Apparatus for the efficient coating of substrates

Abstract

A process for the coating of substrates comprising insertion of a substrate into a process oven, dehydration of the substrate, withdrawal of a metered amount of one or more chemicals from one or more chemical reservoirs, vaporizing the withdrawn chemicals in one or more vapor chambers, and transfer of the vaporized chemicals into a process oven, thereby reacting with the substrate. An apparatus for the coating of substrates comprising a process oven, a metered chemical withdrawal subsystem, and a vaporization subsystem.

1 . A chemical vapor reaction apparatus comprising: 
 a fluid input portion;    a vapor chamber, said vapor chamber fluidically coupled to said fluid input portion; and    a process chamber, said process chamber fluidically coupled by a first chemical vapor delivery line to said vapor chamber.    
   
   
       2 . The chemical vapor reaction apparatus of  claim 1  wherein said fluid input portion comprises one or more fluid withdrawal portions.  
   
   
       3 . The chemical vapor reaction apparatus of  claim 1  wherein said fluid input portion comprises one or more chemical reservoirs.  
   
   
       4 . The chemical vapor reaction apparatus of  claim 2  wherein said fluid withdrawal portion comprises a first syringe pump.  
   
   
       5 . The chemical vapor reaction apparatus of  claim 4  wherein said fluid withdrawal portion further comprises: 
 an input line coupled to said first syringe pump and adapted to receive fluid from a first chemical reservoir; and    a first isolating valve, said first isolating valve located to fluidically isolate said first chemical reservoir from said first syringe pump.    
   
   
       6 . The chemical vapor reaction apparatus of  claim 5  further comprising: 
 a first output line adapted to deliver fluid from said first syringe pump to said vapor chamber; and    a second isolating valve, said second isolating valve located to fluidically isolate said first syringe pump from said vapor chamber.    
   
   
       7 . The chemical vapor reaction apparatus of  claim 1  further comprising a vacuum inlet line, said vacuum inlet line fluidically coupled to said process chamber.  
   
   
       8 . The chemical vapor reaction apparatus of  claim 7  wherein said vacuum inlet line is fluidically coupled to said vapor chamber.  
   
   
       9 . The chemical vapor reaction apparatus of  claim 8  further comprising a vapor chamber heater.  
   
   
       10 . The chemical vapor reaction apparatus of  claim 8  further comprising a vapor chamber isolation valve, said vapor chamber isolation valve adapted to fluidically isolate said vapor chamber from said process oven.  
   
   
       11 . The chemical vapor reaction apparatus of  claim 10  further comprising a first limit switch, said first limit switch adapted to regulate the pressure in said vapor chamber.  
   
   
       12 . A chemical vapor reaction apparatus comprising: 
 a vacuum chamber;    a vapor chamber, said vapor chamber fluidically coupled to said vacuum chamber, said vapor chamber fluidically isolatable from said vacuum chamber; and    a chemical delivery system, said chemical delivery system fluidically coupled to said vapor chamber, said chemical delivery system fluidically isolatable from said vapor chamber.    
   
   
       13 . The chemical vapor reaction apparatus of  claim 12 , further comprising a gas delivery system, said gas delivery system fluidically coupled to said vacuum chamber, said gas delivery system fluidically isolatable from said vacuum chamber.  
   
   
       14 . The chemical vapor reaction apparatus of  claim 13 , further comprising a vacuum delivery system, said vacuum delivery system fluidically coupled to said vacuum chamber.  
   
   
       15 . The chemical vapor reaction apparatus of  claim 14 , wherein said vacuum system is fluidically coupled to said vapor chamber.  
   
   
       16 . The chemical vapor reaction apparatus of  claim 12  wherein said vapor chamber comprises a vapor chamber heater.  
   
   
       17 . The chemical vapor reaction apparatus of  claim 16  wherein said chemical delivery system is adapted to deliver a first amount of a first chemical to said vapor chamber.  
   
   
       18 . The chemical vapor reaction apparatus of  claim 17  wherein said chemical delivery system is adapted to deliver a second amount of a second chemical to said vapor chamber.  
   
   
       19 . The chemical vapor reaction apparatus of  claim 17  wherein said gas delivery system comprises a gas heating portion.  
   
   
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