Method and apparatus for fluid polishing
Abstract
In a fluid polishing method for processing a fine aperture by slurry 7, the slurry is supplied from a cylinder 2 a in a slurry flow rate target process until the flow rate increases to a target value of a slurry feed flow rate. When the flow rate reaches the target flow rate, the cylinder is stopped and switched to another cylinder 2 b and the operation fluid flow rate of the fine aperture is thereafter measured. In a metering process, to be executed next, a necessary processing time is calculated on the basis of the operation fluid flow rate and polishing is carried out for a necessary processing time by another cylinder 2 b. Another cylinder is then stopped and switched and the operation fluid flow rate is measured. In this way, the metering process is repeated until the operation fluid flow rate reaches a predetermined value. In each process, the supply of the slurry is not interrupted.
Claims
exact text as granted — not AI-modified1 . A fluid polishing method for polishing and processing a fine aperture in a work, by supplying a slurry as a polishing fluid to said work, comprising:
a polishing step of supplying said slurry from a feeding apparatus; and a stopping step of stopping the supply of said slurry from said feeding apparatus; wherein processing is started after at least a predetermined amount of said slurry is charged in advance into said feeding apparatus to prevent the supply of said slurry from said feeding apparatus being stopped before said stopping step.
2 . A fluid polishing method for polishing and processing a fine aperture in a work by supplying a slurry as a polishing fluid to said work, comprising:
a polishing step of supplying said slurry from one of a plurality of feeding apparatuses; a stopping step of stopping the supply of said slurry by stopping said feeding apparatuses; and a switching step of switching said feeding apparatuses to another feeding apparatus after said stopping step is executed so that said slurry can be supplied to said work by said other feeding apparatus; wherein processing is started after at least a predetermined amount of said slurry is charged in advance into said feeding apparatuses to prevent the supply of said slurry from said feeding apparatuses being stopped before said stopping step.
3 . A fluid polishing method according to claim 1 , wherein said feeding apparatus is of a plunger type and has a cylinder, said slurry can be sucked from said slurry tank by the reciprocation of said plunger, said slurry remaining inside said cylinder is completely returned to said slurry tank while said work is fitted or removed, and is again sucked so that said cylinder is filled substantially completely with said slurry.
4 . A fluid polishing method according to claim 1 , wherein said feeding apparatuses are of a plunger type and have a cylinder, said slurry can be sucked from said slurry tank by the reciprocation of said plunger, and said feeding apparatus in a rest condition, where it is not involved in the supply of said slurry, completely returns said slurry remaining inside said cylinders to said slurry tank while said feeding apparatus in operation supplies said slurry to said work, and then sucks again said slurry and is filled substantially completely with said slurry.
5 . A fluid polishing method according to claim 3 , wherein the capacity of each cylinder is 100 cc or more.
6 . A fluid polishing method according to claim 1 , wherein the supply pressure of said feeding apparatuses is kept constant.
7 . A fluid polishing method according to claim 1 , wherein said work is a fine aperture of a fuel injector for a diesel engine.
8 . A fluid polishing method according to claim 4 , wherein the capacity of each cylinder is 100 cc or more.
9 . A fluid polishing method according to claim 2 , wherein the supply pressure of said feeding apparatuses is kept constant.
10 . A fluid polishing method according to claim 2 , wherein said work is a fine aperture of a fuel injector for a diesel engine.Join the waitlist — get patent alerts
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