Method for high resolution patterning using soft X-ray, process for preparing nano device using the method

Abstract

A method for nano-scale high resolution patterning of self-assembled monolayer using soft X-rays is provided. The method involves forming an aromatic imine molecular layer having substitutents at its terminal rings on a substrate, selectively cleaving bonds to the substituents of the aromatic imine molecular layer, and hydrolyzing the aromatic imine molecular layer.

1 - 9 . (canceled)  
     
     
         10 . A substrate with a nano-scale pattern of a predetermined shape, the substrate comprising: 
 a base plate; and    a surface layer on the base plate, the surface layer including a hydrophilic amine monolayer in a region and a hydrophobic aromatic imine monolayer in the other region which form the nano-scale pattern together.    
     
     
         11 . A method for manufacturing a semiconductor device, the method comprising: 
 coating a diblock copolymer onto the substrate of  claim 10;  and    thermally processing (annealing) and etching the substrate coated with the diblock copolymer.    
     
     
         12 . The method of  claim 11 , wherein the diblock copolymer is poly(stylene-block-methylmethacrylate).  
     
     
         13 . A biochip comprising: 
 the substrate of  claim 10;  and    biomolecules bound to amine groups of the hydrophilic amine molecular layer.    
     
     
         14 . The biochip of  claim 13 , wherein the biomolecules are proteins, DNA, or RNA.  
     
     
         15 . A substrate comprising: 
 a base plate; and    a surface layer in the base plate wherein the surface layer is produced according to claim  1 .    
     
     
         16 . The substrate according to  claim 10 , wherein the hydrophilic amine monolayer and the hydrophobic imine monolayer are alternatively positioned in the substrate.