US2007295600A1PendingUtilityA1

Wet chemical processing chambers for processing microfeature workpieces

54
Assignee: HANSON KYLE MPriority: Jun 6, 2003Filed: Sep 7, 2007Published: Dec 27, 2007
Est. expiryJun 6, 2023(expired)· nominal 20-yr term from priority
H10P 72/7602H10P 72/3302H10P 72/0462H10P 72/00H10P 72/0476C25D 17/00
54
PatentIndex Score
0
Cited by
0
References
0
Claims

Abstract

A wet chemical processing chamber comprising a fixed unit, a detachable unit releasably coupled to the fixed unit, a seal contacting the fixed unit and the detachable unit, and a processing component disposed in the fixed unit and/or the detachable unit. The fixed unit can have a first flow system configured to direct a processing liquid through the fixed unit and a mounting fixture for fixedly attaching the fixed unit to a platform or deck of an integrated processing tool. The detachable unit can include a second flow system configured to direct the processing liquid to and/or from the first flow system of the fixed unit. The seal has an orifice through which processing liquid can flow between the first and second flow systems, and the processing component can impart a property to the processing liquid for processing a surface on a microfeature workpiece having submicron microfeatures.

Claims

exact text as granted — not AI-modified
1 . A processing system for wet chemical processing workpieces, comprising: 
 a mounting module having a plurality of positioning elements;    a wet chemical processing chamber supported on the mounting module, the wet chemical processing chamber comprising a fixed unit, a detachable unit, an attachment system and a processing site, wherein 
 (a) the fixed unit has a first flow path configured to direct a processing liquid through the fixed unit, and a mounting fixture having a first interface member engaged with one or more of the positioning elements;  
 (b) the detachable unit has a second flow path configured to direct the processing liquid to and/or from the first flow system of the fixed unit and a processing component that imparts a property to the processing liquid;  
 (c) the attachment system releasably couples the detachable unit to the fixed unit, and  
 (d) the processing site is configured to receive the workpiece and is in the fixed unit or the detachable unit to contact the workpiece with a portion of the processing liquid;  
   a transport system on the mounting module for transporting the workpiece within the processing system, the transport system having a second interface member engaged with one of the positioning elements.    
   
   
       2 . The system of  claim 1  wherein the mounting module further comprises a deck having a rigid first panel, a rigid second panel superimposed under the first panel, joists between the first and second panel, and bolts through the first panel, the joists and the second panel.  
   
   
       3 . The system of  claim 1  wherein the mounting module further comprises a deck having a rigid first panel, a rigid second panel juxtaposed to the first panel, and bracing between the first and second panels.  
   
   
       4 . The system of  claim 1  wherein: 
 the processing component comprises an electrode in the detachable unit; and    the chamber further comprises a head having a workpiece holder including electrical contacts configured to hold a workpiece at the processing site and engage a conductive layer on the workpiece.    
   
   
       5 . The system of  claim 1 , further comprising a seal between a first seal surface of the fixed unit and a second seal surface of the detachable unit.  
   
   
       6 . The system of  claim 1  with the processing component comprising an electrode in the detachable unit and a filter between the electrode and the processing site.  
   
   
       7 . The system of  claim 1  wherein: 
 the processing component comprises an electrode in the detachable unit and a membrane between the electrode and the processing site, wherein the membrane is configured to conduct electrical current; and    the chamber further comprises (a) a head having a workpiece holder including electrical contacts configured to hold a workpiece at the processing site and engage a conductive layer on the workpiece, and (b) a seal between a portion of the fixed unit and the detachable unit.    
   
   
       8 . A processing systems for wet chemical processing workpieces, comprising: 
 a mounting module having a plurality of positioning elements and attachment elements;    a wet chemical processing chamber supported on the mounting module, the wet chemical processing chamber comprising a fixed unit, a detachable unit, an attachment system, a processing site, and a head positioned over the fixed unit; wherein 
 (a) the fixed unit has a first flow system configured to direct a processing liquid through the fixed unit and a mounting fixture having a first interface member engaged with one of the positioning elements and a first fastener engaged with one of the attachment elements;  
 (b) the detachable unit has a second flow system configured to direct the processing liquid to and/or from the first flow system of the fixed unit and a processing component that imparts a property to the processing liquid for processing a surface of the workpiece;  
 (c) the attachment system releasably couples the detachable unit to the fixed unit, and  
 (d) the processing site is configured to receive the workpiece and is in the fixed unit or the detachable unit to contact the workpiece with a portion of the processing liquid having the property imparted by the processing component;  
 (e) the head comprises a workpiece holder configured to hold the workpiece at the processing site; and  
   a transport system on the mounting module for transporting the workpiece within the processing system, the transport system having a second interface member engaged with one of the positioning elements and a second fastener engaged with one of the attachment elements.    
   
