US2008114484A1PendingUtilityA1
Device and method for changing embroidery patterns
Est. expiryNov 10, 2026(~0.3 yrs left)· nominal 20-yr term from priority
D05B 19/10
31
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Abstract
A method and the device for scaling or changing embroidery patterns ( 1 ) for sewing machines that allows a quick calculation of optimized stitching data. For one or more different change factors q j , data sets d j with optimized stitching data (x ji ,y ji ) are stored. A target data set z with stitching data changed according to a given change value v is determined by selecting one of the stored data sets d j and performing an extrapolation or an interpolation with the associated stitching data (x ji ,y ji ). For a pattern with several sub-patterns, these sub-patterns can be changed individually and combined to form a changed pattern.
Claims
exact text as granted — not AI-modified1 . Method for changing an embroidery pattern ( 1 ) in sewing machines, comprising:
storing a first data set do, which represents stitching data of the embroidery pattern ( 1 ) in an original configuration, in a memory, and allocating a first change factor q 0 to the first data set d 0 , storing at least one other change factor q 1 , as well as an associated additional data set d 1 , in the memory, wherein the additional data set d 1 comprises optimized stitching data of the embroidery pattern ( 1 ) changed according to another change factor q 1 , providing a change value v for changing the embroidery pattern ( 1 ), and changing a target data set z with optimized stitching data of the embroidery pattern ( 1 ) corresponding to the change value v.
2 . Method according to claim 1 , wherein several change factors q j and associated data sets d j with the corresponding optimized stitching data are stored in the memory.
3 . Method according to claim 2 , wherein a difference of adjacent change factors q j , q j-1 is less than 25%.
4 . Method according to claim 2 , further comprising determining the change factor q j that is a closest or next larger or next smaller value in terms of magnitude in comparison with the change value v, and calculating the stitching data of the target data set z based on the associated data set d j .
5 . Method according to claim 2 , further comprising determining the change factors q j and q j-1 adjacent to the change value v, and calculating the stitching data of the target data set z corresponding to the change value v through interpolation of corresponding stitching data from the data sets d j , d j-1 .
6 . Method according to claim 1 , wherein the embroidery pattern ( 1 ) is a sub-pattern of a higher-order pattern with several sub-patterns, and the method further comprises changing the sub-patterns of the pattern individually with the same or different change factors q i and combining them to form a changed pattern.
7 . Device for changing an embroidery pattern ( 1 ) for sewing machines, comprising a memory in which a first data set d 0 , which comprises the stitching data (x i ,y i ) of the embroidery pattern ( 1 ) in an original construction allocated to a change factor q 0 , is stored and can be accessed by a sewing machine controller, at least one other data set d j with optimized stitching data (x ji ,y ji ) changed according to a change factor q j and the associated change factor q j are stored or are storable in the memory.
8 . Device according to claim 7 , wherein the sewing machine controller comprises a program memory with processing software and a user interface for setting a change value v, and criteria for comparing the change value v with the change factor or factors q j are set in the processing software.
9 . Device according to claim 8 , wherein the processing software is constructed for calculating target data sets z through extrapolation or interpolation of stitching data (x ji ,y ji ) of additional data sets d j .
10 . Device according to claim 9 , wherein the embroidery pattern ( 1 ) is a sub-pattern of a higher-order pattern with several sub-patterns, and individual change factors q j and changed stitching data (x ji ,y ji ) are stored in the memory for each of the sub-patterns.Cited by (0)
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