US2007027287A1PendingUtilityA1

Polymer and process for producing the same, composition for forming insulating film, and insulating film and method of forming the same

Assignee: JSR CORPPriority: Feb 26, 2004Filed: Jul 20, 2006Published: Feb 1, 2007
Est. expiryFeb 26, 2024(expired)· nominal 20-yr term from priority
H10P 14/6922H10P 14/6686H10P 14/6342H10P 14/6539H10P 14/6538H10P 14/6529C09D 183/14C08G 77/42H01B 3/30C08G 77/48H10P 14/69215
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Claims

Abstract

A process for producing a polymer includes mixing (A) a polysiloxane compound and (B) a polycarbosilane compound in the presence of a catalyst, water, and an organic solvent, and heating the mixture.

Claims

exact text as granted — not AI-modified
1 . An insulating-film-forming composition, comprising: 
 a hydrolysis-condensation product obtained by hydrolyzing and condensing a hydrolyzable-group-containing silane monomer (A) in the presence of a polycarbosilane (B) and a basic catalyst (C); and    an organic solvent.    
   
   
       2 . The insulating-film-forming composition according to  claim 1 , wherein the component (B) includes a hydrolyzable group.  
   
   
       3 . The insulating-film-forming composition according to  claim 1 , 
 wherein the component (A) is at least one silane compound selected from the group consisting of compounds of the following general formulas (1) to (3),      R a Si(OR 1 ) 4-a   (1)    wherein R represents a hydrogen atom, a fluorine atom, or a monovalent organic group, R 1  represents a monovalent organic group, and a represents 1 or 2,      Si(OR 2 )4  (2)    wherein R 2  represents a monovalent organic group,      R 3   b (R 4 O) 3-b Si—(R 7 ) d —Si(OR 5 ) 3-c R 6   c   (3)    wherein R 3  to R 6  individually represent monovalent organic groups, b and c individually represent integers from 0 to 2, R 7  represents an oxygen atom, a phenylene group, or a group —(CH 2 ) m — (wherein m represents an integer from 1 to 6), and d represents 0 or 1, and the component (B) is a polycarbosilane compound of the following general formula (4),                          wherein R 8  represents a group selected from the group consisting of a hydrogen atom, a halogen atom, a hydroxyl group, an alkoxy group, an acyloxyl group, a sulfone group, a methanesulfone group, a trifluoromethanesulfone group, an alkyl group, an aryl group, an allyl group, and a glycidyl group, R 9  represents a group selected from the group consisting of a halogen atom, a hydroxyl group, an alkoxy group, an acyloxyl group, a sulfone group, a methanesulfone group, a trifluoromethanesulfone group, an alkyl group, an aryl group, an allyl group, and a glycidyl group, R 10  and R 11  individually represent groups selected from the group consisting of a halogen atom, a hydroxyl group, an alkoxy group, an acyloxyl group, a sulfone group, a methanesulfone group, a trifluoromethanesulfone group, an alkyl group having 2 to 6 carbon atoms, an aryl group, an allyl group, and a glycidyl group, R 12  to R 14  individually represent a substituted or unsubstituted methylene group, a substituted or unsubstituted alkylene group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, or a substituted or unsubstituted arylene group, and x, y, and z individually represent integers from 0 to 10,000, provided that “5<x+y+z<10,000” is satisfied.    
   
   
       4 . The insulating-film-forming composition according to  claim 1 , wherein the amount of the component (B) is 1 to 1,000 parts by weight for 100 parts by weight of the component (A) converted into a complete hydrolysis-condensation product.  
   
   
       5 . The insulating-film-forming composition according to  claim 1 , wherein the basic catalyst (C) is a nitrogen-containing compound of the following general formula (5),  
       (X 1 X 2 X 3 X 4 N) a Y  (5)  wherein X 1 , X 2 , X 3 , and X 4  individually represent groups selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, a hydroxyalkyl group, an aryl group, and an arylalkyl group, Y represents a halogen atom or an anionic group with a valence of 1 to 4, and a represents an integer from 1 to 4.    
   
   
       6 . A method of producing an insulating-film-forming composition, comprising hydrolyzing and condensing a hydrolyzable-group-containing silane monomer (A) in the presence of a polycarbosilane (B) and a basic catalyst (C).  
   
   
       7 . The method according to  claim 6 , further comprising dissolving a hydrolysis-condensation product obtained by the hydrolysis and condensation in an organic solvent.  
   
   
       8 . The method according to  claim 6 , wherein the component (B) includes a hydrolyzable group.  
   
   
       9 . The method according to  claim 6 , wherein the component (A) is at least one silane compound selected from the group consisting of compounds of the following general formulas (1) to (3),  
       R a Si(OR 1 ) 4-a   (1)  wherein R represents a hydrogen atom, a fluorine atom, or a monovalent organic group, R 1  represents a monovalent organic group, and a represents 1 or 2,      Si(OR 2 ) 4   (2)    wherein R 2  represents a monovalent organic group,      R 3   b (R 4 O) 3-b Si—(R 7 ) d —Si(OR 5 ) 3-c R 6   c   (3)    wherein R 3  to R 6  individually represent monovalent organic groups, b and c individually represent integers from 0 to 2, R 7  represents an oxygen atom, a phenylene group, or a group —(CH 2 ) m — (wherein m represents an integer from 1 to 6), and d represents 0 or 1, and the component (B) is a polycarbosilane compound of the following general formula (4),                          wherein R 8  represents a group selected from the group consisting of a hydrogen atom, a halogen atom, a hydroxyl group, an alkoxy group, an acyloxyl group, a sulfone group, a methanesulfone group, a trifluoromethanesulfone group, an alkyl group, an aryl group, an allyl group, and a glycidyl group, R 9  represents a group selected from the group consisting of a halogen atom, a hydroxyl group, an alkoxy group, an acyloxyl group, a sulfone group, a methanesulfone group, a trifluoromethanesulfone group, an alkyl group, an aryl group, an allyl group, and a glycidyl group, R 10  and R 11  individually represent groups selected from the group consisting of a halogen atom, a hydroxyl group, an alkoxy group, an acyloxyl group, a sulfone group, a methanesulfone group, a trifluoromethanesulfone group, an alkyl group having 2 to 6 carbon atoms, an aryl group, an allyl group, and a glycidyl group, R 12  to R 14  individually represent a substituted or unsubstituted methylene group, a substituted or unsubstituted alkylene group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, or a substituted or unsubstituted arylene group, and x, y, and z individually represent integers from 0 to 10,000, provided that “5<x+y+z<10,000” is satisfied.    
   
   
       10 . The method according to  claim 6 , wherein the amount of the component (B) is 1 to 1,000 parts by weight for 100 parts by weight of the component (A) converted into a complete hydrolysis-condensation product.  
   
   
       11 . The method according to  claim 6 , wherein the basic catalyst (C) is a nitrogen-containing compound of the following general formula (5),  
       (X 1 X 2 X 3 X 4 N) a Y  (5)  wherein X 1 , X 2 , X 3 , and X 4  individually represent groups selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, a hydroxyalkyl group, an aryl group, and an arylalkyl group, Y represents a halogen atom or an anionic group with a valence of 1 to 4, and a represents an integer from 1 to 4.    
   
   
       12 . A method of forming a silica-based insulating film, comprising applying the insulating-film-forming composition according to  claim 1  to a substrate to form a coating, and subjecting the coating to at least one curing treatment selected from heating, electron beam irradiation, ultraviolet irradiation, and oxygen plasma treatment.  
   
   
       13 . A silica-based insulating film obtained by the method according to  claim 12.

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