   
       9 . The system of  claim 8  with the head including electrical contacts for holding a workpiece at the processing site, and for engaging a conductive layer on the workpiece.  
   
   
       10 . The system of  claim 8  further comprising a seal between the fixed unit and the detachable unit.  
   
   
       11 . A processing system for wet chemical processing of microfeature workpieces, comprising: 
 a frame;    a mounting module on the frame, the mounting module having a plurality of positioning elements and attachment elements;    a wet chemical processing chamber on the mounting module, including: 
 (a) a fixed unit having a first flow system configured to direct a processing liquid through the fixed unit and a mounting fixture for fixedly attaching the fixed unit to a support surface of a tool;  
 (b) a detachable unit releasably coupled to the fixed unit, the detachable unit having a second flow system configured to direct the processing liquid to and/or from the first flow system of the fixed unit;  
 (c) a seal between the fixed unit and the detachable unit to prevent processing liquid from leaking between the fixed unit and the detachable unit, the seal having an orifice through which processing liquid can flow between the first and second flow systems;  
 (d) a processing component disposed in the fixed unit and/or the detachable unit, wherein the processing component imparts a property to the processing liquid for processing a surface on a microfeature workpiece having submicron microfeatures; and  
   a robot movable along the mounting module for carrying a workpiece within the processing system, the robot having a second interface member engaged with one of the positioning elements and a second fastener engaged with one of the attachment elements.    
   
   
       12 . The system of  claim 11 , further comprising a head positioned over the fixed unit, wherein the head comprises a workpiece holder configured to hold the workpiece at the processing site.  
   
   
       13 . The system of  claim 11  with the processing component comprising an electrode in the detachable unit; and further comprising a head having a workpiece holder including electrical contacts configured to hold a workpiece at the processing site and engage a conductive layer on the workpiece.  
   
   
       14 . The system of  claim 11  wherein: 
 the processing component comprises an electrode assembly having a plurality of independently operable electrodes separated from each other by dielectric dividers, and the electrode assembly being positioned in the detachable unit; and    the chamber further comprises a head having a workpiece holder including electrical contacts configured to hold a workpiece at the processing site and engage a conductive layer on the workpiece.    
   
   
       15 . The system of  claim 11  wherein the processing component comprises a filter in the detachable unit.  
   
   
       16 . The system of  claim 11  wherein the processing component comprises a membrane in the detachable unit, and the membrane being configured to conduct electrical current across the membrane.  
   
   
       17 . The system of  claim 11 , further comprising an attachment assembly having a clamp ring configured to move radially inwardly from a first position to a second position to clamp the detachable unit to the fixed unit.  
   
   
       18 . A processing system, comprising: 
 a deck;    a plurality of positioning elements on the deck;    a plurality of workpiece processors on the deck, with substantially each workpiece processor including: 
 a first unit positioned on the deck via one or more positioning elements;  
 a second unit attachable and separable from the first unit, with the first and second units forming a vessel for holding a processing liquid;  
 at least one attachment assembly for attaching the second unit onto the first unit;  
 a head including a workpiece holder;  
 a head lifter attached to the head for moving the head to a load/unload position, where a workpiece is moved into and/or out of the workpiece holder, and to a process position, where the workpiece holder is at least partially within the first unit; and  
   a robot moveable to load and unload workpieces into and out of the workpiece holders of the processors.    
   
   
       19 . The processing system of  claim 18  further comprising a process component in the first and/or second units, with the process component comprising a filter or a membrane.  
   
   
       20 . The processing system of  claim 18  further comprising an electrode in the first and/or second unit, and with workpiece holder including electrical contacts for engaging a conductive layer on a workpiece.

Cited by (0)

No later patents cite this yet.

References (0)

No backward citations on record.