US2007166134A1PendingUtilityA1

Substrate transfer method, substrate transfer apparatus and exposure apparatus

Assignee: SUZUKI MOTOKOPriority: Dec 20, 2005Filed: Dec 12, 2006Published: Jul 19, 2007
Est. expiryDec 20, 2025(expired)· nominal 20-yr term from priority
Inventors:Motoko Suzuki
H10P 72/3304H10P 72/0434H10P 72/0474
39
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Claims

Abstract

The present invention relates to a substrate transporting method that transports substrates such as wafers or reticles, a substrate transport apparatus, and an exposure apparatus for use in lithography of, for example, semiconductor integrated circuits, and it is an object of the present invention to efficiently heat a substrate. Furthermore, a substrate transporting method that, after transporting a substrate disposed in the ambient atmosphere into a vacuum chamber and drawing a vacuum therein, transports the substrate to a stage apparatus disposed in a vacuum atmosphere, comprises the step of: transporting the substrate, which is disposed in the ambient atmosphere, to the stage apparatus in a state wherein the substrate is held by a holding means, which can regulate the temperature of the substrate.

Claims

exact text as granted — not AI-modified
1 . A substrate transporting method that, after transporting a substrate disposed in the ambient atmosphere into a vacuum chamber and drawing a vacuum therein, transports the substrate to a stage apparatus disposed in a vacuum atmosphere, comprising the step of: 
 transporting the substrate, which is disposed in the ambient atmosphere, to the stage apparatus in a state wherein the substrate is held by a holding means, which can regulate the temperature of the substrate in at least one part of the section through which it is transported.    
   
   
       2 . A substrate transporting method according to  claim 1 , wherein 
 the holding means sets a first temperature so that, when the temperature of the substrate is raised to the first temperature before drawing a vacuum around the substrate, and, after drawing a vacuum around the substrate, is subsequently raised to a target temperature, the substrate temperature when it drops is lower than the target temperature.    
   
   
       3 . A substrate transporting method according to  claim 1 , wherein 
 the holding means is detachable from the stage apparatus.    
   
   
       4 . A substrate transport apparatus that, after transporting a substrate disposed in the ambient atmosphere, into a vacuum chamber and drawing a vacuum therein, transports the substrate to a stage apparatus disposed in a vacuum atmosphere, comprising: 
 a holding means that holds the substrate; and    a transporting means that transports the substrate, which is disposed in the ambient atmosphere, to the stage apparatus in a state wherein the substrate is held by the holding means;    wherein,    the holding means comprises a temperature regulating means that regulates the temperature of the substrate.    
   
   
       5 . A substrate transport apparatus according to  claim 4 , wherein: 
 the temperature regulating means sets a first temperature so that, when the temperature of the substrate is raised to the first temperature before drawing a vacuum around the substrate, and, after drawing a vacuum around the substrate, is subsequently raised to a target temperature, the substrate temperature when it drops is lower than the target temperature.    
   
   
       6 . A substrate transport apparatus according to  claim 4 , wherein 
 the holding means is detachable from the stage apparatus.    
   
   
       7 . A substrate transport apparatus according to  claim 4 , wherein 
 the holding means comprises: 
 an electrostatic chuck that detachably holds the substrate; and  
 a power supplying means that supplies electric power to the electrostatic chuck.  
   
   
   
       8 . A substrate transport apparatus according to  claim 4 , wherein 
 the temperature regulating means comprises: 
 an electric heater that heats the substrate;  
 a temperature sensor that detects the temperature of the substrate;  
 a controlling means that controls the temperature of the substrate based on a signal from the temperature sensor; and  
 a power supplying means that supplies electric power to the electric heater.  
   
   
   
       9 . A substrate transport apparatus according to  claim 7 , wherein 
 the power supplying means is a storage battery that is disposed in the electrostatic chuck.    
   
   
       10 . A substrate transport apparatus according to  claim 9 , comprising: 
 a charging means for charging the storage battery.    
   
   
       11 . A substrate transport apparatus according to  claim 4 , wherein 
 the substrate is exposed while it is held by the holding means as is.    
   
   
       12 . A substrate transport apparatus according to  claim 4 , wherein 
 with the substrate held by the holding means as is after the exposure is complete, the substrate is transported to the location where it was transferred in order to be held by the holding means.    
   
   
       13 . A substrate transport apparatus according to  claim 4 , wherein 
 the transporting means, which transfers the substrate to the holding means, is used to transfer the holding means at least in one part of the section through which it is transported.    
   
   
       14 . An exposure apparatus, comprising: 
 an illumination optical system;    a stage apparatus, which is disposed inside a vacuum apparatus;    a transport robot that transports a substrate to a holding means, which adjusts the temperature of the substrate;    a transport robot that transports the holding means, whereon the substrate is mounted, to the stage apparatus, which is disposed inside a vacuum atmosphere; and    a temperature regulating means that regulates the temperature of the substrate.    
   
   
       15 . An exposure apparatus according to  claim 14 , wherein 
 the holding means comprises: 
 an electrostatic chuck that detachably holds the substrate; and  
 a power supplying means that supplies electric power to the electrostatic chuck.  
   
   
   
       16 . An exposure apparatus according to  claim 14 , wherein 
 the temperature regulating means comprises: 
 an electric heater that heats the substrate;  
 a temperature sensor that detects the temperature of the substrate;  
 a controlling means that controls the temperature of the substrate based on a signal from the temperature sensor; and  
 a power supplying means that supplies electric power to the electric heater.

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