Target for Transparent Conductive Thin Film, Transparent Conductive Thin Film and Manufacturing Method Thereof, Electrode Material for Display, and Organic Electroluminescence Element

Abstract

The target for the transparent conductive thin film having indium oxide as its major component and containing tungsten and/or molybdenum, obtained by forming a body of indium oxide powder, and tungsten oxide power and/or molybdenum oxide powder and then heating or sintering the formed body such that the thin film after sputtering has indium oxide as the main component and contains tungsten and/or molybdenum with an atomic ratio (W+Mo)/In of 0.0040 to 0.0470, whereby a transparent conductive thin film having excellent surface smoothness and low specific resistance of 6.0×10 −4 Ω·cm or less, and whose surface smoothness and specific resistance properties do not change even when heated at 170° C. is provided.

1 . A target for a transparent conductive thin film having indium oxide as its major component and containing tungsten and/or molybdenum, obtained by preparing and forming indium oxide powder, and tungsten oxide power and/or molybdenum oxide powder and then heating and sintering the formed body such that the thin film after sputtering has indium oxide as the main component and contains tungsten and/or molybdenum with an atomic ratio (W+Mo)/In of 0.0040 to 0.0470. 
     
     
         2 . A manufacturing method of a transparent conductive thin film using the target described in  claim 1 , comprising the step of manufacturing the transparent conductive thin film on a substrate by a sputtering method, wherein the substrate is kept at 120° C. or lower.