and oxygen and a gas selected from alcohols, alcohol pre-cursors, methane, or hydrogen peroxide.  
   
   
       20 . The portable substrate cleaning system of  claim 14 , further comprising: 
 a vacuum pump maintaining the reaction chamber at a determined pressure in a range of 5 Torr to 760 Torr.    
   
   
       21 . The portable substrate cleaning system of  claim 14 , wherein the portable substrate cleaning system occupies a volume on the order of 59.4 cubic feet.  
   
   
       22 . A dry substrate cleaning system comprising: 
 a substrate reaction chamber;    a solid-state laser mounted above a top surface of the substrate reaction chamber;    a gas delivery module connected to the substrate reaction chamber;    a gas exhaust pump connected to the substrate reaction chamber; and    a temperature sensor connected to the substrate reaction chamber, the substrate reaction chamber, the solid-state laser, the gas delivery module, the gas exhaust pump, and the temperature sensor collectively weighing less than 550 pounds and collectively having a footprint on the order of 9.6 square feet.    
   
   
       23 . A dry substrate cleaning system comprising: 
 a substrate reaction chamber;    a solid-state laser mounted above a top surface of the substrate reaction chamber;    a gas delivery module connected to the substrate reaction chamber;    a gas exhaust pump connected to the substrate reaction chamber;    a temperature sensor connected to the substrate reaction chamber; and    a housing containing the substrate reaction chamber, the solid-state laser, the gas delivery module, the gas exhaust pump, and the temperature sensor, the housing having a width on the order of 42 inches.    
   
   
       24 . The dry substrate cleaning system of  claim 23  wherein the housing has a height on the order of 74 inches and a length on the order of 33 inches.