US2007010601A1PendingUtilityA1

Latent catalyst for epoxy resin, epoxy resin composition, and semiconductor device

43
Assignee: HORIMOTO AKIHIROPriority: Aug 29, 2003Filed: Feb 24, 2006Published: Jan 11, 2007
Est. expiryAug 29, 2023(expired)· nominal 20-yr term from priority
C08G 59/68C08L 63/00C08G 59/688Y10T428/31511C08G 59/686C08G 59/226C08G 59/621C08G 59/18
43
PatentIndex Score
0
Cited by
0
References
0
Claims

Abstract

The present invention provides a latent catalyst for epoxy resin, comprising: a cation moiety having an activity of accelerating curing reaction of epoxy resin; and a silicate anion moiety of suppressing the curing reaction-accelerating activity. Also disclosed are an epoxy resin composition comprising the latent catalyst and a semiconductor device using the epoxy resin composition.

Claims

exact text as granted — not AI-modified
1 . A latent catalyst for epoxy resin, comprising: 
 a cation moiety having an activity of accelerating curing reaction of epoxy resin; and    a silicate anion moiety of suppressing the curing reaction-accelerating activity.    
     
     
         2 . The latent catalyst according to  claim 1 , wherein the cation moiety contains a nitrogen cation or a phosphorus cation.  
     
     
         3 . The latent catalyst according to  claim 2 , represented by the following formula (1):  
       
         
           
           
               
               
           
         
       
       wherein 
 A 1  represents a nitrogen or phosphorous atom;  
 R 1 , R 2 , R 3  and R 4  each represent an organic group having a substituted or unsubstituted, aromatic or heterocyclic ring or represent a substituted or unsubstituted aliphatic group, and R 1 , R 2 , R 3  and R 4  may be the same or different from one another;  
 X 1  represents an organic group that bonds to Y 1  and Y 2 ;  
 X 2  represents an organic group that bonds to Y 3  and Y 4 ;  
 Y 1  and Y 2  each represent a group resulting from a proton-donating substituent through release of a proton, and Y 1  and Y 2  bond to the silicon atom to form a chelate structure;  
 Y 3  and Y 4  each represent a group resulting from a proton-donating substituent through release of a proton, and Y 3  and Y 4  bond to the silicon atom to form a chelate structure;  
 X 1  and X 2  may be the same or different from each other;  
 Y 1 , Y 2 , Y 3  and Y 4  may be the same or different from one another; and  
 Z 1  represents an organic group having a substituted or unsubstituted, aromatic or heterocyclic ring or represents a substituted or unsubstituted aliphatic group.  
 
     
     
         4 . The latent catalyst according to  claim 3 , wherein at least one of R 1 , R 2 , R 3  and R 4  in formula (1) is an organic group having a substituted or unsubstituted aromatic ring.  
     
     
         5 . The latent catalyst according to  claim 4 , represented by the following formula (2):  
       
         
           
           
               
               
           
         
       
       wherein 
 R 5 , R 6  and R 7  each represent an organic group having a substituted or unsubstituted, aromatic or heterocyclic ring or represent a substituted or unsubstituted aliphatic group, and R 5 , R 6  and R 7  may be the same or different from one another;  
 Ar represents a substituted or unsubstituted aromatic group;  
 X 3  represents an organic group that bonds to Y 5  and Y 6 ;  
 X 4  represents an organic group that bonds to Y 7  and Y 8 ;  
 Y 5  and Y 6  each represent a group resulting from a proton-donating substituent through release of a proton, and Y 5  and Y 6  bond to the silicon atom to form a chelate structure;  
 Y 7  and Y 8  each represent a group resulting from a proton-donating substituent through release of a proton, and Y 7  and Y 8  bond to the silicon atom to form a chelate structure;  
 X 3  and X 4  may be the same or different from each other;  
 Y 5 , Y 6 , Y 7  and Y 8  may be the same or different from one another; and  
 Z 2  represents an organic group having a substituted or unsubstituted, aromatic or heterocyclic ring or represents a substituted or unsubstituted aliphatic group.  
 
     
     
         6 . The latent catalyst according to  claim 5 , represented by the following formula (3):  
       
         
           
           
               
               
           
         
       
       wherein 
 R 8 , R 9  and R 10  each represent one member selected from the group consisting of a hydrogen atom, a methyl group, a methoxy group and a hydroxyl group, and R 8 , R 9  and R 10  may be the same or different from one another;  
 X 5  represents an organic group that bonds to Y 9  and Y 10 ;  
 Y 9  and Y 10  each represent a group resulting from a proton-donating substituent through release of a proton, and Y 9  and Y 10  may be the same or different from each other, and Y 9  and Y 10  bond to the silicon atom to form a chelate structure; and  
 Z 3  represents an organic group having a substituted or unsubstituted, aromatic or heterocyclic ring or represents a substituted or unsubstituted aliphatic group.  
 
     
     
         7 . An epoxy resin composition comprising: 
 (A) a compound having at least two epoxy groups in one molecule;    (B) a compound having at least two phenolic hydroxyl groups in one molecule; and    (C) the latent catalyst for epoxy resin of any of  claims 1  to  6 .    
     
     
         8 . The epoxy resin composition according to  claim 7 , which further comprises (D) an inorganic filler.  
     
     
         9 . The epoxy resin composition according to  claim 8 , wherein the inorganic filler (D) is present in an amount of from 200 to 2400 parts by weight per 100 parts by weight of the sum of the compound (A) and the compound (B).  
     
     
         10 . A semiconductor device that comprises electronic parts encapsulated by a cured product of the epoxy resin composition of  claim 9.

Cited by (0)

No later patents cite this yet.

References (0)

No backward citations on record.