Carbon film-coated article and method of producing the same

Abstract

This invention is directed to a carbon film-coated article comprising a substrate; a mixed layer formed on at least a part of the substrate, and composed of an element(s) constituting the substrate and tungsten; a tungsten film formed on the mixed layer; and a carbon film formed on the tungsten film. The invention provides a method of producing the carbon film-coated article, the method comprising the steps of: forming a mixed layer on at least a part of the substrate, the mixed layer being composed of an element(s) constituting the substrate and tungsten, forming a tungsten film on the mixed layer, and forming a carbon film on the tungsten film, wherein at least one of the mixing layer, the tungsten film and the carbon film is formed using a cathode material evaporated by arc discharge in a vacuum arc deposition apparatus having a vacuum arc evaporation source including the cathode.

1 - 5 . (canceled)  
   
   
       6 . A method of producing a carbon film-coated article comprising a substrate, a mixed layer formed on at least a part of the substrate, and composed of an element(s) constituting the substrate and tungsten, a tungsten film formed on the mixed layer, and a carbon film formed on the tungsten film, the method comprising the steps of: 
 forming the mixed layer on at least a part of the substrate, the mixed layer being composed of the element(s) constituting the substrate and tungsten,    forming the tungsten film on the mixed layer, and    forming the carbon film on the tungsten film;    wherein at least one of the mixing layer, the tungsten film and the carbon film is formed using a cathode material evaporated by arc discharge in a vacuum arc deposition apparatus having a vacuum arc evaporation source including the cathode.    
   
   
       7 . The method according to  claim 6 , wherein the carbon film is formed by a vacuum arc deposition method using carbon as the cathode material in the vacuum arc deposition apparatus while applying a pulse-type bias voltage to the substrate.  
   
   
       8 . The method according to  claim 6 , wherein the mixed layer is formed using tungsten as the cathode material in the vacuum arc deposition apparatus while applying a bias voltage to the substrate to subject the substrate to a bombarding process.  
   
   
       9 . The method according to  claim 6 , wherein all of the mixed layer, the tungsten film and the carbon film were formed in a same vacuum arc deposition apparatus.  
   
   
       10 . The method according to  claim 6 , wherein the vacuum arc evaporation apparatus has at least two vacuum arc evaporation sources, including a first vacuum arc evaporation source having a cathode including tungsten as a main component and a second vacuum arc evaporation source having a cathode including carbon as a main component.  
   
   
       11 . The method according to  claim 6 , wherein the vacuum arc deposition apparatus is of a magnetic filter type which has a magnetic filter for at least one vacuum arc evaporation source for suppressing macro-particles of the cathode material from adhering to the substrate.