Liquid crystal display element and method for manufacturing the same

Abstract

Contact holes and dummy holes are formed in the gate insulating film and the interlayer insulating film located in the non-display region of an array board by dry etching. Since the opening area ratio of the array board is increased, the variation amount of luminescence of etching gas during dry etching is large, and thus a just etching timing can be easily detected by detecting this variation amount.

1 . A liquid crystal display element including a display region having a plurality of pixels and a non-display region located outside of the display region comprising:
 an array board having an insulating film;   a counter board disposed so as to face the array board;   a liquid crystal layer interposed between the array board and the counter board;   an opening pattern formed in the insulating film located at least in the display region by dry etching; and   a dummy opening pattern that is formed in the insulating film located in the non-display region by dry etching separately from the opening pattern.   
   
   
       2 . The liquid crystal display element according to  claim 1 , wherein the dummy opening pattern has a larger opening area ratio than that of the opening pattern of the insulating film. 
   
   
       3 . The liquid crystal display element according to  claim 2 , wherein the opening area ratio of the opening pattern and the dummy opening pattern of the insulating film is set at a range from 1.2% to 1.5%. 
   
   
       4 . The liquid crystal display element according to any one of  claims 1  to  3 , wherein the dummy opening pattern is formed to be elongated along the side portion of the array board and have minute hole portions arranged in a grid shape. 
   
   
       5 . A method for manufacturing a liquid crystal display element which has an array board having an insulating film, a counter board disposed so as to face the array board, and a liquid crystal layer interposed between the array board and the counter board, and is equipped with a display region having a plurality of pixels and a non-display region located outside of the display region, wherein an opening pattern and a dummy opening pattern different from the opening pattern are formed in the insulating film by dry etching. 
   
   
       6 . The method for manufacturing the liquid crystal display element according to  claim 5 , wherein the dummy opening pattern is formed at an opening area ratio larger than that of the opening pattern of the insulating film. 
   
   
       7 . The method for manufacturing the liquid crystal display element according to  claim 6 , wherein the opening area ratio of the opening pattern and the dummy opening pattern of the insulating film is set at a range from 1.2% to 1.5%. 
   
   
       8 . The method for manufacturing the liquid crystal display element according to any one of  claims 5  to  7 , wherein the dummy opening pattern is formed to be elongated along the side portion of the array board and minute hole portions are arranged in the form of a grid. 
   
   
       9 . The method for manufacturing the liquid crystal display element according to any one of  claims 5  to  8 , wherein the dummy opening patterns are formed outside a parting line when the array board is divided from a large-sized board.