US2008213420A1PendingUtilityA1

Stamper and method of manufacturing the same

Assignee: TOSHIBA KKPriority: Feb 6, 2007Filed: Feb 1, 2008Published: Sep 4, 2008
Est. expiryFeb 6, 2027(~0.5 yrs left)· nominal 20-yr term from priority
C25D 1/10C22C 19/03C25D 1/20
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Claims

Abstract

A stamper includes a stamper body including a nickel having a patterned surface by artificial drawing method, and a surface layer of a nickel-vanadium alloy having a vanadium content of less than 3 atomic percent formed on the patterned surface.

Claims

exact text as granted — not AI-modified
1 . A stamper comprising:
 a stamper body including a nickel having a patterned surface by artificial drawing method; and   a surface layer of a nickel-vanadium alloy having a vanadium content of less than 3 atomic percent formed on the patterned surface.   
     
     
         2 . The stamper according to  claim 1 , wherein the nickel-vanadium alloy of the surface layer has a vanadium content ranging from 1 to 2 atomic percent. 
     
     
         3 . The stamper according to  claim 1 , wherein the surface layer has a thickness ranging from 5 to 200 nm. 
     
     
         4 . A method of manufacturing a stamper, comprising:
 preparing a master having a patterned surface by artificial drawing method;   depositing a nickel-vanadium alloy having a vanadium content of less than 3 atomic percent on the patterned surface to form a surface layer;   electroforming nickel on the nickel-vanadium alloy to form a nickel stamper body; and   separating the surface layer and the nickel stamper body from the master.   
     
     
         5 . The method according to  claim 4 , wherein the nickel-vanadium alloy has a vanadium content ranging from 1 to 2 atomic percent. 
     
     
         6 . A sputtering target comprising a nickel-vanadium alloy having a vanadium content of less than 3 atomic percent. 
     
     
         7 . The sputtering target according to  claim 6 , wherein the nickel-vanadium alloy has a vanadium content ranging from 1 to 2 atomic percent. 
     
     
         8 . A conductive film material for stamper electroforming comprising a nickel-vanadium alloy having a vanadium content of less than 3 atomic percent. 
     
     
         9 . The conductive film material according to  claim 8 , wherein the nickel-vanadium alloy has a vanadium content ranging from 1 to 2 atomic percent.

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