High-throughput deposition system for oxide thin film growth by reactive coevaportation

Abstract

A heater for growing a thin film on substrates contained on a substrate support member includes a plurality of heater elements. The substrate support member containing the substrates is at least partially surrounded by the plurality of heater elements. At least two of the plurality of heater elements are moveable with respect to one another so as to provide external access to the substrate support member. An oxygen pocket is formed in one of the heater elements or a separate oxygen pocket member and is used for oxidation of the film on the substrates.

1 . A heater for growing a thin film on substrates contained on a substrate support member comprising: 
 a plurality of heater elements, wherein the substrate support member containing the substrates is at least partially surrounded by the plurality of heater elements, and wherein at least two of the plurality of heater elements are moveable with respect to one another so as to provide external access to the substrate support member.    
   
   
       2 . The heater of  claim 1 , wherein the heater comprises a top heater element, a side heater element, and a bottom heater element.  
   
   
       3 . The heater of  claim 1 , wherein one of the plurality of heater elements is moveable with respect to a stationary heater element.  
   
   
       4 . The heater of  claim 3 , wherein the bottom heater includes a window opening in a portion thereof.  
   
   
       5 . The heater of  claim 3 , wherein the bottom heater element is stationary and the top heater element and the side heater element are movable with respect to the bottom heater element.  
   
   
       6 . The heater of  claim 3 , wherein the top heater element and the side heater element are stationary and the bottom heater element is moveable with respect to the top and side heater elements.  
   
   
       7 . The heater of  claim 1 , wherein at least two of the plurality of heater elements are connected via a hinge.  
   
   
       8 . The heater of  claim 1 , wherein the substrate support member is supportable on a vertically oriented spindle.  
   
   
       9 . The heater of  claim 8 , wherein the substrate support member is gravitationally held on the spindle.  
   
   
       10 . The heater of  claim 1 , wherein the spindle is rotatable.  
   
   
       11 . The heater of  claim 9 , wherein the substrate support member is moveable in a vertical direction.  
   
   
       12 . A heater for growing a thin film on substrates comprising: 
 a heater cap comprising a top plate having a side wall about its periphery, the top plate and side wall each having a heating element disposed therein;    a lower heater plate having an upper and lower surface, a portion of the lower heater plate having a window disposed therein passing from the upper surface to the lower surface of the lower heater plate and a recessed pocket formed in a portion of the upper surface of the lower heater plate; and    wherein the heater cap and lower heater plate are moveable with respect to one another in a direction perpendicular to the upper face of the lower heater plate.    
   
   
       13 . The heater of  claim 12 , wherein the lower heater plate is stationary and the heater cap is moveable with respect to the lower heater plate.  
   
   
       14 . The heater of  claim 12 , wherein the heater cap is stationary and the lower heater plate is moveable with respect to the heater cap.  
   
   
       15 . The heater of  claim 12 , further comprising an actuator for moving the heater cap with respect to the lower heater plate.  
   
   
       16 . A heater for growing a thin film on substrates comprising: 
 an upper heater zone comprising a top member having a side wall about its periphery, the top member and side wall each having a heating element disposed therein;    a lower heater zone having a heating element disposed therein;    an oxygen pocket member having an upper and lower surface, a portion of the oxygen pocket member having a window disposed therein passing from the upper surface to the lower surface and a recessed pocket formed in a portion of the upper surface of the oxygen pocket member, the oxygen pocket member at least partially surrounded by at least one of the upper heater zone and lower heater zone; and    wherein the upper heater zone is moveable in a direction perpendicular to the upper face of the oxygen pocket member.    
   
   
       17 . A method of unloading and loading a substrate support member in a heater comprising the steps of: 
 providing a heater having a plurality of heater elements, wherein the substrate support member is at least partially surrounded by the plurality of heater elements, and wherein at least two of the plurality of heater elements are moveable with respect to one another so as to provide external access to the substrate support member;    moving the plurality of heater elements into an unload position;    removing the substrate support member from the heater;    inserting a second substrate support member into the heater; and    moving the plurality of heater elements into a loaded position.    
   
   
       18 . The method of  claim 17 , wherein heater is disposed in a vacuum chamber.  
   
   
       19 . The method of  claim 17 , further comprising the step of depositing a thin film on substrates disposed on the substrate support member.  
   
   
       20 . The method of  claim 18 , wherein the removal and insertion of the substrate support members occurs under vacuum conditions.  
   
   
       21 . The method of  claim 17 , wherein the at least two of the plurality of heater elements are moveable with respect to one another in a vertical direction.  
   
   
       22 - 43 . (canceled)