Liquid crystal display and method of making the same

Abstract

A method of making a liquid crystal display having a display region and a non-display region, the method comprises forming a thin film transistor (“TFT”) having a drain electrode on an insulating substrate, forming an inorganic layer and an organic insulating layer sequentially on the TFT, forming an organic insulating layer pattern, by patterning the organic insulating layer, comprising a first organic layer hole to expose the inorganic layer on the drain electrode and a second organic layer hole formed along a circumference of the display region where the organic insulating layer is partially removed, removing the inorganic layer exposed through the first organic layer hole and the organic insulating layer remaining in the second organic layer hole, and forming a sealant in the second organic hole. The present invention thus provides a method of making an LCD to prevent a color filter substrate separating from a TFT substrate using fewer masks.

1 . A method of making a liquid crystal display having a display region and a non-display region, the method comprising: 
 forming a thin film transistor (TFT) having a drain electrode on an insulating substrate;    forming an inorganic layer and an organic insulating layer sequentially on the TFT;    forming an organic insulating layer pattern, by patterning the organic insulating layer, comprising a first organic layer hole to expose the inorganic layer on the drain electrode and a second organic layer hole formed along a circumference of the display region where the organic insulating layer is partially removed;    removing the inorganic layer exposed through the first organic layer hole and the organic insulating layer remaining in the second organic layer hole; and    forming a sealant in the second organic hole.    
   
   
       2 . The method of making a liquid crystal display according to  claim 1 , wherein the forming the organic insulating layer pattern comprises forming a lens part on the display region.  
   
   
       3 . The method of making a liquid crystal display according to  claim 2 , wherein the forming the organic insulating layer pattern comprises exposing the organic insulating layer to light, an exposure intensity of light is about 70 percent to about 80 percent in an area of the second organic layer hole and about 20 percent to about 32 percent in an area of the lens part as compared with exposure in an area of the first organic layer hole.  
   
   
       4 . The method of making a liquid crystal display according to  claim 2 , wherein the forming the organic insulating layer pattern further comprises exposing the organic insulating layer to light with a mask for an organic layer, the mask for the organic layer comprises a molybdenum silicon layer corresponding to the lens part and a slit-patterned molybdenum silicon layer corresponding to the second organic layer hole.  
   
   
       5 . The method of making a liquid crystal display according to  claim 1 , further comprising forming a pixel electrode connected to the drain electrode; and forming a reflecting layer connected to the pixel electrode, the reflecting layer having a transmitting window.  
   
   
       6 . The method of making a liquid crystal display according to  claim 1 , wherein the inorganic layer comprises at least one of silicon oxide and silicon nitride.  
   
   
       7 . The method of making a liquid crystal display according to  claim 1 , wherein the organic insulating layer comprises either benzocyclobutene or acrylic resin.  
   
   
       8 . The method of making a liquid crystal display according to  claim 1 , wherein the inorganic layer comprises a gate insulating layer and an inorganic passivation layer.  
   
   
       9 . The method of making a liquid crystal display according to  claim 1 , wherein the forming the TFT comprises forming a gate line assembly and sequentially forming a gate insulating layer, a semiconductor layer, an ohmic contact layer and a data line assembly on the gate line assembly.  
   
   
       10 . The method of making a liquid crystal display according to  claim 9 , wherein the semiconductor layer, the ohmic contact layer and the data line assembly are patterned using a single mask.  
   
   
       11 . The method of making a liquid crystal display according to  claim 10 , wherein the ohmic contact layer and the data line assembly are patterned to be layered upon other.  
   
   
       12 . The method of making a liquid crystal display according to  claim 1 , further comprising adhering the insulating substrate to another substrate with the sealant to prevent separation thereof.  
   
   
       13 . A method of making a liquid crystal display having a display region and a non-display region, the method comprising: 
 forming a thin film transistor (TFT) having a drain electrode on an insulating substrate;    forming an inorganic layer and an organic insulating layer sequentially on the TFT;    forming an organic insulating layer pattern, by patterning the organic insulating layer, comprising a first organic layer hole to expose the inorganic layer on the drain electrode and a second organic layer hole formed along a circumference of the display region;    removing the inorganic layer exposed through the first organic layer hole and the inorganic layer remaining in the second organic layer hole; and    forming a sealant in the second organic hole.    
   
   
       14 . The method of making a liquid crystal display according to  claim 13 , further comprising adhering the insulating substrate to another substrate with the sealant to prevent separation thereof.  
   
   
       15 . A liquid crystal display comprising: 
 an insulating substrate;    an inorganic layer and an organic insulating layer sequentially formed on the insulating substrate;    a sealant contact hole formed along a circumference of a display region where the organic insulating layer is removed and exposing the inorganic layer; and    a sealant disposed in the sealant contact hole.    
   
   
       16 . The liquid crystal display according to  claim 15 , wherein the inorganic layer exposed through the sealant contact hole comprises at least one of silicon oxide and silicon nitride.  
   
   
       17 . The liquid crystal display according to  claim 15 , further comprising a semiconductor layer, an ohmic contact layer and a data line assembly which are sequentially deposited on the insulating substrate, 
 wherein the data line assembly and the ohmic contact layer are layered upon each other.    
   
   
       18 . The liquid crystal display according to  claim 17 , further comprising a gate line assembly formed on the insulating substrate, 
 wherein the inorganic layer exposed through the sealant contact hole comprises a gate insulating layer formed on the gate line assembly or an inorganic passivation layer formed on the data line assembly.    
   
   
       19 . The liquid crystal display according to  claim 17 , further comprising a pixel electrode connected to the data line assembly; and 
 a reflecting layer covering a portion of the pixel electrode.    
   
   
       20 . The liquid crystal display according to  claim 15 , further comprising a gate driving circuit disposed under the sealant contact hole and formed on the insulating substrate.  
   
   
       21 . The liquid crystal display according to  claim 15 , further comprising another substrate adhered to the insulating substrate by the sealant, the sealant preventing separation of the substrates.  
   
   
       22 . The liquid crystal display according to  claim 21 , further comprising liquid crystal disposed intermediate the substrates.  
   
   
       23 . The liquid crystal display according to  claim 22 , wherein the another substrate is a color filter substrate.