US2008241978A1PendingUtilityA1
Light emitting device processes
Est. expirySep 17, 2023(expired)· nominal 20-yr term from priority
H04N 9/315H10W 72/5475H10W 72/884H10H 29/142H10H 20/872H10H 20/819H10H 20/018
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Claims
Abstract
Light-emitting devices, and related components, processes, systems and methods are disclosed.
Claims
exact text as granted — not AI-modified1 . A method of forming light emitting devices comprising:
providing a submount supporting a plurality of multi-layer stacks comprising a sacrificial layer and a light-generating region, wherein the multi-layer stacks have substrate portions disposed thereover; at least partially decomposing the sacrificial layer of the multi-layer stacks on an individual basis; separating the multi-layer stacks from the substrate portions to expose n-type upper surfaces of the multi-layer stacks; and forming light emitting devices from the multi-layer stacks.
2 . The method of claim 1 , wherein at least partially decomposing the semiconductor layer includes exposing the sacrificial layer of the multi-layer stacks to electromagnetic radiation.
3 . The method of claim 1 , wherein at least 50% of the total amount of light generated by the light-generating region that emerges from the light emitting devices is emitted through the n-type upper surface.
4 . The method of claim 1 , wherein the light emitting devices have a side of between 0.5 mm and 1 cm.
5 . The method of claim 1 , comprising simultaneously decomposing the sacrificial layer of the multi-layer stacks on an individual basis.
6 . The method of claim 1 , comprising sequentially decomposing the sacrificial layer of the multi-layer stacks on an individual basis.
7 . The method of claim 1 , further comprising disposing a phosphor material layer over the exposed n-type upper surfaces.
8 . The method of claim 7 , wherein the phosphor material layer is compressed.
9 . The method of claim 7 , wherein the phosphor material layer has a thickness uniformity of less than about 20%.
10 . The method of claim 1 , wherein the sacrificial layer comprises a semiconductor material.
11 . A method of forming light emitting devices comprising:
providing a submount supporting a plurality of multi-layer stacks comprising a sacrificial layer and a light-generating region, wherein the multi-layer stacks have substrate portions disposed thereover; at least partially decomposing the sacrificial layer within the multi-layer stacks on an individual basis; separating the multi-layer stacks from the substrate portions to expose upper surfaces of the multi-layer stacks; processing the upper surfaces to enhance light extraction; and forming light emitting devices from the multi-layer stacks.
12 . The method of claim 11 , wherein at least partially decomposing the semiconductor layer includes exposing the sacrificial layer of the multi-layer stacks to electromagnetic radiation.
13 . The method of claim 11 , wherein at least 50% of the total amount of light generated by the light-generating region that emerges from the light emitting devices is emitted through the n-type upper surface.
14 . The method of claim 11 , wherein the light emitting devices have a side of at least 1 mm.
15 . The method of claim 11 , comprising simultaneously decomposing the sacrificial layer of the multi-layer stacks on an individual basis.
16 . The method of claim 11 , comprising sequentially decomposing the sacrificial layer of the multi-layer stacks on an individual basis.
17 . The method of claim 11 , further comprising disposing a phosphor material layer over the upper surfaces.
18 . The method of claim 17 , wherein the phosphor material layer has a thickness uniformity of less than about 20%.
19 . The method of claim 11 , wherein the sacrificial layer comprises a semiconductor material.
20 . The method of claim 11 , wherein the light emitting devices have a side of between 0.5 mm and 1 cm.Cited by (0)
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