Method of manufacturing chromium plated article and chromium plating apparatus

Abstract

A pulse current from a pulse current supply side is fed to a middle part of an anode holding body to which anodes are connected; both end portions of a cathode holding body, to which cathodes are connected, are connected to a negative pole on the pulse power source side; and inductances of wiring between adjacent anodes and inductances of wiring between adjacent cathodes are set at a ratio of 1:2:3:4 in a direction of spacing from a connection to the pulse power source side. Pulse currents are equally fed to each work and it can be ensured that chromium plating treatment of each work is made equal.

1 . A method of manufacturing a chromium plated article comprising: 
 immersing a plurality of works in a chromium plating bath; and    depositing a chromium layer having a desired compressive residual stress on a surface of each of the works by using a pulse current;    wherein a waveform of the pulse current supplied to each of the works is made uniform irrespective of the works by adjusting inductance of a wiring from a pulse power source to each of the works.    
   
   
       2 . A method of manufacturing a chromium plated article comprising: 
 immersing a plurality of works in a chromium plating bath; and    depositing a chromium layer having a desired compressive residual stress on a surface of the works by using a pulse current;    wherein the works are disposed in an apparatus which comprises a plurality of anodes and a plurality of cathodes disposed in such a manner as to correspond to each of the plurality of works, an anode holding body which is connected sequentially to the plurality of anodes and is connected to a positive pole of a pulse power source, and a cathode holding body which is connected sequentially to the plurality of cathodes and is connected to a negative pole of the pulse power source; and    wherein chromium plating is performed, with the pulse power source connected to a middle part of one of the anode holding body and the cathode holding body, and the pulse power source connected to both ends of the other.    
   
   
       3 . The method of manufacturing a chromium plated article according to  claim 2 , wherein at least one inductance of the anode holding body and the cathode holding body becomes large with increasing distance from a connection to the pulse power source.  
   
   
       4 . The method of manufacturing a chromium plated article according to  claim 3 , wherein inductances between the plurality of electrodes are set at a ratio of 1:2:3: . . . sequentially, in a direction of spacing from the connection to the pulse power source.  
   
   
       5 . The method of manufacturing a chromium plated article according to  claim 2 , wherein each of the plurality of anodes is cylindrical, and each of the works connected to the plurality of cathodes is inserted into each of the plurality of anodes.  
   
   
       6 . The method of manufacturing a chromium plated article according to  claim 2 , wherein each of the works is arranged in one row at a prescribed spacing, and the anodes are disposed in a plurality of pairs in a face-to-face relation, with each of the works interposed therebetween.  
   
   
       7 . The method of manufacturing a chromium plated article according to  claim 6 , 
 wherein the anode holding body includes a first anode holding part on one side and a second anode holding part on the other side, and the plurality of anodes includes a first anode group on one side and a second group on the other side, and    wherein the first anode holding part on one side and the second anode holding part on the other side are respectively provided in positions below or above the first anode group on one side and the second anode group on the other side, and the plurality of cathodes are provided in positions below or above the works.    
   
   
       8 . The method of manufacturing a chromium plated article according to  claim 6 , wherein the inductance between the plurality of cathodes of the cathode holding body is twice as large as the inductance between the plurality of anodes of the anode holding body.  
   
   
       9 . A chromium plating apparatus which immerses a plurality of works in a chromium plating bath and deposits a chromium layer having a desired compressive residual stress on a surface of the works by using a pulse current, wherein inductance of a wiring from a pulse power source to each of the works is set so that a waveform of the pulse current supplied to each of the works is made uniform irrespective of the works.  
   
   
       10 . A chromium plating apparatus which immerses a plurality of works in a chromium plating bath and deposits a chromium layer having a desired compressive residual stress on a surface of the plurality of works by using a pulse current, comprising: 
 a plurality of anodes and a plurality of cathodes disposed in such a manner as to correspond to each of the plurality of works;    an anode holding body which is connected sequentially to the plurality of anodes and is connected to a positive pole of the pulse power source; and    a cathode holding body which is connected sequentially to the plurality of cathodes and is connected to a negative pole of the pulse power source,    wherein the pulse power source is connected to a middle part of one of the anode holding body and the cathode holding body, and the pulse power source being connected to both ends of the other.    
   
   
       11 . The chromium plating apparatus according to  claim 10 , wherein at least one inductance of the anode holding body and the cathode holding body becomes large with increasing distance from a connection to the pulse power source.  
   
   
       12 . The chromium plating apparatus according to  claim 11 , wherein inductances between the plurality of electrodes are set at a ratio of 1:2:3: . . . sequentially, in a direction of spacing from the connection to the pulse power source.  
   
   
       13 . The chromium plating apparatus according to  claim 10 , wherein each of the plurality of anodes is cylindrical, and each of the works connected to the plurality of cathodes is inserted into each of the plurality of anodes.  
   
   
       14 . The chromium plating apparatus according to  claim 10 , wherein each of the plurality of works is arranged in one row at a prescribed spacing, and the anodes are disposed in a plurality of pairs in a face-to-face relation, with each of the works interposed therebetween.  
   
   
       15 . The chromium plating apparatus according to  claim 14 , 
 wherein the anode holding body includes a first anode holding part on one side and a second anode holding part on the other side, and the plurality of anodes includes a first anode group on one side and a second anode group on the other side, and    wherein the first anode holding part on one side and the second anode holding part on the other side are respectively provided in positions below or above the first anode group on one side and the second anode group on the other side, and the plurality of cathodes are provided in positions below or above the works.    
   
   
       16 . The chromium plating apparatus according to  claim 14 , wherein the inductance between the plurality of cathodes of the cathode holding body is twice as large as the inductance between the plurality of anodes of the anode holding body.