Device having low outgassing photo or electron beam curable rubbery polymer material

Abstract

Disclosed are photo or electron beam polymerizable compositions, and preparation thereof and devices containing them. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material. It is ideal for use in lithographic tools involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials for 157 nm lithographic tools.

1 - 12 . (canceled)  
   
   
       13 . A device comprising a cured composition of matter as an adhesive or sealant material, the composition of matter consisting essentially of a reaction product of 
 (i) a photo or electron beam curable material component comprising a material having the backbone of a completely or substantially completely hydrogenated hydrocarbon based rubber material, which is completely or substantially free of carbon-carbon double and triple bonds, and bears at least one photo or electron beam polymerizable terminal or pendant group;    (ii) a photoinitiator/photosensitizer component having essentially no volatility at room temperature and also yielding photoproducts after exposure to actinic radiation that have minimal or no volatility at room temperature;    (iii) an optional viscosity adjustment component that is either homopolymerizable or is capable of copolymerizing with the photo or electron beam curable material component of (i); and    (iv) an optional inert filler,    wherein the composition of matter, when cured, has a low outgassing rate such that it passes the ASTM-E-595-93 (1999) test and has a low outgassing rate when exposed to ultraviolet radiation having a wavelength less than or equal to about 248 nm.    
   
   
       14 . A device in accordance with  claim 13  which is a lithographic device involving using deep and/or vacuum ultraviolet irradiation.  
   
   
       15 . A device in accordance with  claim 14  comprising the cured composition of matter as lens potting material.  
   
   
       16 . A device in accordance with  claim 14  wherein the wavelength of the lithographic radiation is approximately 157 nm or shorter.  
   
   
       17 . A device in accordance with  claim 14 , wherein the lens material is doped or undoped high purity fused silica or crystalline CaF 2 , optionally coated with antireflective material selected from the group consisting of: magnesium fluoride, aluminum fluoride, calcium fluoride, gadolinium fluoride, thorium fluoride, lanthanum fluoride, yttrium fluoride, neodymium fluoride, dysprosium fluoride, sodium aluminum fluoride, alumina, silica, fluorine-containing silica, hafnia, scandium oxide, thorium oxide, zirconia, yttria, and compatible combinations thereof.  
   
   
       18 . The device according to  claim 13 , wherein the photo or electron beam curable material component of (i) is functionalized by at least one polymerizable terminal or pendant group selected from the group consisting of: acrylate, methacrylate, acrylamide, maleimide, thioacrylate, thiomethacrylate, vinyl sulfide, itaconate, crotonate, styrene and N-vinyl amide, hydroxyl, thiol, oxetane, episulfide, vinyl ether, propenyl ether, allyl ether, and compatible mixtures and/or combinations thereof.  
   
   
       19 . The device according to  claim 13 , wherein the composition of matter is essentially free of silicone.  
   
   
       20 . The device according to  claim 13 , wherein the photo or electron beam curable material component of (i) comprises a functionalized material bearing at least one photo or electron beam polymerizable terminal or pendant group selected from the group consisting of: polybutadiene, polyisoprene, polyethylene propylene rubber and combinations thereof, which material comprises a backbone that is completely hydrogenated or substantially completely hydrogenated and completely or substantially completely free of carbon-carbon double and triple bonds.  
   
   
       21 . The device according to  claim 23 , wherein the photo or electron beam curable material component of (i) is functionalized by at least one polymerizable terminal or pendant group selected from the group consisting of: acrylate, methacrylate, acrylamide, maleimide, thioacrylate, thiomethacrylate, vinyl sulfide, itaconate, crotonate, styrene and N-vinyl amide, hydroxyl, thiol, epoxy, oxetane, episulfide, vinyl ether, propenyl ether, allyl ether, and compatible mixtures and/or combinations thereof.  
   
   
       22 . The device according to  claim 24 , wherein the photo or electron beam curable material component of (i) is functionalized by at least one polymerizable terminal or pendant group selected from the group consisting of: epoxy, acrylate and methacrylate.  
   
