Inspection of optical elements

Abstract

In one embodiment, a method is provided that determines an image captured from a capture device. For example, a digital camera may be used to take an image of a pattern that is reflected off a solar optical element. The captured image is then compared to a master image. The master image may be an image taken of the pattern reflected off of a second optical element that is of a known distortion. A deviation between the captured image and the master image is then determined based on the comparison. For example, image processing software may use detection techniques to determine if any deviation between the captured image and the master image is present. The deviation may be stored or displayed and a determination as to whether the solar mirror passes or fails the test may also be determined.

1 . A method for testing an optical element, the method comprising:
 determining an image of a pattern captured from a capture device, the pattern positioned such that the pattern is reflected off an optical element for a solar power generation system towards the capture device;   comparing the captured image to a master image; and   determining a characteristic of the optical element based on the comparison of the captured image to the master image, the characteristic useable to test the optical element for inclusion in the solar power generation system.   
   
   
       2 . The method of  claim 1 , further comprising determining a deviation between the captured image and the master image, wherein the characteristic is determined based on the deviation. 
   
   
       3 . The method of  claim 1 , wherein the characteristic is used to determine a pass or fail rating for the optical element for inclusion in the solar power generation system. 
   
   
       4 . The method of  claim 1 , wherein the characteristic is surface aberration of the optical element. 
   
   
       5 . The method of  claim 1 , wherein the characteristic is alignment of the optical element with respect to the capture device. 
   
   
       6 . The method of  claim 1 , further comprising storing or displaying a result of the characteristic determination. 
   
   
       7 . The method of  claim 1 , wherein the pattern is positioned at a position off of a curved surface of the optical element. 
   
   
       8 . The method of  claim 1 , wherein the capture device is positioned to capture the image at a focus area for the pattern being reflected of the optical element. 
   
   
       9 . The method of  claim 1 , wherein the capture device is positioned to capture the image at a focus area for the pattern that is first reflected off of the optical element to a secondary optical element, which reflects the pattern to the capture device. 
   
   
       10 . The method of  claim 1 , further comprising using edge detection techniques to a representation of the pattern from the captured image. 
   
   
       11 . The method of  claim 1 , wherein the capture device comprises a digital camera. 
   
   
       12 . An apparatus for testing an optical component, the apparatus comprising:
 a pattern having an aperture;   an optical element positioned with a reflective side facing the pattern;   a light source configured to provide illumination such that the pattern is reflected from the reflective side of the optical element; and   a capture device configured to capture the reflected pattern; and   an image processor configured to process the captured reflective pattern to determine a characteristic of the optical element, the characteristic useable to test the optical element for inclusion in the solar power generation system.   
   
   
       13 . The apparatus of  claim 12 , wherein the image processor is configured to determine a deviation between the captured image and the master image, wherein the characteristic is determined based on the deviation. 
   
   
       14 . The apparatus of  claim 12 , wherein the characteristic is used to determine a pass or fail rating for the optical element for inclusion in the solar power generation system. 
   
   
       15 . The apparatus of  claim 12 , wherein the characteristic is surface aberration of the optical element. 
   
   
       16 . The apparatus of  claim 12 , wherein the characteristic is alignment of the optical element with respect to the capture device. 
   
   
       17 . The apparatus of  claim 12 , wherein the image processor is configured to store or display a result of the characteristic determination. 
   
   
       18 . The apparatus of  claim 12 , wherein the pattern is positioned at a position off of a curved surface of the optical element. 
   
   
       19 . The apparatus of  claim 12 , wherein the capture device is positioned to capture the image at a focus area for the pattern being reflected of the optical element. 
   
   
       20 . The apparatus of  claim 12 , further comprising a second optical element configured to reflect the pattern reflected off to the optical element to the capture device. 
   
   
       21 . The apparatus of  claim 12 , wherein the image processor is configured to use edge detection techniques to a representation of the pattern from the captured image. 
   
   
       22 . The apparatus of  claim 12 , wherein the capture device comprises a digital camera. 
   
   
       23 . An apparatus configured to test an optical element, the apparatus comprising:
 logic configured to determine an image of a pattern captured from a capture device, the pattern positioned such that the pattern is reflected off an optical element for a solar power generation system towards the capture device;   logic configured to compare the captured image to a master image and logic configured to determine a characteristic of the optical element based on the comparison of the captured image to the master image, the characteristic useable to test the optical element for inclusion in the solar power generation system.   
   
   
       24 . The apparatus of  claim 23 , wherein the image processor is configured to determine a deviation between the captured image and the master image, wherein the characteristic is determined based on the deviation. 
   
   
       25 . The apparatus of  claim 23 , wherein the characteristic is used to determine a pass or fail rating for the optical element for inclusion in the solar power generation system. 
   
   
       26 . The apparatus of  claim 23 , wherein the pattern is positioned at a position off of a curved surface of the optical element.