Methods for producing corrosion resisting particles and methods for producing coating compositions that include such particles

Abstract

Coating compositions are disclosed that include corrosion resisting particles such that the coating composition can exhibit corrosion resistance properties. Also disclosed are substrates at least partially coated with a coating deposited from such a composition and multi-component composite coatings, wherein at least one coating later is deposited from such a coating composition. Methods and apparatus for making corrosion resisting particles are also disclosed.

1 . A method for producing particles comprising an inorganic oxide network comprising silicon and an inorganic material different from silicon, comprising: 
 (a) combining a metal salt with water to produce a solution comprising a hydrolyzed species comprising a polyvalent metal ion; and then (b) reacting the hydrolyzed species with a silicon compound.    
     
     
         2 . The method of  claim 1 , wherein metal salt comprises Ce 3+ , Ce 4+ , Zn 2+ , Zn 4+ , Mg 2+ , Y 3+ , Ca 2+ , Mn 7+ , or Mo 6+ .  
     
     
         3 . The method of  claim 1 , wherein the inorganic oxide network comprises zinc, cerium, yttrium, zirconium, manganese, magnesium, or calcium in combination with silicon, phosphorous, and/or boron.  
     
     
         4 . The method of  claim 3 , wherein the inorganic oxide network comprises silicon and cerium, zinc, zirconium, and/or manganese.  
     
     
         5 . The method of  claim 1 , wherein silicon compound comprises an organosilane.  
     
     
         6 . The method of  claim 5 , wherein the organosilane comprises tetramethoxysilane, tetraethoxysilane, tetra-n-propoxysilane, tetra-n-butoxysilane, methyltrimethoxysilane, methyltriethoxysilane, or a mixture thereof.  
     
     
         7 . The method of  claim 5 , wherein the organosilane is dissolved in a water soluble organic solvent prior to its combination with a metal salt and water.  
     
     
         8 . The method of  claim 1 , wherein the method does not include the use of sulfuric acid.  
     
     
         9 . The method of  claim 1 , further comprising adding a base to the solution.  
     
     
         10 . A method for making a coating composition comprising: 
 (a) producing particles comprising an inorganic oxide network comprising silicon and an inorganic material different from silicon according to the method of  claim 1;  and then    (b) adding the particles to a composition comprising a film-forming resin.    
     
     
         11 . A method for producing particles comprising an inorganic oxide network comprising silicon and an inorganic material different from silicon, comprising simultaneously adding to water reactants comprising: (a) a metal salt, and (b) an organosilane.  
     
     
         12 . The method of  claim 11 , wherein metal salt comprises Ce 3+ , Ce 4+ , Zn 2+ , Zn 4+ , Mg 2+ , Y 3+ , Ca 2+ , Mn 7+ , or Mo 6+ .  
     
     
         13 . The method of  claim 11 , wherein the inorganic oxide network comprises zinc, cerium, yttrium, zirconium, manganese, magnesium, or calcium in combination with silicon, phosphorous, and/or boron.  
     
     
         14 . The method of  claim 13 , wherein the inorganic oxide network comprises silicon and cerium, zinc, zirconium, and/or manganese.  
     
     
         15 . The method of  claim 11 , wherein the organosilane comprises tetramethoxysilane, tetraethoxysilane, tetra-n-propoxysilane, tetra-n-butoxysilane, or a mixture thereof.  
     
     
         16 . The method of  claim 15 , wherein the organosilane is dissolved in a water soluble organic solvent prior to its combination with a metal salt and water.  
     
     
         17 . The method of  claim 11 , wherein the method does not include the use of sulfuric acid.  
     
     
         18 . The method of  claim 1 , further comprising adding a base.  
     
     
         19 . A method for making a coating composition comprising: 
 (a) producing particles comprising an inorganic oxide network comprising silicon and an inorganic material different from silicon according to the method of  claim 11;  and then    (b) adding the particles to a composition comprising a film-forming resin.