US2007224920A1PendingUtilityA1

Polishing pad, method of polishing and polishing apparatus

45
Assignee: TOSHIBA KKPriority: Mar 27, 2006Filed: Mar 27, 2007Published: Sep 27, 2007
Est. expiryMar 27, 2026(expired)· nominal 20-yr term from priority
B24D 5/00B24B 37/00B24B 37/26B24D 11/00
45
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Claims

Abstract

A polishing pad according to the invention comprises a pad body having a polishing surface and a support surface and a plurality of hole apertures extending from the polishing surface to the support surface, each of the plurality of apertures having a noncircular shaped opening oriented at a predetermined angle with respect to a radial direction of the polishing pad.

Claims

exact text as granted — not AI-modified
1 . A polishing pad for polishing an object, comprising: 
 a pad body having a polishing surface and a support surface; and    a plurality of hole apertures extending from the polishing surface to the support surface, each of the plurality of apertures having a noncircular shaped opening oriented at a predetermined angle with respect to a radial direction of the polishing pad.    
     
     
         2 . The polishing pad according to  claim 1 , wherein the opening has an elliptical shape.  
     
     
         3 . The polishing pad according to  claim 1 , wherein the opening includes a part having a gradually widening width in a predetermined direction with respect to the radial direction.  
     
     
         4 . The polishing pad according to  claim 2 , wherein the opening has a major axis thereof angled with respect to the radial direction.  
     
     
         5 . The polishing pad according to  claim 3 , wherein the opening has a major axis thereof angled with respect to the radial direction.  
     
     
         6 . The polishing pad according to  claim 1 , wherein the opening includes a part having a gradually widening width in a predetermined direction with respect to the radial direction, the opening having a down stream side curving inwardly.  
     
     
         7 . The polishing pad according to  claim 1 , wherein the opening includes a part having a gradually widening width in a predetermined direction with respect to the radial direction, the opening having a down stream side curving outwardly.  
     
     
         8 . The polishing pad according to  claim 6 , wherein the opening has a major axis thereof angled with respect to the radial direction.  
     
     
         9 . The polishing pad according to  claim 2 , wherein the opening has a major axis thereof angled with respect to the radial direction.  
     
     
         10 . a polishing pad configured to be arranged to face the be-polished object hold by the holder mechanism, the polishing pad including a plate-like pad having a polishing surface and a support surface; 
 a drive mechanism to rotate the polishing pad;    a plurality of hole apertures extending from the polishing surface to the support surface, each of the plurality of apertures having a noncircular shaped opening oriented at a predetermined angle with respect to a radial direction of the polishing pad.    
     
     
         11 . The polishing apparatus according to  claim 10 , wherein the opening has an elliptical shape.  
     
     
         12 . The polishing apparatus according to  claim 10 , wherein the opening includes a part having a gradually widening width in a predetermined direction with respect to the radial direction.  
     
     
         13 . The polishing apparatus according to  claim 11 , wherein the opening has a major axis thereof angled with respect to the radial direction.  
     
     
         14 . A method of polishing an object, comprising: 
 holding the object; and    pressing a polishing pad in contact with the object;    the polishing pad including a pad body having a polishing surface and a support surface; and    a plurality of hole apertures extending from the polishing surface to the support surface, each of the plurality of apertures having a noncircular shaped opening oriented at a predetermined angle with respect to a radial direction of the polishing pad.    
     
     
         15 . The polishing method according to  claim 14 , wherein the opening has an elliptical shape.  
     
     
         16 . The polishing method according to  claim 14 , wherein the opening includes a part having a gradually widening width in a predetermined direction with respect to the radial direction.  
     
     
         17 . The polishing method according to  claim 16 , wherein the opening has a major axis thereof angled with respect to the radial direction.

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