US2008114484A1PendingUtilityA1

Device and method for changing embroidery patterns

31
Assignee: BERNINA INT AGPriority: Nov 10, 2006Filed: Sep 25, 2007Published: May 15, 2008
Est. expiryNov 10, 2026(~0.3 yrs left)· nominal 20-yr term from priority
D05B 19/10
31
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Claims

Abstract

A method and the device for scaling or changing embroidery patterns ( 1 ) for sewing machines that allows a quick calculation of optimized stitching data. For one or more different change factors q j , data sets d j with optimized stitching data (x ji ,y ji ) are stored. A target data set z with stitching data changed according to a given change value v is determined by selecting one of the stored data sets d j and performing an extrapolation or an interpolation with the associated stitching data (x ji ,y ji ). For a pattern with several sub-patterns, these sub-patterns can be changed individually and combined to form a changed pattern.

Claims

exact text as granted — not AI-modified
1 . Method for changing an embroidery pattern ( 1 ) in sewing machines, comprising:
 storing a first data set do, which represents stitching data of the embroidery pattern ( 1 ) in an original configuration, in a memory, and allocating a first change factor q 0  to the first data set d 0 ,   storing at least one other change factor q 1 , as well as an associated additional data set d 1 , in the memory, wherein the additional data set d 1  comprises optimized stitching data of the embroidery pattern ( 1 ) changed according to another change factor q 1 ,   providing a change value v for changing the embroidery pattern ( 1 ), and   changing a target data set z with optimized stitching data of the embroidery pattern ( 1 ) corresponding to the change value v.   
   
   
       2 . Method according to  claim 1 , wherein several change factors q j  and associated data sets d j  with the corresponding optimized stitching data are stored in the memory. 
   
   
       3 . Method according to  claim 2 , wherein a difference of adjacent change factors q j , q j-1  is less than 25%. 
   
   
       4 . Method according to  claim 2 , further comprising determining the change factor q j  that is a closest or next larger or next smaller value in terms of magnitude in comparison with the change value v, and calculating the stitching data of the target data set z based on the associated data set d j . 
   
   
       5 . Method according to  claim 2 , further comprising determining the change factors q j  and q j-1  adjacent to the change value v, and calculating the stitching data of the target data set z corresponding to the change value v through interpolation of corresponding stitching data from the data sets d j , d j-1 . 
   
   
       6 . Method according to  claim 1 , wherein the embroidery pattern ( 1 ) is a sub-pattern of a higher-order pattern with several sub-patterns, and the method further comprises changing the sub-patterns of the pattern individually with the same or different change factors q i  and combining them to form a changed pattern. 
   
   
       7 . Device for changing an embroidery pattern ( 1 ) for sewing machines, comprising a memory in which a first data set d 0 , which comprises the stitching data (x i ,y i ) of the embroidery pattern ( 1 ) in an original construction allocated to a change factor q 0 , is stored and can be accessed by a sewing machine controller, at least one other data set d j  with optimized stitching data (x ji ,y ji ) changed according to a change factor q j  and the associated change factor q j  are stored or are storable in the memory. 
   
   
       8 . Device according to  claim 7 , wherein the sewing machine controller comprises a program memory with processing software and a user interface for setting a change value v, and criteria for comparing the change value v with the change factor or factors q j  are set in the processing software. 
   
   
       9 . Device according to  claim 8 , wherein the processing software is constructed for calculating target data sets z through extrapolation or interpolation of stitching data (x ji ,y ji ) of additional data sets d j . 
   
   
       10 . Device according to  claim 9 , wherein the embroidery pattern ( 1 ) is a sub-pattern of a higher-order pattern with several sub-patterns, and individual change factors q j  and changed stitching data (x ji ,y ji ) are stored in the memory for each of the sub-patterns.

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