US2008112856A1PendingUtilityA1
Method of preparing nanocrystals
Assignee: MASSACHUSETTS INST TECHNOLOGYPriority: Aug 26, 2003Filed: May 31, 2007Published: May 15, 2008
Est. expiryAug 26, 2023(expired)· nominal 20-yr term from priority
Y10S977/72C30B 29/605C30B 7/14C30B 29/48
35
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Claims
Abstract
A population of nanocrystals having a narrow and controllable size distribution and can be prepared by a continuous flow method.
Claims
exact text as granted — not AI-modified1 . A continuous flow reactor for producing a population of nanocrystal, comprising:
a mixer; a reaction conduit fluidly connected to the mixer and having a reaction zone, the reaction zone being heated to a constant temperature; an M source reservoir fluidly connected to the mixer; and an X source reservoir fluidly connected to the mixer.
2 . The reactor of claim 1 , wherein the mixer is a convective mixing chamber.
3 . The reactor of claim 1 , wherein the reaction conduit is a heated glass reaction channel.
4 . The reactor of claim 1 , wherein the reaction zone includes a temperature controller that maintains the reaction zone at the constant temperature, the constant temperature being between 180 and 320° C.
5 . The reactor of claim 1 , further comprising a growth stopping zone fluidly connected to the reaction zone.
6 . The reactor of claim 1 , wherein the reaction conduit is configured for segmented flow.
7 . The reactor of claim 1 , wherein the mixer includes a mixing region.
8 . A continuous flow reactor for producing a population of nanocrystal, comprising:
a mixer including a convective mixing chamber; a reaction conduit fluidly connected to the mixer and having a reaction zone, the reaction zone being heated to a constant temperature; an M source reservoir fluidly connected to the mixer; and an X source reservoir fluidly connected to the mixer.
9 . The reactor of claim 8 , wherein the reaction conduit is a heated glass reaction channel.
10 . The reactor of claim 8 , wherein the reaction zone includes a temperature controller that maintains the reaction zone at the constant temperature, the constant temperature being between 180 and 320° C.
11 . The reactor of claim 8 , further comprising a growth stopping zone fluidly connected to the reaction zone.
12 . The reactor of claim 8 , wherein the reaction conduit is configured for segmented flow.
13 . The reactor of claim 8 , wherein the mixer includes a mixing region.
14 . A continuous flow reactor for producing a population of nanocrystal, comprising:
a mixer; a reaction conduit fluidly connected to the mixer and having a reaction zone, the reaction zone including a temperature controller that maintains the reaction zone at a constant temperature; an M source reservoir fluidly connected to the mixer; and an X source reservoir fluidly connected to the mixer.
15 . The reactor of claim 14 , wherein the mixer includes a convective mixing chamber.
16 . The reactor of claim 14 , wherein the reaction conduit is a heated glass reaction channel.
17 . The reactor of claim 14 , further comprising a growth stopping zone fluidly connected to the reaction zone.
18 . The reactor of claim 14 , wherein the reaction conduit is configured for segmented flow.
19 . The reactor of claim 14 , wherein the mixer includes a mixing region.Join the waitlist — get patent alerts
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