Laser sensitive lithographic printing plate having specific photopolymer composition
Abstract
High speed violet or ultraviolet laser sensitive lithographic printing plate comprising on a hydrophilic substrate a specific photosensitive composition is described. The photosensitive layer comprises a polymeric binder, a multifunctional (meth)acrylate monomer, a free-radical initiator, and a sensitizing dye, with specific weight ratio of the monomer to the polymer. Combination of multifunctional urethane (meth)acrylate monomer and multifunctional non-urethane (meth)acrylate monomer can be advantageously used. The plate is imagewise exposed with a violet or ultraviolet laser at a dosage of less than 300 μJ/cm 2 , and then developed with an aqueous developer or with ink and/or fountain solution.
Claims
exact text as granted — not AI-modified1 . A method of processing a lithographic printing plate comprising in order:
(a) providing a lithographic printing plate comprising (i) a hydrophilic substrate, (ii) an oleophilic photosensitive layer comprising an alkaline soluble polymeric binder, a (meth)acrylate monomer having at least 3 (meth)acrylate groups, a free radical initiator, and a sensitizing dye, and (iii) a water soluble or dispersible overcoat; wherein the weight ratio of all the monomers having at least 3 (meth)acrylate groups to all the alkaline soluble polymeric binders is at least 1.8; (b) exposing said plate with a laser having a wavelength of from 250 to 430 nm at a dosage of less than 300 μJ/cm 2 according to digital imaging information to cause hardening of the photosensitive layer in the exposed areas; and (c) contacting said exposed plate with an aqueous alkaline developer having a pH of from 9.0 to 13.5 to remove the non-exposed areas of the photosensitive layer.
2 . The method of claim 1 wherein said weight ratio is from 2.0 to 6.0.
3 . The method of claim 1 wherein said weight ratio is from 2.4 to 5.0.
4 . The method of claim 1 wherein said weight ratio is from 2.6 to 4.0.
5 . The method of claim 1 wherein said monomer has at least 4 (meth)acrylate groups.
6 . The method of claim 1 wherein said monomer has at least 5 (meth)acrylate groups.
7 . The method of claim 1 wherein said monomer has at least 6 (meth)acrylate groups.
8 . The method of claim 1 wherein said monomer has at least 4 (meth)acrylate groups, and the weight ratio of all the monomers having at least 4 (meth)acrylate groups to all the polymeric binders is at least 1.8.
9 . The method of claim 1 wherein said monomer has at least 5 (meth)acrylate groups, and the weight ratio of all the monomers having at least 5 (meth)acrylate groups to all the polymeric binders is at least 1.8.
10 . The method of claim 1 wherein said monomer has at least 6 (meth)acrylate groups, and the weight ratio of all the monomers having at least 6 (meth)acrylate groups to all the polymeric binders is at least 1.8.
11 . The method of claim 1 wherein said monomer is an acrylate monomer.
12 . The method of claim 1 wherein said free radical initiator is a hexaarylbiimidazole or titanocene compound.
13 . The method of claim 1 wherein said free radical initiator is a hexaarylbiimidazole compound.
14 . The method of claim 1 wherein said sensitizing dye is a dialkylaminobenzophenone compound.
15 . The method of claim 14 wherein said dialkylaminobenzophenone compound is a 4,4′-bis(dialkylamino)benzophenone compound.
16 . The method of claim 1 wherein said photosensitive layer further comprises a hydrogen donor compound.
17 . The method of claim 1 wherein said free radical initiator is a hexaarylbiimidazole compound, said sensitizing dye is a 4,4′-bis(dialkylamino)benzophenone compound, and said photosensitive layer further includes a hydrogen donor compound.
18 . The method of claim 1 wherein said photosensitive layer is semisolid at 25° C.
19 . The method of claim 1 wherein said substrate is a grained and anodized aluminum sheet (with or without further hydrophilic treatment) having a reflection optical density of from 0.30 to 0.50.
20 . The method of claim 1 wherein said plate is heated to an elevated temperature of 50 to 200° C. for 1 to 600 seconds after said laser exposure (step b) and before said development (step c).Join the waitlist — get patent alerts
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