US2008213420A1PendingUtilityA1
Stamper and method of manufacturing the same
Est. expiryFeb 6, 2027(~0.5 yrs left)· nominal 20-yr term from priority
C25D 1/10C22C 19/03C25D 1/20
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Claims
Abstract
A stamper includes a stamper body including a nickel having a patterned surface by artificial drawing method, and a surface layer of a nickel-vanadium alloy having a vanadium content of less than 3 atomic percent formed on the patterned surface.
Claims
exact text as granted — not AI-modified1 . A stamper comprising:
a stamper body including a nickel having a patterned surface by artificial drawing method; and a surface layer of a nickel-vanadium alloy having a vanadium content of less than 3 atomic percent formed on the patterned surface.
2 . The stamper according to claim 1 , wherein the nickel-vanadium alloy of the surface layer has a vanadium content ranging from 1 to 2 atomic percent.
3 . The stamper according to claim 1 , wherein the surface layer has a thickness ranging from 5 to 200 nm.
4 . A method of manufacturing a stamper, comprising:
preparing a master having a patterned surface by artificial drawing method; depositing a nickel-vanadium alloy having a vanadium content of less than 3 atomic percent on the patterned surface to form a surface layer; electroforming nickel on the nickel-vanadium alloy to form a nickel stamper body; and separating the surface layer and the nickel stamper body from the master.
5 . The method according to claim 4 , wherein the nickel-vanadium alloy has a vanadium content ranging from 1 to 2 atomic percent.
6 . A sputtering target comprising a nickel-vanadium alloy having a vanadium content of less than 3 atomic percent.
7 . The sputtering target according to claim 6 , wherein the nickel-vanadium alloy has a vanadium content ranging from 1 to 2 atomic percent.
8 . A conductive film material for stamper electroforming comprising a nickel-vanadium alloy having a vanadium content of less than 3 atomic percent.
9 . The conductive film material according to claim 8 , wherein the nickel-vanadium alloy has a vanadium content ranging from 1 to 2 atomic percent.Join the waitlist — get patent alerts
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