Apparatus for removing a coating from a substrate

Abstract

A process of stripping a coating according to the invention comprises subjecting a coated substrate to an aqueous medium containing a peroxide and an interfacial mixing agent, and to heating preferably by either ultraviolet (UV) and/or infrared (IR) radiation. The substrate is completely stripped of the coating and suffers no damage to itself as a result of the paint debonding/dislodging process. No toxic wastes are generated from this process, nor are particulates associated with air pollution generated. The metal substrates being stripped also do not undergo corrosion or other damage as a result of the described process.

1 . An apparatus for carrying out a process for removing a coating from a substrate, comprising: 
 a chamber having an access opening through which a coated substrate is placed;    a reservoir containing a supply of a stripping solution;    a heating element positioned inside the chamber to heat the coated substrate;    a spraying nozzle positioned inside the chamber to spray the coated substrate with a stripping solution;    a pump;    an actuator for operating the pump to spray stripping solution from the reservoir through the nozzle onto the coated substrate; and    a ventilation system for the chamber including a fan and a ventilation opening in the chamber.    
   
   
       2 . The apparatus of  claim 1 , wherein the heating element comprises an IR lamp.  
   
   
       3 . The apparatus of  claim 1 , further comprising a temperature sensor positioned to measure substrate temperature.  
   
   
       4 . The apparatus of  claim 3 , wherein the sensor is connected to the actuator such that the actuator operates the pump to spray stripping solution to maintain a substrate temperature.  
   
   
       5 . The apparatus of  claim 4 , wherein the temperature sensor comprises a thermocouple.  
   
   
       6 . The apparatus of  claim 1 , further comprising a tray positioned in the chamber to collect excess stripping solution that runs off of the substrate.