US2006293478A1PendingUtilityA1

Silane monomers and siloxane polymers for semiconductor optoelectronics

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Assignee: RANTALA JUHA TPriority: Jun 13, 2005Filed: Jun 13, 2006Published: Dec 28, 2006
Est. expiryJun 13, 2025(expired)· nominal 20-yr term from priority
H10P 14/6922H10P 14/6686H10P 14/6342C08G 77/50H01B 3/46C08G 77/08C09D 183/04C09D 183/14Y10T428/31663H10P 14/687
46
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Claims

Abstract

A method for producing a polymer for semiconductor optoelectronics, comprising the steps of providing a monomer is produced having the formula: wherein: R 1 is a hydrolysable group R 2 is hydrogen, and R 3 is a bridging linear or branched bivalent hydrocarbyl group, said monomer being produced by hydrosilylation of the corresponding starting materials, and homo- or copolymerizing the monomer to produce a polymer.

Claims

exact text as granted — not AI-modified
1 . A method for producing a polymer for semiconductor optoelectronics, comprising the steps of providing a monomer is produced having the formula:  
     
       
         
         
             
             
         
       
     
     wherein: 
 R 1  is a hydrolysable group  
 R 2  is hydrogen, and  
 R 3  is a bridging linear or branched bivalent hydrocarbyl group,  
 said monomer being produced by hydrosilylation of the corresponding starting materials, and homo- or copolymerizing the monomer to produce a polymer.  
 
   
   
       2 . The method according to  claim 1 , wherein hydrosilylation is carried out in the presence of cobalt octacarbonyl as a catalyst.  
   
   
       3 . The method according to  claim 1  or  2 , wherein halosilanes are used as reactants.  
   
   
       4 . The method according to any of  claims 1  to  3 , wherein, for producing a compound of the formula above, in which R 2  stands for hydrogen, a first trihalogenated silane compound is reacted with a second dihalogenated silane compound in the present of cobalt octacarbonyl.  
   
   
       5 . The method according to  claim 4 , wherein the trihalosilane has a reactive organic group comprising an unsaturated bond for facilitating the hydrosilylation reaction.  
   
   
       6 . A method of producing a thin film for optoelectronics comprising depositing on a semiconductor substrate a film obtainable by polymerization of an organo functionalized monomer having the formula:  
     
       
         
         
             
             
         
       
     
     wherein: 
 R 1  is a hydrolysable group  
 R 2  is hydrogen, and  
 R 3  is a bridging linear or branched bivalent hydrocarbyl group,  
 applying the polymerized compositions on a substrate in the form of a layer and by curing the layer to form a film.  
 
   
   
       7 . The method according to  claim 6 , wherein a thin film is produced from a monomer of the above formula, wherein independently 
 R 1  is selected from the group of hydrogen, halides, alkoxy and acyloxy groups,    R 2  is selected from alkyl groups, alkenyl groups and aryl groups, and    R 3  is selected from linear and branched alkylene groups, alkenylene groups, alkynylene groups, bivalent alicyclic groups, bivalent polycyclic groups, and bivalent aromatic groups.    
   
   
       8 . The method according to  claim 6  or  7 , wherein the polymerized composition comprises a cross-linked poly(organosiloxane).  
   
   
       9 . The method according thin film according to any of  claims 6  to  8 , wherein the composition is obtained essentially by homopolymerization of monomers having formula I.  
   
   
       10 . The method according to any of  claims 6  to  8 , wherein the composition is obtained by copolymerizing first monomers having formula I, wherein R 3  stands for a linear bivalent hydrocarbyl residue, with second monomers having formula I, wherein R 3  stands for a branched bivalent hydrocarbyl residue, the molar ratio of the first monomers to the second monomers is 95:5 to 5:95, in particular 90:10 to 10:90, preferably 80:20 to 20:80.  
   
   
       11 . The method according to any of  claims 6  to  10 , comprising producing a cured thin layer of the poly(organosiloxane) having a thickness of 0.01 to 50 um, in particular 0.5 to 5 um, preferably from 1 to 3 um.

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