US2008124660A1PendingUtilityA1
HIGHLY PURIFIED LIQUID PERFLUORO-n-ALKANES AND METHOD FOR PREPARING
Est. expiryMar 8, 2024(expired)· nominal 20-yr term from priority
G03F 7/70216
47
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Abstract
Provided are liquid perfluoro-n-alkanes that are highly transparent to UV wavelengths ranging from about 150 nm to 165 nm, and to the method by which high transparency may be obtained. The liquid, perfluoro-n-alkanes are useful in optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and immersion photolithography at 157 nm exposure wavelength.
Claims
exact text as granted — not AI-modified1 . A composition consisting essentially of a perfluoro-n-alkane liquid characterized by a water concentration of less than 10 ppm, an oxygen concentration of less than 10 ppm, and an absorbance at 157 nanometers in the range of 0.1 to 10 cm-1, said perfluoro-n-alkane selected from perfluoro-n-pentane, perfluoro-n-hexane, and mixtures thereof.
2 . The composition of claim 1 wherein said perfluoro-n-alkane liquid is characterized by an oxygen concentration of less than 5 ppm, a water concentration of less than 5 ppm, and an absorbance at 157 nm in the range of 0.1 to 2 cm-1.
3 . The composition of claim 2 wherein said perfluoro-n-alkane liquid is characterized by an oxygen concentration of less than 1 ppm, a water concentration of less than 5 ppm, and an absorbance at 157 nm of 0.1 to 1 cm-1.
4 . A process for preparing a perfluoro-n-alkane liquid characterized by a water concentration of less than 10 ppm, an oxygen concentration of less than 10 ppm, and an absorbance at 157 nanometers in the range of 0.1-10 cm-1, the process comprising subjecting a perfluoro-n-alkane liquid to at least one extraction step, wherein said perfluoroalkane liquid is selected from perfluoro-n-pentane, perfluoro-n-hexane, and mixtures thereof.
5 . The process of claim 4 wherein said process is carried out in an oxygen-minimized atmosphere.
6 . The process of claim 4 or 5 further comprising fractional distillation in a grease-free distillation system of a perfluoro-n-alkane liquid of at least 99% purity, contacting a heart cut condensate obtained therefrom with an absorbent, said absorbent being selected from silica gel, zeolite molecular sieves, and mixtures thereof.
7 . The process of claim 6 further comprising purifying and activating said absorbent prior to contacting said condensate therewith by heating said absorbent in an oxidizing atmosphere to a temperature sufficient to remove substantially all water from said absorbent, then cooling and sealing the absorbent in an oxygen-minimized atmosphere.
8 . The process of claim 6 wherein said absorbent is a mixture of absorbents.
9 . The process of claim 6 wherein said absorbent comprises one or more zeolite molecular sieves.
10 . The process of claim 9 wherein said zeolite molecular sieves are selected from 3A, 4A, and 5A zeolite molecular sieves.
11 . A process comprising exposing a photoresist surface to ultraviolet light at 157 nm emitted by a light source, wherein
said photoresist surface is immersed in a perfluoro-n-alkane liquid having a water concentration of less than 10 ppm, an oxygen concentration of less than 10 ppm, and an absorbance at 157 nanometers in the range of 0.1 to 10 cm-1, said perfluoro-n-alkane liquid being selected from perfluoro-n-pentane, perfluoro-n-hexane, and mixtures thereof, and wherein said perfluoro-n-alkane liquid is disposed between said light source and said photoresist surface; and developing said photoresist to produce an image.
12 . The process of claim 11 wherein said perfluoro-n-alkane liquid has an oxygen concentration of less than 5 ppm, a water concentration of less than 5 ppm, and an absorbance at 157 nm in the range of 0.1 to 2 cm-1.
13 . The process of claim 12 wherein said perfluoro-n-alkane liquid has an oxygen concentration of less than 1 ppm, a water concentration of less than 5 ppm, and an absorbance at 157 nm of 0.1 to 1 cm-1.Cited by (0)
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