   
       23 . The device according to  claim 13 , wherein the photoinitiator/photosensitizer is selected from the group consisting of the following compounds and/or mixtures in purified and/or diluted form: 
 oligo [2-hydroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]propanone];    oligo [2-hydroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]propanone], diluted in tripropylene glycol diacrylate (25% TPGDA);    1-[4-(4-benzoylphenylsulfonyl)phenyl]-2-methyl-2-(4-methylphenylsulfonyl)propan-1-one;    bis(2,4,6-trimethylbenzoyl)-phenyl phosphine oxide;    2-benzyl-2-N,N-dimethylamino-1-(4-morpholino-phenyl)-1-butanone;    bis 5-(2,4-cyclopentadien-1-yl) bis(2,6-difluoro-3 -(1H-pyrrol-1-yl)phenyl)titanium;    bis (2,6-dimethoxybenzoyl)-2,4,4-trimethylpentyl phosphine oxide;    2-oxepanone, homopolymer, 2-[[4-[2-methyl-2-(4-morpholinyl)-1-oxopropyl]phenyl]thio]ethyl ester;    mixture of 2-isopropylthioxanthone and 4-isopropylthioxanthone;    1,3-dimethyl-2-hydroxy-9H-thioxanthen-9-one, 2-ethylhexyl ester;    4,4′-bis(methylethylamino)benzophenone;    4,4′-bis(isopropylphenoxy)benzophenone;    4-benzoyl-4′-methyldiphenyl sulfide;    2-chloro-thioxanthone;    1-chloro-4-propoxythioxanthone;    2,4-diethylthioxanthone;    poly[oxy(methyl-1,2-ethanediyl)], α-[4-(dimethylamino)benzoyl-ω-butoxy-;    2,2′-bis-(2-chlorophenyl)-4,5,4′,5′-tetraphenyl-2′H-<1,2′>biimidazolyl;    (tolylcumyl)iodonium tetrakis(pentafluorophenyl) borate;    [4-[(2-hydroxytetradecyl)oxy]phenyl]phenyliodonium hexafluoro antimonate;    mixture of bis(4-dodecylphenyl)iodonium hexafluoroantimonate,    isopropylthioxanthone, and C12+C14 alkylglycidyl ethers;    mixture of bis(4-dodecylphenyl)iodonium hexafluoroantimonate and C12+C14 alkylglycidyl ethers;    phenyl-4-octyloxyphenyl iodonium hexafluoro antimonate;    mixture of triaryl sulfonium hexafluoroantimonate salts;    mixture of triaryl sulfonium hexafluorophosphate salts;    perylene;    anthracene;    1,2-benzanthracene;    9-n-butoxyanthracene;    9,10-di-n-butoxy anthracene;    9,10-di-n-propoxy anthracene;    9,10-diethoxy anthracene;    anthrone;    pyrene;    2-ethyl-9,10-dimethoxy anthracene;    2,5-diphenyl-1,3,4-oxadiazole;    diphenyl anthracene;    9,10-dimethylanthracene;    1,3-diphenyl-2-pyrazoline;    1,3-diphenylisobenzofuran;    N,N,N′,N′-tetraphenyl benzidine; and    NN,N′,N′-tetraphenyl phenylene diamine; and compatible mixtures thereof and/or compatible combinations thereof.    
   
   
       24 . The device according to  claim 13 , wherein the inert filler is an inorganic filler selected from the group consisting of alumina, crystobalite, aluminum trihydroxide, talc, feldspar, calcium carbonate, mica, clay, wallastonite, nepeleline syenite, silica, and compatible mixtures thereof and compatible combinations thereof.  
   
   
       25 . The device according to  claim 13 , wherein the cured composition of matter is obtained by exposing the composition of claim  1  to visible light, ultraviolet light ,or electron beam, and wherein the cured composition of matter has a low modulus ranging from 25 to 10,000 psi (1.7×10 5 to 6.8×10 7  Pa).  
   
   
       26 . The device according to claim  28 , wherein the cured composition of matter has a Tg of equal to or lower than 25° C.