US2008155826A1PendingUtilityA1
Method of manufacturing mems ics
Est. expiryDec 2, 2022(expired)· nominal 20-yr term from priority
B41J 2/04563H04N 1/405G06F 21/71B41J 2/04586G06F 21/74Y10S707/99939Y10T29/49401B41J 2/04505B41J 2/04543G06F 21/78G06F 21/554B41J 2/04573B41J 2/04541G06F 21/73B41J 2/0451G06F 21/57H03K 5/1252B41J 2/04528G06F 21/575B41J 2/04508B41J 2202/20G06F 21/64Y10S707/99933
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Claims
Abstract
Methods of manufacturing an integrated circuit incorporating MEMS are provided. The methods include laying out the integrated circuit using a plurality of overlapping reticles.
Claims
exact text as granted — not AI-modified1 . A method of manufacturing an integrated circuit incorporating MEMS, comprising laying out the integrated circuit using a plurality of overlapping reticles.
2 . A method according to claim 1 , wherein the overlapping reticles are the same as each other.
3 . A method according to claim 1 , wherein the reticles are different to each other.
4 . A method according to claim 3 , wherein the reticles are different lengths.
5 . A method of manufacturing an integrated circuit printhead according to claim 1 .
6 . A method of manufacturing a plurality of integrated circuits on a single substrate wafer, wherein each of the integrated circuits is manufactured in accordance with claim 1 .
7 . A method according to claim 6 , wherein at least some of the integrated circuits are different to each other.
8 . A method according to claim 7 , wherein the integrated circuits are of different lengths.
9 . A method laying out an integrated circuit incorporating MEMS, the method including the steps of:
defining a layout of an integrated circuit; defining a joint path; and modifying at least one element within an overlap area adjacent the joint path to take into account reticle field overlap during a subsequent manufacturing step.Join the waitlist — get patent alerts
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