Sputtering targets and method for the preparation thereof

Abstract

A process for the preparation of a sputtering target which comprises sub-stoichiometric titanium dioxide, TiO x , where x is below 2, having an electrical resistivity of less than 0.5 ohm.cm, optionally together with niobium oxide, which process comprises plasma spraying titanium dioxide, TiO 2 , optionally together with niobium oxide, onto a target base in an atmosphere which is oxygen deficient and which does not contain oxygen-containing compounds, the target vase being coated with TiO x which is solidified by cooling under conditions which prevent the sub-stiochiometric titanium dioxide from combining with oxygen.

1 - 14 . (canceled)  
   
   
       15 . A large rotatable sputtering target which comprises a target based plasma coated under cooling with sub-stoichiometric titanium dioxide, TiO x , where x is below 2, optionally together with niobium oxide,  
   
   
       16 . A sputtering target as claimed in  claim 15  wherein the target base is water cooled during the plasma spraying.  
   
   
       17 . A sputtering target as claimed in  claim 15  wherein the plasma spraying is carried out using argon as a plasma gas and hydrogen as a secondary plasma gas.  
   
   
       18 . A sputtering target as claimed in  claim 15  wherein the target base is titanium, stainless steel, aluminum or copper.  
   
   
       19 . A sputtering target as claimed in  claim 15  wherein the titanium dioxide which is plasma sprayed has particle size in the range of from 1 to 60 micrometers.  
   
   
       20 . A sputtering target as claimed in  claim 15  wherein the titanium dioxide is plasma sprayed together with Nb 2 O 3 .  
   
   
       21 . A sputtering target as claimed in  claim 15  wherein the sub-stoichiometric titanium dioxide, TiO x , has a value of x in the range of from 1.55 to 1.95.  
   
   
       22 . A sputtering target as claimed in  claim 21 , wherein the sputtering target has a length of from 800 mm to 3.5 meters and has a cylindrical shape.  
   
   
       23 . A sputtering target as claimed in  claim 22  which is 2.5 meter in length.  
   
   
       24 . A sputtering target as claimed in  claim 23  which has a diameter of 133 mm.