Manufacturing method of thin film transistor array panel using an optical mask

Abstract

A photo mask is provided. The mask includes: a transmitting area and a translucent area, wherein the translucent area includes a plurality of light blocking portions blocking light, and wherein the light blocking portions have a plurality of areas blocking different amounts of light. By using this type of photo mask, a substantially flat layer of photoresist film can be deposited even on top of an uneven surface. The flat photoresist film reduces processing cost and enhances the reliability of the panel manufacturing process.

1 . A photo mask comprising:
 a transmitting area; and   a translucent area,   wherein the translucent area includes a plurality of light blocking portions blocking light, and   wherein the light blocking portions have a plurality of areas blocking different amounts of light.   
     
     
         2 . The photo mask of  claim 1 , wherein the light blocking portions are arranged in parallel and have a slit shape. 
     
     
         3 . The photo mask of  claim 1 , wherein the respective areas of the light blocking portions have different thicknesses. 
     
     
         4 . The photo mask of  claim 2 , wherein the photo mask varies an amount of light blocked by adjusting an interval between adjacent light blocking portions. 
     
     
         5 . The photo mask of  claim 1 , wherein the photo mask further comprises a complete light blocking area. 
     
     
         6 .- 14 . (canceled) 
     
     
         15 . A photo mask comprising:
 a transmitting area; and   a translucent area,   wherein the translucent area has a plurality of light blocking portions which have a predetermined size and are arranged in a matrix.   
     
     
         16 . The photo mask of  claim 15 , wherein the light blocking portions have different sizes from each other. 
     
     
         17 . The photo mask of  claim 15 , wherein the light blocking portions have the same size and have a different formation density in accordance with formation position. 
     
     
         18 . The photo mask of  claim 15 , wherein the respective light blocking portions have a polygon shape. 
     
     
         19 . The photo mask of  claim 18 , wherein the respective light blocking portions have a rectangular shape. 
     
     
         20 . The photo mask of  claim 18 , wherein the respective light blocking portions have a triangular shape. 
     
     
         21 . The photo mask of  claim 18 , wherein the respective light blocking portions have a lozenge shape. 
     
     
         22 . The photo mask of  claim 16 , wherein the respective light blocking portions have a circular shape. 
     
     
         23 . The photo mask of  claim 16 , wherein the respective light blocking portions have an elliptical shape. 
     
     
         24 . The photo mask of  claim 15 , further comprising a light blocking area. 
     
     
         25 .- 33 . (canceled)