Methods and apparatus for vapor processing of micro-device workpieces

Abstract

CVD, ALD, and other vapor processes used in processing semiconductor workpieces often require volatilizing a liquid or solid precursor. Certain embodiments of the invention provide improved and/or more consistent volatilization rates by moving a reaction vessel. In one exemplary embodiment, a reaction vessel is rotated about a rotation axis which is disposed at an angle with respect to vertical. This deposits a quantity of the reaction precursor on an interior surface of the vessel's sidewall which is exposed to the headspace as the vessel rotates. Other embodiments employ drivers adapted to move the reaction vessel in other manners, such as a pendulum arm to oscillate the vessel along an arcuate path or a mechanical linkage which moves the vessel along an elliptical path.

1 - 21 . (canceled)  
   
   
       22 . A micro-device workpiece processing apparatus comprising: 
 a reaction chamber within which a micro-device workpiece may be received;    a reactant supply vessel having a sidewall extending along a centerline, an interior volume adapted to receive a volatilizable reaction precursor with a headspace above the precursor, and a transverse cross section perpendicular to the centerline;    a gas conduit in fluid communication with the headspace and with the reaction chamber; and    a driver adapted to move the vessel to maintain an exposed surface area of the precursor greater than an area of the transverse cross section of the vessel.    
   
   
       23 . The micro-device workpiece processing apparatus of  claim 22  wherein the sidewall has an interior surface with an affinity for the precursor.  
   
   
       24 . The micro-device workpiece processing apparatus of  claim 23  wherein the interior volume is adapted to receive a liquid precursor and the sidewall interior surface is wettable by the precursor.  
   
   
       25 . The micro-device workpiece processing apparatus of  claim 22  wherein the transverse cross section of the vessel remains substantially constant along a length of the centerline.  
   
   
       26 . The micro-device workpiece processing apparatus of  claim 22  wherein the centerline is disposed at an angle with respect to vertical and the driver rotates the vessel about the centerline.  
   
   
       27 . The micro-device workpiece processing apparatus of  claim 26  wherein the driver comprises an inclined roller upon which the vessel rests, the roller having an axis which is parallel to the centerline.  
   
   
       28 . The micro-device workpiece processing apparatus of  claim 22  wherein the driver is adapted to move the vessel along a path which is transverse to the centerline.  
   
   
       29 . The micro-device workpiece processing apparatus of  claim 28  wherein the driver comprises a pendulum arm.  
   
   
       30 . The micro-device workpiece processing apparatus of  claim 28  wherein the driver translates the vessel along a horizontal path.  
   
   
       31 . The micro-device workpiece processing apparatus of  claim 22  further comprising a heat source adapted to maintain the precursor at a controlled temperature.  
   
   
       32 . The micro-device workpiece processing apparatus of  claim 22  further comprising a carrier gas inlet in fluid communication with the headspace.  
   
   
       33 . The micro-device workpiece processing apparatus of  claim 32  wherein the gas inlet extends into the interior of the vessel and is adapted to release a carrier gas into the precursor below the headspace.  
   
   
       34 . A volatilizer adapted to deliver a process gas from a volatilizable fluid, comprising: 
 a reactant supply vessel having a sidewall having an interior surface, and an interior volume adapted to receive a volatilizable fluid with a headspace above the fluid;    a gas conduit in fluid communication with the headspace; and    a driver adapted to move the vessel to coat a portion of the sidewall interior surface exposed to the headspace with the fluid.    
   
   
       35 . The volatilizer of  claim 34  wherein the sidewall interior surface is wettable by the volatilizable fluid.  
   
   
       36 . The volatilizer of  claim 34  wherein the driver rotates the vessel about a rotation axis which is disposed at an angle with respect to vertical.  
   
   
       37 . The volatilizer of  claim 36  wherein the driver comprises an inclined roller upon which the vessel rests, the roller having an axis which is parallel to the rotation axis.  
   
   
       38 . The volatilizer of  claim 34  wherein the sidewall has a centerline and the driver is adapted to move the vessel along a path which is transverse to the centerline.  
   
   
       39 . The volatilizer of  claim 38  wherein the driver comprises a pendulum arm.  
   
   
       40 . The volatilizer of  claim 38  wherein the driver translates the vessel along a horizontal path.  
   
   
       41 . The volatilizer of  claim 34  wherein a transverse cross section of the vessel remains substantially constant along a length of the sidewall.  
   
   
       42 . The volatilizer of  claim 34  further comprising a heat source adapted to maintain the vapor source at a controlled temperature.  
   
   
       43 . The volatilizer of  claim 34  further comprising a carrier gas inlet in fluid communication with the headspace.  
   
   
       44 . The volatilizer of  claim 43  wherein the gas inlet extends into the interior of the vessel and is adapted to release a carrier gas into the vapor source below the headspace.  
   
   
       45 . A micro-device workpiece processing apparatus comprising: 
 a reaction chamber within which a micro-device workpiece may be received;    a reactant supply vessel having a generally cylindrical sidewall, a bottom, a top, and a rotation axis, the bottom sealingly engaging the sidewall at a first location and the top sealingly engaging the sidewall at a second location spaced from the first location to define an interior volume adapted to contain a volatilizable fluid and a headspace, the generally cylindrical sidewall having an interior surface wettable by the fluid, the rotation axis extending between the top and the bottom and being disposed at an angle with respect to vertical;    a gas conduit extending between the reaction chamber and the supply vessel, the gas conduit communicating gas received from the headspace to the reaction chamber; and    a driver adapted to rotate the vessel about the rotation axis to wet a portion of the sidewall interior surface exposed to the headspace with the fluid.    
   
   
       46 . The volatilizer of  claim 45  wherein a cross section of the vessel perpendicular to the rotation axis remains substantially constant along a length of the rotation axis.