Solvent for treating polysilazane and method of treating polysilazane with the solvent

Abstract

Polysilazane is treated with a single or mixed solvent comprising one or more members selected from the group consisting of xylene, anisole, decalin, cyclohexane, cyclohexene, methylcyclohexane, ethylcyclohexane, limonene, hexane, octane, nonane, decane, a C8-C11 alkane mixture, a C8-C11 aromatic hydrocarbon mixture, an aliphatic/alicyclic hydrocarbon mixture containing 5 to 25% by weight of C8 or more aromatic hydrocarbons, and dibutyl ether, wherein the number of 0.5 micron or more fine particles contained in 1 ml of the solvent is 50 or less. As the treatment of polysilazane, there are illustrated, for example, edge-rinsing and back rinsing of a polysilazane film formed by spin coating polysilazane on a semiconductor substrate. The water content of the solvent is preferably 100 ppm or less.

1 . A solvent for removing, dissolving, rinsing or peeling polysilazane coated on an edge or a back of a substrate, which is a single or mixed solvent comprising one or more members selected from the group consisting of xylene, anisole, decalin, cyclohexane, cyclohexene, methylcyclohexane, ethylcyclohexane, limonene, hexane, octane, nonane, decane, a C8-C11 alkane mixture, a C8-C11 aromatic hydrocarbon mixture, an aliphatic/alicyclic hydrocarbon mixture containing 5 to 25 wt. % of C8 or more aromatic hydrocarbons, and dibutyl ether, wherein the number of 0.5 micron or more fine particles contained in 1 ml of the solvent is 50 or less, and wherein the solvent has a water content of 100 ppm or less. 
     
     
         2 . The solvent for removing, dissolving, rinsing or peeling polysilazane coated on an edge or a back of a substrate according to  claim 1 , which is a mixed solvent comprising 50% or more by weight of xylene, a C8-C11 aromatic hydrocarbon mixture, or an aliphatic/alicyclic hydrocarbon mixture containing 5 to 25% by weight of C8 or more aromatic hydrocarbons. 
     
     
         3 . (canceled) 
     
     
         4 . (canceled) 
     
     
         5 . The solvent for removing, dissolving, rinsing or peeling polysilazane coated on an edge or a back of a substrate according to  claim 1 , wherein the polysilazane is perhydropolysilazane, methanol-added perhydropolysilazane or hexamethyl disilazane-added perhydropolysilazane. 
     
     
         6 . A method of removing, dissolving, rinsing or peeling polysilazane coated on an edge or a back of a substrate, which comprises contacting a solvent described in  claim 1  with polysilazane and removing, dissolving, rinsing or peeling the polysilazane coated on the edge or the back of the substrate. 
     
     
         7 . The method of removing, dissolving, rinsing or peeling polysilazane coated on an edge or a back of a substrate according to  claim 6 , wherein the contact of the solvent with polysilazane is conducted, after applying a polysilazane solution onto a substrate, by jetting the solvent onto the edge of the polysilazane-coated surface of the substrate or the back of the substrate. 
     
     
         8 . The solvent for removing, dissolving, rinsing or peeling polysilazane coated on an edge or a back of a substrate according to  claim 2 , wherein the polysilazane is perhydropolysilazane, methanol-added perhydropolysilazane or hexamethyl disilazane-added perhydropolysilazane. 
     
     
         9 . A method of removing, dissolving, rinsing or peeling polysilazane coated on an edge or a back of a substrate, which comprises contacting a solvent described in  claim 2  with polysilazane and removing, dissolving, rinsing or peeling the polysilazane coated on the edge or the back of the substrate. 
     
     
         10 . The method of removing, dissolving, rinsing or peeling polysilazane coated on an edge or a back of a substrate according to  claim 9 , wherein the contact of the solvent with polysilazane is conducted, after applying a polysilazane solution onto a substrate, by jetting the solvent onto the edge of the polysilazane-coated surface of the substrate or the back of the substrate.