Poly(hydroxystyrene) stain resist
Abstract
A composition for use as a stain blocker and a method of treating substrates therewith, said composition comprising a polymer of Formula 1 having the following repeating units in random sequence wherein R 1 is H, methyl or ethyl; R 2 and R 3 are each independently H, C 1 to about C 10 alkyl, —COOR 4 , CONR 5 R 6 , or —CN; R 4 is M, C 1 to about C 20 alkyl, or C 6 to C 10 aryl; R 5 and R 6 are each independently H, C 1 to C 10 alkyl, C 6 to C 10 aryl, or R 5 and R 6 together with the nitrogen atom form a morpholine, pyrrolidine, or piperidine ring; R 7 is a C 4 to C 8 alkyl group; M is H, an alkali metal or alkali earth metal; h is about 10 to 100 mole %; i is 0 to about 80 mole %; j is 0 to about 60 mole %; k and n are each independently 0 to about 40 mole %; and m is 0.01 to about 0.5; provided that h+i+j+k+n equals 100, and provided that i+j+k+n is greater than zero, except when h is 100%.
Claims
exact text as granted — not AI-modified1 . A composition comprising a polymer of Formula 1 having the following repeating units, said units occurring in any sequence
wherein
R 1 is H, methyl or ethyl;
R 2 and R 3 are each independently H, C 1 to about C 10 alkyl, —COOR 4 , CONR 5 R 6 , or —CN;
R 4 is M, C 1 to about C 20 alkyl, or C 6 to C 10 aryl;
R 5 and R 6 are each independently H, C 1 to C 10 alkyl, C 6 to C 10 aryl, or R 5 and R 6 together with the nitrogen atom form a morpholine, pyrrolidine, or piperidine ring;
R 7 is a C 4 to C 8 alkyl group;
M is H, an alkali metal or alkali earth metal;
h is about 10 to 100 mole %;
i is 0 to about 80 mole %;
j is 0 to about 60 mole %;
k and n are each independently 0 to about 40 mole %; and
m is 0.01 to about 0.5;
provided that h+i+j+k+n equals 100, and
provided that i+j+k+n is greater than zero, except when h is 100%.
2 . The composition of claim 1 wherein m is from about 0.05 to about 0.4
3 . The composition of claim 1 wherein h is from about 40 to about 70 mole %.
4 . The composition of claim 1 wherein i is from about 30 to about 60 mole %.
5 . The composition of claim 1 wherein j is from about 30 to about 60 mole %.
6 . The composition of claim 1 wherein k and n are each independently from about 0 to about 10 mole %.
7 . The composition of claim 1 wherein the mole % ratio of h to i is from about 50:50 to about 70:30.
8 . The composition of claim 1 wherein the mole % ratio of h to i is about 60:40.
9 . The composition of claim 1 wherein j, k, and n are each zero.
10 . The composition of claim 1 wherein R 1 , R 4 , R 5 and R 6 are each independently H or methyl.
11 . The composition of claim 1 wherein R 1 is H or methyl, R 2 is H, R 3 is —COOR 4 , and R 4 is H or methyl.
12 . A method of providing resistance to stains in substrates comprising contacting the substrate with at least one polymer of Formula 1A having the following repeating units, said units in any sequence
wherein
R 1 is H, methyl or ethyl;
R 2 and R 3 are each independently H, C 1 to about C 10 alkyl, —COOR 4 , CONR 5 R 6 , or —CN;
R 4 is M, C 1 to about C 20 alkyl, or C 6 to C 10 aryl;
R 5 and R 6 are each independently H, C 1 to C 10 alkyl, C 6 to C 10 aryl, or R 5 and R 6 together with the nitrogen atom form a morpholine, pyrrolidine, or piperidine ring;
R 7 is a C 4 to C 8 alkyl group;
M is H, an alkali metal or alkaline earth metal;
h is about 10 to 100 mole %;
i is 0 to about 80 mole %;
j is 0 to about 60 mole %;
k and n are each independently 0 to about 40 mole %; and
p is 0 to about 0.5;
provided that h+i+j+k+n equals 100, and
provided that i+j+k+n is greater than zero, except when h is 100%.
13 . The method of claim 12 wherein m is from about 0.05 to about 0.4, h is from about 40 to about 70 mole %, i is from about 30 to about 60 mole %, j is from about 30 to about 60 mole %, and k and n are each independently from about 0 to about 10 mole %.
