Alignment shield for evaporator used in thin film deposition

Abstract

A system for depositing film includes (1) a substrate holder assembly, (2) a particle source, (3) an alignment shield between the particle source and the substrate holder assembly, and (4) a vacuum chamber for enclosing the substrate holder assembly, the particle source, and the alignment shield. The alignment shield includes alignment cells each having walls that can be individually adjusted to change the oblique deposition angles. By adjusting the walls of the alignment cells, uniform oblique deposition angles can be achieved on substrates held by the substrate holder assembly. The deposited film with uniform orientation can be used as the alignment layer of a liquid crystal display.

1 . An system for depositing film, comprising: 
 a substrate holder assembly for holding a plurality of substrates;    a particle source for generating particles toward the substrate holder assembly;    an alignment shield between the particle source and the substrate holder assembly, the alignment shield comprising a plurality of individually adjustable alignment cells, each alignment cell being adjustable to provide a corresponding deposition angle to one corresponding substrate; and    a vacuum chamber enclosing the substrate holder assembly, the particle source, and the alignment shield.    
   
   
       2 . The system of  claim 1 , wherein each alignment cell comprises walls that are pivotally mounted to a frame of the alignment shield.  
   
   
       3 . The system of  claim 1 , wherein each alignment cell comprises a flexible metal hose that bends to set the corresponding deposition angle.  
   
   
       4 . The system of  claim 1 , wherein the substrate holder assembly comprises: 
 a base;    a plurality of substrate holders mounted to the base, wherein the substrate holders can adjust to change their corresponding deposition angles.    
   
   
       5 . The system of  claim 2 , wherein the substrate holders are pivotally mounted to the base.  
   
   
       6 . The system of  claim 1 , wherein the substrate holder assembly and the alignment shield each have a dome shape.  
   
   
       7 . The system of  claim 1 , wherein the particle source comprises a crucible and an electron gun for heating the material in the crucible.  
   
   
       8 . The system of  claim 1 , wherein the particle source comprises (1) a plurality of crucibles corresponding to the substrate holders, and (2) a plurality of electron guns corresponding to the crucibles for heating the material in the crucibles.  
   
   
       9 . The system of  claim 1 , further comprising a column supporting the base, the column setting a height of the substrate holder assembly in the vacuum chamber.  
   
   
       10 . A method for forming alignment layers on substrates, comprising: 
 adjusting a plurality of alignment cells on an alignment shield to provide proper deposition angles on a plurality of substrates held by a substrate holder assembly, wherein each alignment cell is adjusted for one substrate; and    generating particles with a particle source toward the substrates, wherein the particles pass through the alignment cells and deposits on the substrates.    
   
   
       11 . The method of  claim 10 , wherein said adjusting a plurality of alignment cells comprises pivoting walls of the alignment cells.  
   
   
       12 . The method of  claim 10 , wherein the alignment cells comprise flexible metal hoses and said adjusting a plurality of alignment cells comprises bending the flexible metal hoses.  
   
   
       13 . The method of  claim 10 , further comprising: 
 adjusting a distance between the substrate holder assembly and the particle source; and    readjusting the alignments cells to provide the proper deposition angles on the substrates.    
   
   
       14 . The method of  claim 10 , further comprising: 
 adjusting a distance between the alignment shield and the particle source.