Determining an optimizaton for generating a pixelated photolithography mask with high resolution imaging capability

Abstract

A pixelated photolithography mask is optimized for high resolution microelectronic processing. In one embodiment, the invention includes synthesizing a pixelated photolithography mask, applying a pixel flipping function to the mask, comparing the resulting mask to a desired result, and synthesizing an optimized pixelated binary photolithography mask using the function.

1 . A method comprising: 
 synthesizing a pixelated photolithography mask;    applying a pixel flipping function to the mask;    comparing the resulting mask to a desired result; and    synthesizing an optimized pixelated binary photolithography mask using the function.    
   
   
       2 . The method of  claim 1 , wherein comparing comprises comparing a resulting aerial image to a target image for the mask.  
   
   
       3 . The method of  claim 1 , wherein applying comprises applying a plurality of different pixel block flipping functions to the mask and wherein comparing comprises comparing a resulting aerial image for each different function to the target image, the method further comprising selecting a function based on the comparison.  
   
   
       4 . The method of  claim 1 , wherein applying comprises applying the function to a portion of the mask and wherein comparing comprises comparing a resulting aerial image for the portion of the mask to a target image for the portion of the mask, and wherein synthesizing comprises synthesizing a whole mask using the function.  
   
   
       5 . The method of  claim 1 , further comprising applying phase coloring to the mask before applying the function.  
   
   
       6 . The method of  claim 1 , wherein the target image is generated by convolving a drawn layout corresponding to the mask with a function of the fabrication process to which the mask is to be applied.  
   
   
       7 . The method of  claim 1 , wherein the pixel flipping function comprises at least one of sequential traversal, random traversal, objective weighted blocks, objective weighted traversal, and iterating.  
   
   
       8 . A machine-readable medium containing instructions, which when operated on by the machine, cause the machine to perform operations comprising: 
 synthesizing a pixelated binary photolithography mask;    applying a plurality of different systematic pixel flipping functions to a portion of the mask;    comparing a resulting aerial image for the portion of mask after application of each function to a target image for the corresponding portion of the mask;    selecting a function based on the comparison; and    synthesizing an optimized pixelated binary photolithography mask using the selected function.    
   
   
       9 . The medium of  claim 8 , the instructions further comprising applying phase coloring to the mask before applying the function.  
   
   
       10 . The method of  claim 8 , wherein the target image is generated by convolving a drawn layout corresponding to the mask with a function of the fabrication process to which the mask is to be applied.  
   
   
       11 . The method of  claim 8 , wherein the pixel flipping function comprises at least one of sequential traversal, random traversal, objective weighted blocks, objective weighted traversal, and iterating.  
   
   
       12 . An apparatus comprising: 
 a memory;    a bus coupled to the memory; and    a microprocessor coupled to the bus, the microprocessor having a layer formed by photolithography using a mask, the mask being synthesized by:    synthesizing a pixelated photolithography mask;    applying a pixel flipping function to the mask;    comparing the resulting mask to a desired result;    synthesizing an optimized pixelated binary photolithography mask using the function.    
   
   
       13 . The apparatus of  claim 12 , wherein comparing comprises comparing a resulting aerial image to a target image for the mask.  
   
   
       14 . The apparatus of  claim 12 , wherein applying comprises applying a plurality of different pixel block flipping functions to the mask and wherein comparing comprises comparing a resulting aerial image for each different function to the target image, the method further comprising selecting a function based on the comparison.  
   
   
       15 . The apparatus of  claim 12 , wherein applying comprises applying the function to a portion of the mask and wherein comparing comprises comparing a resulting aerial image for the portion of the mask to a target image for the portion of the mask, and wherein synthesizing comprises synthesizing a whole mask using the function.  
   
   
       16 . The apparatus of  claim 12 , further comprising applying phase coloring to the mask before applying the function.  
   
   
       17 . The apparatus of  claim 12 , wherein the target image is generated by convolving a drawn layout corresponding to the mask with a function of the fabrication process to which the mask is to be applied.  
   
   
       18 . The apparatus of  claim 12 , wherein the pixel flipping function comprises at least one of sequential traversal, random traversal, objective weighted blocks, objective weighted traversal, and iterating.