Magnet arrangement for a planar magnetron background and summary of the invention

Abstract

A magnetic arrangement for a planar magnetron, in which an initial magnetic pole encompasses a second magnetic pole. This magnetic arrangement is moved linear in longitudinal direction to a target by a specific value and then moved back in opposite direction by the same value. In one version, an additional perpendicular motion is effected. The magnet arrangement is designed so that north and south pole interlock and waviform racetracks are generated. This enables constant sputtering from the entire target surface.

1 - 25 . (canceled)  
   
   
       26 . A magnet arrangement for a planar magnetron, in which an initial magnetic pole encompasses a second magnetic pole and the second magnetic pole has a first group of arms which are oriented in an initial direction, as well as a second group of arms which are oriented in a direction opposite to the initial direction, wherein the longitudinal axis of the first group of arms is offset against the longitudinal axis of the second group of arms so that the longitudinal axis of an arm of the first group is located between the longitudinal axes of two arms of the second group.  
   
   
       27 . The magnet arrangement of  claim 26 , wherein the arms of the first group are arranged equidistantly.  
   
   
       28 . The magnet arrangement of  claim 26 , wherein the arms of the second group are arranged equidistantly.  
   
   
       29 . The magnet arrangement of  claim 26 , wherein the first group of arms and the second group of arms are connected via diagonal bars.  
   
   
       30 . The magnet arrangement of  claim 29 , wherein the diagonal bars are connected via blocks with the arms.  
   
   
       31 . The magnet arrangement of  claim 26 , wherein the initial pole features a first group of diagonal arms of which two each form a gable roof-like element, in which one the end of an arm is in contact with a first block and the other end of the arm with a second block.  
   
   
       32 . The magnet arrangement of  claim 31 , wherein the longitudinal axis of the first block is perpendicular to the longitudinal axis of the second block.  
   
   
       33 . The magnet arrangement of  claim 31 , wherein a gable roof-like element of the first pole encompasses an arm of the second pole.  
   
   
       34 . The magnet arrangement of  claim 31 , wherein the two diagonal arms of a gable roof-like element are mirror symmetrical to each other.  
   
   
       35 . The magnet arrangement of  claim 31 , wherein the two diagonal arms of a gable roof-like element have different angles of inclination to a longitudinal axis through a block.  
   
   
       36 . The magnet arrangement of  claim 26 , wherein the arms of the second magnetic pole have different angles of inclination to a longitudinal axis through a block of the first magnetic pole.  
   
   
       37 . The magnet arrangement of  claim 26 , wherein the magnetic arrangement can be moved forwards and backwards.  
   
   
       38 . The magnet arrangement of  claim 26 , wherein the magnetic arrangement can be moved in x direction and relative to a target.  
   
   
       39 . The magnet arrangement of  claim 38 , wherein the magnetic arrangement can be moved forwards and backwards.  
   
   
       40 . The magnet arrangement of  claim 26 , wherein the magnetic arrangement is part of the magnetron of a sputter system.  
   
   
       41 . The magnet arrangement of clam  26 , wherein the magnetic arrangement can be moved relative to a target.  
   
   
       42 . The magnet arrangement of  claim 40 , wherein the magnetic arrangement is located near a target.  
   
   
       43 . The magnet arrangement of  claim 42 , wherein the target lies opposite a substrate.  
   
   
       44 . The magnet arrangement of  claim 41 , wherein the magnetic arrangement can be moved in x or y direction, relative to the target.