Inductively coupled plasma processing apparatus having internal linear antenna for large area processing

Abstract

An inductively coupled plasma processing apparatus for a large area processing, the inductively coupled plasma processing apparatus comprising: a reaction chamber; a plurality of linear antennas horizontally arranged at an inner upper portion of the reaction chamber while being spaced from each other by a predetermined distance for receiving induced RF power, the linear antennas being coupled to each other at an outer portion of the reaction chamber, the linear antennas including at least one bending antenna formed by connecting first ends of adjacent antennas, which are exposed to the outer portion of the reaction chamber, to each other; and at least one magnet positioned adjacent to the linear antennas for creating a magnetic field perpendicularly crossing an electric field created by the linear antennas in such a manner that electrons perform a spiral movement.

1 . An inductively coupled plasma processing apparatus for a large area processing, the inductively coupled plasma processing apparatus comprising: 
 a reaction chamber;    a plurality of linear antennas horizontally arranged at an inner upper portion of the reaction chamber while being spaced from each other by a predetermined distance for receiving induced RF power, the linear antennas being coupled to each other at an outer portion of the reaction chamber, the linear antennas including at least one bending antenna formed by connecting first ends of adjacent antennas, which are exposed to the outer portion of the reaction chamber, to each other; and    at least one magnet positioned adjacent to the linear antennas for creating a magnetic field perpendicularly crossing an electric field created by the linear antennas in such a manner that electrons perform a spiral movement.    
   
   
       2 . The inductively coupled plasma processing apparatus as claimed in  claim 1 , wherein second ends of the first and second linear antennas, which are opposite to the first ends of the first and second linear antennas, are grounded.  
   
   
       3 . The inductively coupled plasma processing apparatus as claimed in  claim 1 , wherein the linear antennas are surrounded by antenna protecting tubes made of quartz.  
   
   
       4 . The inductively coupled plasma processing apparatus as claimed in  claim 1 , wherein the linear antennas are fabricated by using any one selected from the group consisting of copper, stainless steel and aluminum.  
   
   
       5 . The inductively coupled plasma processing apparatus as claimed in  claim 1 , wherein a plurality of magnets are horizontally positioned between adjacent linear antennas while being spaced from each other.  
   
   
       6 . The inductively coupled plasma processing apparatus as claimed in  claim 1 , wherein the magnet has a linear shape corresponding to a shape of the linear antennas.  
   
   
       7 . The inductively coupled plasma processing apparatus as claimed in  claim 1 , wherein a plurality of magnets are provided in such a manner that adjacent two magnets have poles different from each other.  
   
   
       8 . The inductively coupled plasma processing apparatus as claimed in  claim 1 , wherein the magnet is surrounded by a magnet protecting tube made of quartz.