Combinatorial electrochemical deposition system

Abstract

A combinatorial electrochemical deposition system enables computer control over multiple parameters and allows for systematic exploration of the parameter space. The combinatorial electrochemical deposition system includes a computer providing system control and data acquisition functions. The computer controls a plurality of pumps; each pump is connected to a respective material supply source. The plurality of pumps is coupled via a mixer and a plurality of distribution valves of a cell and fluidics distribution network to deposit a particular composition of materials or solution concentration to individual electrochemical cells of an electrochemical cell array. The computer controls the mixer and the plurality of distribution valves. The electrochemical cell array includes a plurality of singly addressable flow-through isolatable electrochemical cells with a common working electrode.

1 . A combinatorial electrochemical deposition system comprising: 
 a computer providing system control and data acquisition functions;    a plurality of pumps coupled to said computer, each pump being connected to a respective material supply source;    a fluidics distribution network including a mixer and a plurality of distribution valves coupled to said computer and said plurality of pumps;    an electrochemical cell array coupled to said plurality of distribution valves, said fluidics distribution network being controlled by said computer for depositing a particular composition of materials or solution concentration to individual electrochemical cells of said electrochemical cell array;    said electrochemical cell array includes a plurality of singly addressable flow-through isolatable electrochemical cells with a common working electrode, each of said electrochemical cells including a counter electrode and a reference electrode.    
     
     
         2 . A combinatorial electrochemical deposition system as recited in  claim 1  includes a multi-channel potentiostat coupled to said computer for applying a selected voltage potential to said common working electrode, and to said counter electrode and said reference electrode of each of said electrochemical cells.  
     
     
         3 . A combinatorial electrochemical deposition system as recited in  claim 2  includes demultiplexing electronics coupled to said computer and said multi-channel potentiostat for applying said selected voltage potential to said counter electrode and said reference electrode of each of said electrochemical cells.  
     
     
         4 . A combinatorial electrochemical deposition system as recited in  claim 1  wherein said reference electrode includes a capillary SCE reference electrode.  
     
     
         5 . A combinatorial electrochemical deposition system as recited in  claim 1  wherein said counter electrode includes a platinum counter electrode.  
     
     
         6 . A combinatorial electrochemical deposition system as recited in  claim 1  wherein said working electrode includes a unitary sheet member supporting a container of each of said electrochemical cells.  
     
     
         7 . A combinatorial electrochemical deposition system as recited in  claim 6  wherein said container of each of said electrochemical cells includes a cylindrical container.  
     
     
         8 . A combinatorial electrochemical deposition system as recited in  claim 7  wherein said containers of said electrochemical cells are defined by a plurality of through holes in a single glass plate.  
     
     
         9 . A combinatorial electrochemical deposition system as recited in  claim 7  wherein said cylindrical container includes a glass tube.  
     
     
         10 . A combinatorial electrochemical deposition system as recited in  claim 1  wherein said computer controls each of said pumps connected to said respective material supply source and said mixer for mixing of the solution concentration.  
     
     
         11 . A combinatorial electrochemical deposition system as recited in  claim 10  wherein said respective supply sources include a supporting electrolyte, a selected metal of interest, and a predetermined additive.  
     
     
         12 . A combinatorial electrochemical deposition system as recited in  claim 1  wherein said computer controls a rate of filling of said electrochemical cells in said electrochemical cell array.  
     
     
         13 . A combinatorial electrochemical deposition system as recited in  claim 1  wherein said electrochemical cells of said electrochemical cell array include said common working electrode defined by a single crystal silicon wafer.  
     
     
         14 . A combinatorial electrochemical deposition system as recited in  claim 1  wherein said electrochemical cells of said electrochemical cell array include said common working electrode defined by a generally uniform thin film supported on a single wafer.  
     
     
         15 . A combinatorial electrochemical deposition system as recited in  claim 1  wherein said electrochemical cells of said electrochemical cell array include a glass rod coupled to a set of electrochemical cells, said glass rod selectively moved between a fill position and a bypass position for opening and closing said set of electrochemical cells.  
     
     
         16 . A combinatorial electrochemical deposition system as recited in  claim 15  include an air cylinder coupled to said glass rod for controlling movement of said glass rod between said fill position and said bypass position.