Micro electromechanical systems for delivering high purity fluids in a chemical delivery system

Abstract

Complex fluidic micro electromechanical systems (MEMS) are incorporated into high purity chemical delivery systems, while maintaining valve sealing integrity, quality and performance of the system. In particular, fluidic MEMS systems are incorporated into high purity chemical delivery systems for semiconductor fabrication processes.

1 . A fluid distribution system comprising: 
 a first block including a pressurization channel disposed within the first block, a pressure sensor at least partially formed within the first block and in fluid communication with the pressurization channel, and a plurality of valves at least partially formed in the first block and in fluid communication with the pressurization channel to facilitate pressurizing of a pressurization fluid entering the pressurization channel from a pressurization supply source to a selected pressure prior to delivery of the pressurization fluid to a first process fluid supply source; and    a second block including a network of delivery channels disposed within the second block and a plurality of valves at least partially formed within the second block and in fluid communication with the network of delivery channels to facilitate a supply of a process fluid to a delivery site from at least one of the first process fluid supply source and a second fluid supply source.    
     
     
         2 . The fluid distribution system of  claim 1 , wherein the cross-sectional dimensions of the channels in each of the first and second blocks are no greater than about 200 micrometers.  
     
     
         3 . The fluid distribution system of  claim 1 , wherein the first and second blocks and the valves of each of the first and second blocks are at least partially formed of silicon.  
     
     
         4 . The fluid distribution system of  claim 1 , wherein the second block includes independently controllable first, second and third shut-off valves to facilitate selective delivery of process fluid from one of the first process fluid supply source to the delivery site, the second process fluid supply source to the delivery site, the second process fluid supply source to the first process fluid supply source, and combinations thereof.  
     
     
         5 . The fluid distribution system of  claim 1 , wherein the first, second and third shut-off valves are further independently controllable to facilitate delivery of process fluid from the second process fluid supply source to the first process fluid supply source while preventing fluid delivery from the second block to the delivery site.  
     
     
         6 . The fluid distribution system of  claim 5 , wherein each of the first, second and third shut-off valves includes a first channel in fluid communication with a second channel and a scaling member disposed between the first and second channels to selectively provide an asymmetric fluidic seal between the first and second channels such that, when a pressure differential is equally applied in opposing directions between the first and second channels, a fluid leakage rate across the sealing member is higher when fluidic pressure within the second channel is greater than fluidic pressure in the first channel in comparison to when fluidic pressure in the first channel is greater than fluidic pressure in the second channel.  
     
     
         7 . A fluid distribution system comprising: 
 a first process fluid supply source;    a first block in fluid communication with the first process fluid supply source, the first block including a pressurization channel disposed within the block, a pressure sensor at least partially formed within the first block and in fluid communication with the pressurization channel, and a plurality of valves at least partially formed in the first block and in fluid communication with the pressurization channel to facilitate pressurizing of a pressurization fluid entering the pressurization channel from a pressurization supply source to a selected pressure prior to delivery of the pressurization fluid to the first process fluid supply source; and    a second block in fluid communication with the first process supply source, the second block including a network of delivery channels disposed within the second block and a plurality of valves at least partially formed within the second block and in fluid communication with the network of delivery channels to facilitate a supply of a process fluid to a delivery site from at least one of the first process fluid supply source and a second fluid supply source.    
     
     
         8 . A method of delivering a process fluid at a controlled flow rate from at least one of a first process fluid supply source and a second process fluid supply source to a delivery site utilizing a distribution system including a first block and a second block, the first block including a pressurization channel disposed within the block, and a pressure sensor at least partially formed within the first block and in fluid communication with the pressurization channel, and the second block including a network of delivery channels disposed within the second block and a plurality of valves at least partially formed within the second block and in fluid communication with the network of delivery channels, the method comprising: 
 (a) facilitating fluid communication between the first block, a pressurization supply source, and the first process fluid supply source;    (b) pressurizing a pressurization fluid entering the pressurization channel of the first block from the pressurization supply source to a selected pressure;    (c) delivering the pressurization fluid at the selected pressure to the first process fluid supply source;    (d) facilitating fluid communication between the second block and each of the first and second fluid supply sources and the fluid delivery site; and    (e) manipulating at least one of the valves of the second block between open and closed positions to supply the process fluid from at least one of the first process fluid supply source and the second fluid supply source to the delivery site.    
     
     
         9 . The method of  claim 8 , wherein the channels in each of the first and second blocks are no greater than about 200 micrometers.  
     
     
         10 . The method of  claim 8 , wherein the first and second blocks and the valves of each of the first and second blocks are at least partially formed of silicon.  
     
     
         11 . The method of  claim 8 , wherein the second block includes first, second and third shut-off valves that are independently manipulated to facilitate selective delivery of process fluid from one of the first process fluid supply source to the delivery site, the second process fluid supply source to the delivery site, the second process fluid supply source to the first process fluid supply source, and combinations thereof.  
     
     
         12 . The method of  claim 11 , wherein the first, second and third shut-off valves are further independently manipulated to facilitate delivery of process fluid from the second process fluid supply source to the first process fluid supply source while preventing fluid delivery from the second block to the delivery site.  
     
     
         13 . The method of  claim 11 , wherein each of the first, second and third shut-off valves includes a first channel in fluid communication with a second channel and a sealing member disposed between the first and second channels to selectively provide an asymmetric fluidic seal between the first and second channels such that, when a pressure differential is equally applied in opposing directions between the first and second channels, a fluid leakage rate across the sealing member is higher when fluidic pressure within the second channel is greater than fluidic pressure in the first channel in comparison to when fluidic pressure in the first channel is greater than fluidic pressure in the second channel.  
     
     
         14 . A semiconductor processing fluid distribution system comprising: 
 a semiconductor processing tool; and    at least one block including at least one channel formed within the block and a plurality of valves at least partially formed within the at least one block and in fluid communication with the at least one channel, the at least one channel including: 
 a pressurization supply flow path to deliver a pressurization fluid from a pressurization fluid supply source to a first process fluid supply source; and  
 a process fluid delivery flow path to selectively deliver a process fluid from at least one of the first process fluid supply source and a second process fluid supply source to the semiconductor processing tool.  
   
     
     
         15 . A method of providing a process fluid to a semiconductor processing tool, the method comprising: fluid distribution system comprising: 
 (a) providing at least one block including at least one channel formed within the at least one block and a plurality of valves at least partially formed within the at least one block and in fluid communication with the at least one channel;    (b) pressurizing a process fluid disposed within a first process fluid supply source by delivering a pressurization fluid from a pressurization fluid supply source to the first process fluid supply source via a pressurization flow path of the at least one channel;    (c) selectively delivering a process fluid, via a process fluid delivery flow path of the at least one channel, from at least one of the first process fluid supply source and a second process fluid supply source to the semiconductor processing tool.