14 . The method of claim 12 wherein the mole % ratio of h to i is from about 50:50 to about 70:30.
15 . The method of claim 12 wherein j, k, and n are each zero.
16 . The method of claim 12 wherein R 1 is H or methyl, R 2 is H, R 3 is —COOR 4 , and R 4 is H or methyl.
17 . The method of claim 12 wherein the contacting is by means of spray, foam flex-nip, nip, pad, kiss-roll, beck, skein, winch, brush, roll, spray, immersion, liquid injection, and overflow flood.
18 . The method of claim 12 wherein the polymer is contacted with the substrate in an amount of from about 0.5% to about 3% active ingredient on weight of fiber.
19 . The method of claim 12 wherein the stain is coffee.
20 . The method of claim 12 wherein the stain is mustard.
21 . A substrate treated in accordance with the method of claim 12 .
22 . A substrate which has been treated with at least one polymer of Formula 1A having the following repeating units, said units in any sequence
wherein
R 1 is H, methyl or ethyl;
R 2 and R 3 are each independently H, C 1 to about C 10 alkyl, —COOR 4 , CONR 5 R 6 , or —CN;
R 4 is M, C 1 to about C 20 alkyl, or C 6 to C 10 aryl;
R 5 and R 6 are each independently H, C 1 to C 10 alkyl, C 6 to C 10 aryl, or R 5 and R 6 together with the nitrogen atom form a morpholine, pyrrolidine, or piperidine ring;
R 7 is a C 4 to C 8 alkyl group;
M is H, an alkali metal or alkali earth metal;
h is about 10 to 100 mole %;
i is 0 to about 80 mole %;
j is 0 to about 60 mole %;
k and n are each independently 0 to about 40 mole %; and
p is 0to about 0.5;
provided that h+i+j+k+n equals 100, and
provided that i+j+k+n is greater than zero, except when h is 100%.
23 . The substrate of claim 22 which is a fiber, yarn, textile, fabric, carpet, leather or paper.
24 . The substrate of claim 22 which is resistant to staining by coffee and mustard while maintaining light fastness and wash fastness.
25 . A composition comprising a polymer of Formula 2 having the following repeating units, said units occurring in any sequence
wherein
R 1 is H, methyl or ethyl;
R 2 and R 3 are each independently H, C 1 to about C 10 alkyl, —COOR 4 , CONR 5 R 6 , or —CN;
R 4 is H, C 1 to about C 20 alkyl, or C 6 to C 10 aryl;
R 5 and R 6 are each independently H, C 1 to C 10 alkyl, C 6 to C 10 aryl, or R 5 and R 6 together with the nitrogen atom form a morpholine, pyrrolidine, or piperidine ring;
R 7 is a C 4 to C 8 alkyl group;
R8 is H, C 1 to about C 20 alkyl, or C 6 to C 10 aryl;
R 9 is H, R 10 , or C(O)R 11 ;
R 10 is C 1 to about C 4 alkyl;
R 11 is C 1 to about C 4 alkyl, or C 6 to C 10 aryl;
h is about 10 to 100 mole %;
i is 0 to about 80 mole %;
j is 0 to about 60 mole %;
k and n are each independently 0 to about 40 mole %; and
m is 0.01 to about 0.5;
provided that h+i+j+k+n equals 100, and
provided that i+j+k+n is greater than zero, except when h is 100%.
26 . The composition of claim 25 wherein m is from about 0.05 to about 0.4
27 . The composition of claim 25 wherein h is from about 40 to about 70 mole %.
28 . The composition of claim 25 wherein i is from about 30 to about 60 mole %.
29 . The composition of claim 25 wherein j is from about 30 to about 60 mole %.
30 . The composition of claim 25 wherein k and n are each independently from about 0 to about 10 mole %.
31 . The composition of claim 25 wherein the mole % ratio of h to i is from about 50:50 to about 70:30.
32 . The composition of claim 25 wherein the mole % ratio of h to i is about 60:40.
33 . The composition of claim 25 wherein j, k, and n are each zero.
34 . The composition of claim 25 wherein R 1 , R 4 , R 5 and R 6 are each independently H or methyl.
35 . The composition of claim 25 wherein R 1 is H or methyl, R 2 is H, R 3 is —COOR 4 , and R 4 is H or methyl.Cited by (0)
No later patents cite this yet.
References (0)
No backward citations on record.